Results 21 to 30 of about 70,763 (310)
Liquation cracks are generally regarded as thermal defects in various materials, e.g. in steels and nickel-based alloys. However, direct observation of microstructure with crack-like morphology that may be revealed by chemical etching or electrochemical ...
Kai Ding +6 more
doaj +1 more source
Formation of Functional Silicon Nitride Layers by Selective Plasmochemical Etching
At present, with the development of nanotechnology, plasma-chemical etching remains practically the only tool for transferring an integrated circuit pattern in a masking layer to a substrate material due to the fact that the pattern transfer accuracy is ...
V. V. Emelyanov
doaj +1 more source
Preparation of small silicon carbide quantum dots by wet chemical etching
Fabrication of nanosized silicon carbide (SiC) crystals is a crucial step in many biomedical applications. Here we report an effective fabrication method of SiC nanocrystals based on simple electroless wet chemical etching of crystalline cubic SiC ...
Szekrényes, Zsolt +5 more
core +1 more source
Etching-Controlled Growth of Graphene by Chemical Vapor Deposition
Graphene growth and etching are reciprocal processes that can reach a dynamic balance during chemical vapor deposition (CVD). Most commonly, the growth of graphene is the dominate process, while the etching of graphene is a recessive process often ...
Birong Luo (1964989) +5 more
core +1 more source
Classical photoelectrodes for Dye Sensitized Solar Cells (DSSCs) were fabricated by using the electrochemical method on the titanium (Ti) template, for that the fabrication process would influence the characteristics of the DSSCs. In this study, at first
Chin-Guo Kuo +6 more
doaj +1 more source
The paper presents the results of experimental determination of the influence of the initial concentration of tartaric acid on the features of the chemical interaction of InAs, InSb, GaAs and GaSb with (NH4)2Cr2O7-HBr-C4H6O6 etching solutions.
I. V. Levchenko +3 more
doaj +1 more source
Preparation of Nickel Nanoparticles Using Nickel Raffinate Separated by Solvent Extraction from The Spent FECL3 Etching Solution [PDF]
FeCl3 bearing etching solution is mainly used for etching of metals used in shadow masks, PCBs and so on. Due course of Invar alloy etching process the FeCl3 bearing etching solution get contaminated with Ni2+ which affect adversely the etching ...
Il-Jeong Park +5 more
doaj +1 more source
Surfactant-Assisted in situ Chemical Etching for the General Synthesis of ZnO Nanotubes Array
In this paper, a general low-cost and substrate-independent chemical etching strategy is demonstrated for the synthesis of ZnO nanotubes array. During the chemical etching, the nanotubes array inherits many features from the preformed nanorods array ...
Wang Hongqiang +6 more
doaj +1 more source
We focused on inductively coupled plasma and reactive ion etching (ICP–RIE) for etching GaN and tried to fabricate distinctive GaN structures under optimized chemical etching conditions.
N. Okada +8 more
doaj +1 more source
Nonlinear Etch Rate of Au-Assisted Chemical Etching of Silicon [PDF]
We demonstrated time-dependent mass transport mechanisms of Au-assisted chemical etching of Si substrates. Variations in the etch rate and surface topology were correlated with catalyst features and etching duration. Nonlinear etching characteristics were associated with the formation of pinholes and whiskers.
Keorock Choi +3 more
openaire +3 more sources

