Results 21 to 30 of about 70,763 (310)

Clarification of the false liquation crack existed in 9% Cr/CrMoV dissimilar welded joint by comparative etching process and in situ laser scanning confocal microscope

open access: yesJournal of Materials Research and Technology, 2020
Liquation cracks are generally regarded as thermal defects in various materials, e.g. in steels and nickel-based alloys. However, direct observation of microstructure with crack-like morphology that may be revealed by chemical etching or electrochemical ...
Kai Ding   +6 more
doaj   +1 more source

Formation of Functional Silicon Nitride Layers by Selective Plasmochemical Etching

open access: yesДоклады Белорусского государственного университета информатики и радиоэлектроники, 2022
At present, with the development of nanotechnology, plasma-chemical etching remains practically the only tool for transferring an integrated circuit pattern in a masking layer to a substrate material due to the fact that the pattern transfer accuracy is ...
V. V. Emelyanov
doaj   +1 more source

Preparation of small silicon carbide quantum dots by wet chemical etching

open access: yes, 2013
Fabrication of nanosized silicon carbide (SiC) crystals is a crucial step in many biomedical applications. Here we report an effective fabrication method of SiC nanocrystals based on simple electroless wet chemical etching of crystalline cubic SiC ...
Szekrényes, Zsolt   +5 more
core   +1 more source

Etching-Controlled Growth of Graphene by Chemical Vapor Deposition

open access: yes, 2017
Graphene growth and etching are reciprocal processes that can reach a dynamic balance during chemical vapor deposition (CVD). Most commonly, the growth of graphene is the dominate process, while the etching of graphene is a recessive process often ...
Birong Luo (1964989)   +5 more
core   +1 more source

An Analysis and Research on the Transmission Ratio of Dye Sensitized Solar Cell Photoelectrodes by Using Different Etching Process

open access: yesInternational Journal of Photoenergy, 2013
Classical photoelectrodes for Dye Sensitized Solar Cells (DSSCs) were fabricated by using the electrochemical method on the titanium (Ti) template, for that the fabrication process would influence the characteristics of the DSSCs. In this study, at first
Chin-Guo Kuo   +6 more
doaj   +1 more source

Influence of the C4H6O6 Concentration in the (NH4)2Cr2O7-HBr-C4H6O6 Composition on the Chemical-Dynamic Polishing of the III-V Semiconductors

open access: yesФізика і хімія твердого тіла, 2017
The paper presents the results of experimental determination of the influence of the initial concentration of tartaric acid on the features of the chemical interaction of InAs, InSb, GaAs and GaSb with (NH4)2Cr2O7-HBr-C4H6O6 etching solutions.
I. V. Levchenko   +3 more
doaj   +1 more source

Preparation of Nickel Nanoparticles Using Nickel Raffinate Separated by Solvent Extraction from The Spent FECL3 Etching Solution [PDF]

open access: yesArchives of Metallurgy and Materials, 2019
FeCl3 bearing etching solution is mainly used for etching of metals used in shadow masks, PCBs and so on. Due course of Invar alloy etching process the FeCl3 bearing etching solution get contaminated with Ni2+ which affect adversely the etching ...
Il-Jeong Park   +5 more
doaj   +1 more source

Surfactant-Assisted in situ Chemical Etching for the General Synthesis of ZnO Nanotubes Array

open access: yesNanoscale Research Letters, 2010
In this paper, a general low-cost and substrate-independent chemical etching strategy is demonstrated for the synthesis of ZnO nanotubes array. During the chemical etching, the nanotubes array inherits many features from the preformed nanorods array ...
Wang Hongqiang   +6 more
doaj   +1 more source

Formation of distinctive structures of GaN by inductively-coupled-plasma and reactive ion etching under optimized chemical etching conditions

open access: yesAIP Advances, 2017
We focused on inductively coupled plasma and reactive ion etching (ICP–RIE) for etching GaN and tried to fabricate distinctive GaN structures under optimized chemical etching conditions.
N. Okada   +8 more
doaj   +1 more source

Nonlinear Etch Rate of Au-Assisted Chemical Etching of Silicon [PDF]

open access: yesACS Omega, 2017
We demonstrated time-dependent mass transport mechanisms of Au-assisted chemical etching of Si substrates. Variations in the etch rate and surface topology were correlated with catalyst features and etching duration. Nonlinear etching characteristics were associated with the formation of pinholes and whiskers.
Keorock Choi   +3 more
openaire   +3 more sources

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