Results 101 to 110 of about 2,309,761 (293)
Graphene nanoribbons with zigzag and armchair edges prepared by scanning tunneling microscope lithography on gold substrates [PDF]
The properties of graphene nanoribbons are dependent on both the nanoribbon width and the crystallographic orientation of the edges. Scanning tunneling microscope lithography is a method which is able to create graphene nanoribbons with well defined edge
Dobrik, G. +7 more
core +1 more source
Mechanochemical control of graphene etching along zigzag and armchair edge directions
The atomic edge structure of graphene governs its unique electronic properties with applications in nanoscale electronics and optoelectronics. To fully realize its potential, it is critical to develop a precision etching process producing graphene edges ...
Yilong Jiang +8 more
doaj +1 more source
Fabrication and electrochemical characterization of ruthenium nanoelectrodes
The Fraunhofer IMS has recently developed a technique for producing nanoelectrodes that are generated by atomic layer deposition (ALD) in a via deep reactive ion etching (DRIE) structured sacrificial layer.
Allani Sonja +4 more
doaj +1 more source
Thermal Atomic Layer Etching of MoS2 Using MoF6 and H2O. [PDF]
Soares J +6 more
europepmc +1 more source
Out‐of‐Plane Strain‐Decoupled Architecture for High‐Fill‐Factor Stretchable OLED Displays
A vertically decoupled multilayer SOLED architecture separates emissive pixel islands from deformable interconnects, allowing low‐modulus elastomeric layers to accommodate applied strain and suppress strain transfer to the OLED region. This design, combined with transparent hybrid encapsulation, enables a high fill factor (∼75%), stretchability ...
Young Hyun Son +2 more
wiley +1 more source
Conformal atomic layer etching (cALE) of Si is realized on the basis of layer-by-layer self-limiting deposition and self-stop etching processes at low temperatures. In each cALE cycle, a conformal oxide layer was prepared by atomic layer deposition (ALD)
Miin-Jang Chen (1397377) +5 more
core +1 more source
This work reveals the influence of polymer side‐chain electronic effects on the Li+ solvation sheath in gel polymer electrolytes. Electron‐donating side chains induce the strong Li+ coordination and FDMA‐dominated solvation, impeding Li+ desolvation, whereas electron‐withdrawing side chains weaken Li+ coordination, facilitating anion‐rich solvation and
Xianbin Wu +7 more
wiley +1 more source
Improving Performance and Breakdown Voltage in Normally-Off GaN Recessed Gate MIS-HEMTs Using Atomic Layer Etching and Gate Field Plate for High-Power Device Applications. [PDF]
Liu AC +5 more
europepmc +1 more source
BSA addition to physiological solutions enhances resistance of a Zn alloy to stress corrosion cracking (SCC) but reduces its corrosion resistance. Extended surface characterization explains the contrasting influences on corrosion and SCC. Unexpectedly, the alloy suffers transgranular SCC (TGSCC), despite extensive grain boundary precipitation. Thorough
RK Singh Raman +9 more
wiley +1 more source
Method for removing a contamination layer by an atomic layer etching process
A method for at least partially removing a contamination layer (24) from an optical surface (14a) of an optical element (14) that reflects EUV radiation includes: performing an atomic layer etching process for at least partially removing the ...
Sligte, E. te +5 more
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