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Supercritical drying for water-rinsed resist systems
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2000Two methods of supercritical resist drying (SRD) using CO2 have been developed for water-rinsed resist patterns. The key to their effectiveness is the use of a surfactant. In indirect SRD, a solution of n-hexane, a CO2-philic liquid, and a surfactant, sorbitan fatty acid ether, first replaces the water, and is in turn replaced with liquid CO2 before ...
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Supercritical resist drying for isolated nanoline formation
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2001Supercritical resist drying enables the formation of fine resist patterns with a nanometer-scale resolution. Fine isolated and dense lines of resist collapse when dried by conventional methods after development, thereby lowering the useful resolution of resist patterns.
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Intensification methods of supercritical drying for aerogels production
Drying Technology, 2022Natalia Menshutina +2 more
exaly
Rapid supercritical drying techniques for advanced lithography
SPIE Proceedings, 2004A rapid supercritical drying process for resist patterns has been developed that features three novel techniques: the removal of rinse water based on a difference in specific gravity, rapid heating with a hot wafer holder, and the rapid release of supercritical fluid using helium.
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Supercritical Fluid Drying: Classification and Applications
Recent Patents on Chemical Engineeringe, 2010Shengxuan Zheng +5 more
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Applications of Supercritical Drying in Catalyst Preparation
1996Diane R. Milburn +4 more
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