Results 251 to 260 of about 30,611 (305)
Some of the next articles are maybe not open access.
Biocompatible Interface Films Deposited within Porous Polymers by Atomic Layer Deposition (ALD)
ACS Applied Materials & Interfaces, 2009Ultrathin ceramic films were deposited throughout highly porous poly(styrene-divinylbenzene) (PS-DVB) particles using a low-temperature atomic layer deposition (ALD) process. Alumina and titania films were deposited by alternating reactions of trimethylaluminum and H2O at 33 degrees C and of titanium tetrachloride and H2O2 (50 wt % in H2O) at 100 ...
Xinhua Liang, Alan W Weimer
exaly +3 more sources
Electrodeposition of Ru by atomic layer deposition (ALD)
Electrochimica Acta, 2008Studies are presented describing attempts to form a cycle for the growth of Ru nanofilms using the electrochemical form of atomic layer deposition (ALD). Au substrates have been used to form Ru nanofilms, based on layer by layer growth of deposits, using surface limited reactions. These deposits were formed using surface limited redox replacement (SLRR)
Chandru Thambidurai +2 more
openaire +1 more source
Atomic layer deposition (ALD) as a coating tool for reinforcing fibers
Analytical and Bioanalytical Chemistry, 2010Layers of alumina were deposited on to bundled carbon fibers in an atomic layer deposition (ALD) process via sequential exposure to vapors of aluminium chloride and water, respectively. Scanning electron microscopic (SEM) images of the coated fibers revealed that each individual fiber within a bundle was coated evenly and separately, fibers are not ...
A K, Roy +9 more
openaire +2 more sources
Mechanistic Details of Atomic Layer Deposition (ALD) Processes
Journal of the Korean Physical Society, 2007Several examples are provided where the reaction mechanisms of atomic layer deposition (ALD) processes have been characterized by a combination of surface-sensitive techniques. In the first, a proposal is advanced for the layer-by-layer growth of metal films using metal carbonyl precursors and hydrogen as a carbon monoxide displacement agent.
Mingde Xu +5 more
openaire +1 more source
Optical properties of ZnO deposited by atomic layer deposition (ALD) on Si nanowires [PDF]
Materials Science and Engineering B: Solid-State Materials for Advanced Technology, 2018 In this work, we report proof-of-concept results on the synthesis of Si core/ ZnO shell nanowires (SiNWs/ZnO) by combining nanosphere lithography (NSL), metal assisted chemical etching (MACE) and atomic layer deposition (ALD). The structural properties of the SiNWs/ZnO nanostructures prepared were investigated by X-ray diffraction, Raman spectroscopy ...
Octavio Graniel +2 more
exaly +5 more sources
Frontiers in Applied Atomic Layer Deposition (ALD) Research
Materials Science Forum, 2012Atomic layer deposition (ALD) has been a key player in advancing the science and technology of nanomaterials synthesis and device fabrication. The monolayer (ML) control of growth rate obtained with ALD combined with its ability to self-limit growth reactions at the gas-substrate interface can be exploited in fundamentally new ways to produce novel ...
Fei Wu +4 more
openaire +1 more source
Atomic layer deposition (ALD) of palladium: from processes to applications
Critical Reviews in Solid State and Materials Sciences, 2023International ...
Clément Lausecker +2 more
openaire +2 more sources
Atomic layer deposition (ALD) for optical nanofabrication
SPIE Proceedings, 2010ALD is currently one of the most rapidly developing fields of thin film technology. Presentation gives an overview of ALD technology for optical film deposition, highlighting benefits, drawbacks and peculiarities of the ALD, especially compared to PVD.
openaire +1 more source