Results 201 to 210 of about 99,590 (265)

Electrochemical evaluation of low-cost flexible supercapacitors based on nickel-coated activated carbon textile electrodes. [PDF]

open access: yesRSC Adv
Vilchis-Gutiérrez PG   +4 more
europepmc   +1 more source

Effects of Pressure on Optoelectronic Properties of Perovskite Thin Films Fabricated via Radio Frequency Sputtering. [PDF]

open access: yesACS Omega
Wongcharoen S   +9 more
europepmc   +1 more source

Sputtering

open access: yesOyo Buturi, 1993
openaire   +1 more source

Plasma-Enhanced Atomic Layer Deposition Synthesis of Nanolayered Molybdenum Diselenide (MoSe<sub>2</sub>) Thin Films for Nanoelectronics. [PDF]

open access: yesACS Omega
Sanchez F   +9 more
europepmc   +1 more source
Some of the next articles are maybe not open access.

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Planar magnetron sputtering

Journal of Vacuum Science and Technology, 1978
The technology is reviewed with emphasis on implementation. PM sputtering is characterized by cathode potentials of 300–700 V and sputtering gas pressures of 1-15 mTorr (0.1–2 Pa). Deposition rates are proportional to power density, which in turn is primarily limited by the thermal conductivity and cooling efficiency of the target.
exaly   +2 more sources

Potential sputtering

Philosophical Transactions of the Royal Society of London. Series A: Mathematical, Physical and Engineering Sciences, 2003
The potential energy stored in multiply charged ions is liberated when the ions recombine during impact on a solid surface. For certain target species this can lead to a novel form of ion-induced sputtering, which, in analogy to the usual kinetic sputtering, has been termed 'potential sputtering'.
Friedrich, Aumayr, Hannspeter, Winter
openaire   +2 more sources

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