Results 111 to 120 of about 280,313 (347)
ECS AdvancesThe effect of an Al _2 TiO _5 (ALT) interlayer between Ni and YSZ on enhancing the thermal stability of Ni-YSZ solid oxide fuel cell was examined. Atomic layer deposition (ALD) was used to provide precise control of the structure and thickness of the ALT
Zhuoming Feng +3 more
doaj +1 more source
Advanced Engineering Materials, EarlyView.Mesoporous bioactive glass nanoparticles (MBGNs) are investigated for bone regeneration given their remarkable structural and functional properties. MBGNs are functionalized with Mn and Cu and incorporated with quercetin, a natural flavonoid exhibiting antioxidant, anti‐inflammatory, and antimicrobial properties.
Giovanni Lo Bello +5 more
wiley +1 more source
Exploiting atomic layer deposition for fabricating sub-10 nm X-ray lenses
, 2018 Moving towards significantly smaller nanostructures, direct structuring techniques such as electron beam lithography approach fundamental limitations in feature size and aspect ratios.
Belkhou, Rachid +14 more
core +1 more source
Microcellular Poly (Ethylene‐Co‐Vinyl Acetate)/Lignin Nanocomposites for Soft Ferroelectrets
Advanced Engineering Materials, EarlyView.Lignin valorization for advanced porous polymer nanocomposites development and an upscaling route for continuous manufacturing of soft ferroelectrets for energy harvesting are studied. This work examines the role of lignin and carbon nanotubes (CNT) in modifying the mechanical, dielectric, and ferroelectret properties of poly (ethylene‐co‐vinyl acetate)
Yuchen Lian +5 more
wiley +1 more source
All-gas-phase synthesis of UiO-66 through modulated atomic layer deposition
Nature Communications, 2016 Thin films of metal-organic frameworks (MOFs) are promising for catalysis, gas storage, and microelectronics. Here, the authors introduce a vapour-phase synthesis of UiO-66 thin films, beginning with modulated atomic layer deposition of porous, amorphous
Kristian Blindheim Lausund, Ola Nilsen
doaj +1 more source
Plasma-Enhanced Atomic Layer Deposition of Tantalum Nitrides Using Hydrogen Radicals as a Reducing Agent [PDF]
, 2001 Jin‐Seong Park +3 more
openalex +1 more source
, 2013 Atomic layer deposition (ALD) provides a promising approach for deposition of ultrathin low-defect-density tunnel barriers, and it has been implemented in a high-vacuum magnetron sputtering system for in situ deposition of ALD-Al2O3 tunnel barriers in ...
Elliot, Alan J. +12 more
core +1 more source
Advanced Functional Materials, Volume 35, Issue 12, March 18, 2025.The formate pseudo‐halide anion is strategically introduced at the buried interface to stabilize the intermediate phases formed during perovskite crystallization. The controlled crystallization enhances crystallinity and alleviates tensile strain, eliminating residual PbI2 near the buried interface.
Jongdeuk Seo +12 more
wiley +1 more source
Atomic Layer Deposition research
III-Vs Review, 2003 AbstractASM International NV is to enter into a long-term co-operative agreement with the University of Helsinki to jointly pursue further development of Atomic Layer Deposition (ALD) technology. As part of this agreement, ASM intends to relocate its Espoo, Finland, research and development activities to the nearby campus of the University of Helsinki,
openaire +1 more source
Advanced Functional Materials, EarlyView.PBTTT‐OR‐R, a C14‐alkoxy/alkyl‐PBTTT polymer derivative, is of substantial interest for optoelectronics due to its specific fullerene intercalation behavior and enhanced charge‐transfer absorption. Comparing this polymer with (S) and without (O) homocoupling defects reveals that PBTTT‐OR‐R(O) forms stable co‐crystals with PC61BM, while PBTTT‐OR‐R(S ...
Zhen Liu +14 more
wiley +1 more source