Results 91 to 100 of about 73,193 (263)

List of words (Dina)

open access: yes, 2011
Conforms to: doi:10.34847/cocoon.49aefa90-8c1f-3ba8-a099 ...
Vu Ngoc Tuan   +2 more
openaire   +1 more source

Closed‐Loop Solid‐State Synthesis Planning for Materials Discovery With Large Language Models

open access: yesAdvanced Materials, EarlyView.
Leveraging literature data, we build a large‐language‐model‐driven workflow that extracts synthesis steps from 4407 papers, retrieves similar precedents, and generates candidate solid‐state synthesis recipes. The system benchmarks against ground‐truth and then operates in a closed loop with experiments to synthesize oxy‐selenide electrolyte materials ...
Dong Won Jeon   +9 more
wiley   +1 more source

GenAI Models as Keyword Rankers: A Learner-centred Case Study for L2 Spanish

open access: yesThe EUROCALL Review
Frequency-based word lists form an important part of general-purpose vocabulary learning courses aimed at beginner and (lower-)intermediate learners of a foreign/second language (L2).
Jasper Degraeuwe
doaj   +1 more source

Decoding Synergistic Pathways in Bimetallic MOFs for Advanced Oxidation Processes

open access: yesAdvanced Materials, EarlyView.
This review presents a unified framework linking metal pairing and framework design with electronic structure, redox cycling, oxidant activation, reactive‐species generation, and catalytic performance across photocatalytic and oxidant‐based BMOF‐AOPs. The resulting design principles guide the development of hydrolytically stable and efficient BMOFs for
Karim El‐Naggar   +2 more
wiley   +1 more source

Accelerated Materials Discovery Through In Situ X‐ray Diffraction: Solvothermal Formation of PdxMy (M═Si, Ge, Sn, Pb) Intermetallic Nanoparticles

open access: yesAdvanced Materials, EarlyView.
In situ PXRD data on solvothermal reactions accelerate materials discovery while simultaneously providing fundamental insights into complex crystal formation processes. Using PdxMy (M = Si, Ge, Sn, Pb) as an example, a general formation mechanism is identified, and specific synthesis strategies for ex situ preparation of SnPd2, Sn13Pd20, and SnPd ...
Anders Bæk Borup   +1 more
wiley   +1 more source

Listing words in free groups

open access: yesJournal of Computational Algebra
Lists of equivalence classes of words under rotation or rotation plus reversal (i.e., necklaces and bracelets) have many uses, and efficient algorithms for generating these lists exist. In combinatorial group theory elements of a group are typically written as words in the generators and their inverses, and necklaces and bracelets correspond to ...
openaire   +3 more sources

Phase‐Engineered MoS2 Quantum Monolayer Catalysts

open access: yesAdvanced Materials, EarlyView.
A new type of catalyst model—phase‐engineered MoS2 quantum‐monolayer catalyst (∼0.8 nm thick, < 6 nm in the lateral size; switchable freely among metallic 1T, semiconducting 2H, and a hybrid phase of metallic‐semiconducting 1T‐2H)—is reported. It can efficiently and stably drive photochemical H2, syngas and ammonia synthesis as a catalyst or co ...
Ruijie Yang   +12 more
wiley   +1 more source

The Polish sentence test for speech intelligibility evaluations

open access: yesArchives of Acoustics, 2014
The main purpose of this study was to prepare Polish sentence tests for measuring speech intelligibility against an interfering noise. The tests were developed from meaningful sentences taken from everyday utterances, TV, literature etc.
E. Ozimek   +4 more
doaj  

What's in a word family? The assumptions of lexical units

open access: yesVocabulary Learning and Instruction
Lemmas, flemmas, and level-6 word families (WF6) are three commonly discussed lexical units. Because each makes differing assumptions about learner knowledge, the selection of one unit over another in research or pedagogy has a great impact on ...
Phil Bennett
doaj   +1 more source

Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication

open access: yesAdvanced Materials Interfaces, EarlyView.
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley   +1 more source

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