Results 101 to 110 of about 2,309,761 (293)

Graphene nanoribbons with zigzag and armchair edges prepared by scanning tunneling microscope lithography on gold substrates [PDF]

open access: yes, 2014
The properties of graphene nanoribbons are dependent on both the nanoribbon width and the crystallographic orientation of the edges. Scanning tunneling microscope lithography is a method which is able to create graphene nanoribbons with well defined edge
Dobrik, G.   +7 more
core   +1 more source

Mechanochemical control of graphene etching along zigzag and armchair edge directions

open access: yesFriction
The atomic edge structure of graphene governs its unique electronic properties with applications in nanoscale electronics and optoelectronics. To fully realize its potential, it is critical to develop a precision etching process producing graphene edges ...
Yilong Jiang   +8 more
doaj   +1 more source

Fabrication and electrochemical characterization of ruthenium nanoelectrodes

open access: yesCurrent Directions in Biomedical Engineering, 2017
The Fraunhofer IMS has recently developed a technique for producing nanoelectrodes that are generated by atomic layer deposition (ALD) in a via deep reactive ion etching (DRIE) structured sacrificial layer.
Allani Sonja   +4 more
doaj   +1 more source

Thermal Atomic Layer Etching of MoS2 Using MoF6 and H2O. [PDF]

open access: yesChem Mater, 2023
Soares J   +6 more
europepmc   +1 more source

Out‐of‐Plane Strain‐Decoupled Architecture for High‐Fill‐Factor Stretchable OLED Displays

open access: yesAdvanced Functional Materials, EarlyView.
A vertically decoupled multilayer SOLED architecture separates emissive pixel islands from deformable interconnects, allowing low‐modulus elastomeric layers to accommodate applied strain and suppress strain transfer to the OLED region. This design, combined with transparent hybrid encapsulation, enables a high fill factor (∼75%), stretchability ...
Young Hyun Son   +2 more
wiley   +1 more source

Low-Temperature Conformal Atomic Layer Etching of Si with a Damage-Free Surface for Next-Generation Atomic-Scale Electronics

open access: yes, 2019
Conformal atomic layer etching (cALE) of Si is realized on the basis of layer-by-layer self-limiting deposition and self-stop etching processes at low temperatures. In each cALE cycle, a conformal oxide layer was prepared by atomic layer deposition (ALD)
Miin-Jang Chen (1397377)   +5 more
core   +1 more source

Polymer Side‐Chain Electronic Effects Regulating Solvation Sheath for Low‐Temperature and High‐Voltage Lithium Metal Batteries

open access: yesAdvanced Functional Materials, EarlyView.
This work reveals the influence of polymer side‐chain electronic effects on the Li+ solvation sheath in gel polymer electrolytes. Electron‐donating side chains induce the strong Li+ coordination and FDMA‐dominated solvation, impeding Li+ desolvation, whereas electron‐withdrawing side chains weaken Li+ coordination, facilitating anion‐rich solvation and
Xianbin Wu   +7 more
wiley   +1 more source

Unique Role of Microstructure of a Bioimplant Zinc Alloy and Protein Content of Simulated Body Fluid in Corrosion and Fracture

open access: yesAdvanced Functional Materials, EarlyView.
BSA addition to physiological solutions enhances resistance of a Zn alloy to stress corrosion cracking (SCC) but reduces its corrosion resistance. Extended surface characterization explains the contrasting influences on corrosion and SCC. Unexpectedly, the alloy suffers transgranular SCC (TGSCC), despite extensive grain boundary precipitation. Thorough
RK Singh Raman   +9 more
wiley   +1 more source

Method for removing a contamination layer by an atomic layer etching process

open access: yes, 2021
A method for at least partially removing a contamination layer (24) from an optical surface (14a) of an optical element (14) that reflects EUV radiation includes: performing an atomic layer etching process for at least partially removing the ...
Sligte, E. te   +5 more
core  

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