Silicon Conical Structures by Metal Assisted Chemical Etching [PDF]
A simple and inexpensive method to obtain Si conical structures is proposed. The method consists of a sequence of steps that include photolithography and metal assisted chemical etching (MACE) to create porous regions that are dissolved in a post-etching
Oscar Pérez-Díaz +1 more
doaj +4 more sources
Silicon Nanowires Synthesis by Metal-Assisted Chemical Etching: A Review [PDF]
Silicon is the undisputed leader for microelectronics among all the industrial materials and Si nanostructures flourish as natural candidates for tomorrow’s technologies due to the rising of novel physical properties at the nanoscale.
Antonio Alessio Leonardi +2 more
doaj +5 more sources
Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures [PDF]
High-aspect ratio silicon (Si) nanostructures are important for many applications. Metal-assisted chemical etching (MACE) is a wet-chemical method used for the fabrication of nanostructured Si.
Rabia Akan, Ulrich Vogt
doaj +5 more sources
Deep Etching of Silicon Based on Metal-Assisted Chemical Etching. [PDF]
A deep etching method for silicon "micro"structures was successfully developed. This wet etching process is based on metal-assisted chemical etching (MACE), which was previously mainly utilized to etch the features that have lateral dimensions of "nanometers." In this novel MACE, the critical improvement was to promote the "out-of-plane" mass transfer ...
Nur'aini A, Oh I.
europepmc +3 more sources
Bio-Inspired Hierarchical Micro-/Nanostructures for Anti-Icing Solely Fabricated by Metal-Assisted Chemical Etching [PDF]
We report a cost-effective and scalable methodology for producing a hierarchical micro-/nanostructured silicon surface solely by metal-assisted chemical etching. It involves two major processing steps of fabricating micropillars and nanowires separately.
Lansheng Zhang +4 more
doaj +2 more sources
Metal-Assisted Chemical Etching for Anisotropic Deep Trenching of GaN Array [PDF]
Realizing the anisotropic deep trenching of GaN without surface damage is essential for the fabrication of GaN-based devices. However, traditional dry etching technologies introduce irreversible damage to GaN and degrade the performance of the device. In
Qi Wang +7 more
doaj +2 more sources
Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review [PDF]
High-aspect-ratio silicon micro- and nanostructures are technologically relevant in several applications, such as microelectronics, microelectromechanical systems, sensors, thermoelectric materials, battery anodes, solar cells, photonic devices, and X ...
Lucia Romano, Marco Stampanoni
doaj +2 more sources
Reduction of Nitroaromatics by Gold Nanoparticles on Porous Silicon Fabricated Using Metal-Assisted Chemical Etching [PDF]
In this study, we investigated the use of porous silicon (PSi) fabricated using metal-assisted chemical etching (MACE) as a substrate for the deposition of Au nanoparticles (NPs) for the reduction of nitroaromatic compounds.
Ling-Yi Liang +3 more
doaj +2 more sources
Curved Structure of Si by Improving Etching Direction Controllability in Magnetically Guided Metal-Assisted Chemical Etching [PDF]
Metal-assisted chemical etching (MACE) is widely used to fabricate micro-/nano-structured Si owing to its simplicity and cost-effectiveness. The technique of magnetically guided MACE, involving MACE with a tri-layer metal catalyst, was developed to ...
Tae Kyoung Kim +6 more
doaj +2 more sources
Nanotexturing of Silicon by Metal-Assisted Chemical Etching
This paper describes the method of metal assisted chemical etching (MacEtch) as an efficient approach for structuring the silicon surface with the ability to manage effectively the geometric parameters of the structures and their distribution on the ...
Ye. I. Berezhanskyi +3 more
doaj +2 more sources

