Results 61 to 70 of about 99,590 (265)
Reactive magnetron sputtering : from fundamentals to high deposition rate processes
, 2013 Reactive magnetron sputtering is widely used for synthesis of various compound thin films. The technique is very versatile and scalable. Especially in industry, high productivity is essential and there is a need for processes with high deposition rates ...
Kubart, Tomas
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Sputtering Yield Formula for B_4 C Irradiated with Monoenergetic Ions at Normal Incidence [PDF]
, 1996 To fill a lack in sputtering yield data for a B_4 C material which may be a promising plasma-facing material in fusion devices, yields of H^+, D^+, T^+, He^+, B^+, C^+, Ne^+, Ar^+ and Kr^+ ions were calculated for this multi-component material for normal
ONO, Tadayoshi +3 more
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, 2018 Nanostructured TiO2 and TiO2/W thin films were deposited on Corning glass substrates by RF and DC magnetron co-sputtering at room temperature, using three targets of TiO, Ti and W. After deposition, samples were subjected to an annealing treatment in air
Leandro García González (5552126) +8 more
core +1 more source
Advanced Functional Materials, EarlyView.A compostable PGS soft surgical robot with interchangeable modules integrates transient Mo tactile and Si thermal sensors for dual feedback. The device preserves its function after clinical‐grade sterilization, demonstrates stable actuation and cardiac tissue grasping with real‐time in vivo pulsatile monitoring, and biodegrades post‐use with soil‐safe,
Minseong Chae +27 more
wiley +1 more source
, 2022 S.303-306The Double Ring Magnetron DRM 400 is designed for stationary deposition of thin films with high uniformity on eight inch substrates. The DRM combines two concentric discharges in one magnetron source.
Goedicke, K., Frach, P., Bartzsch, H.
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First experimental data of sulphur ions sputtering water ice [PDF]
, 2018 This paper presents the first experimental sputtering yields for sulphur ions with energies between 10 keV and 140 keV irradiating water ice films on a microbalance. The measured sputtering yields exceed theoretical predictions based on other ion species
Tulej, Marek +9 more
core +1 more source
Advanced Functional Materials, EarlyView.A fully transparent, all‐metal‐oxide neuromorphic transistor using a sodium‐embedded alumina (SEA) electrolyte is demonstrated. By precisely tuning the thermal annealing process, the chemical composition of the SEA layer is controlled, allowing for the deterministic realization of both short‐term and long‐term synaptic plasticity within the same device
Yonghyun Albert Kwon +7 more
wiley +1 more source
Computer Simulation and Data Compilation of Sputtering Yield by Hydrogen Isotopes (^1H^+, ^2D^+, ^3T^+) and Helium (^4He^+) Ion Impact from Monatomic Solids at Normal Incidence [PDF]
, 1995 The ion-induced sputtering yields from monatomic solids at normal incidence are presented graphically for light-ion (^1H^+, ^2D^+, ^3T^+, ^4He^+) bombardment on various target materials as a function of the incident ion energy.
SAKAOKA, Kazuho +3 more
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Advanced Functional Materials, EarlyView.Ferroelectric tunnel junction devices based on epitaxial undoped ferroelectric HfO2 films demonstrate stable switching endurance of over 106 switching cycles, low write voltages of ±3 V, 16 measured resistance states, and neuromorphic capability.
Markus Hellenbrand +13 more
wiley +1 more source
Target-Surface Compound Layers Formed by Reactive Sputtering of Si Target in Ar+O2 and Ar+N2 Mixed Gases [PDF]
, 2007 Reactive sputtering is a very useful and widely used technique for preparing compound thin films, however, the target surface state is not fully understood.
Takisawa, Takaya +3 more
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