Results 41 to 50 of about 10,763 (241)
Textured stainless steel foil as efficient rear reflector for flexible black silicon
Results in Physics, 2021 This paper reports textured SS foil as an efficient rear reflector for flexible b-Si. Wafer thinning by concentrated potassium hydroxide (KOH) solution followed by metal-assisted chemical etching (MACE) are used to fabricate the flexible b-Si with 67 μm ...
Halo Dalshad Omar +3 more
doaj +1 more source
Advanced Engineering Materials, EarlyView.Deep‐UV (258 nm) femtosecond pulses enable uniform amorphous silicon writing on Si(100)/(111) with a six‐fold larger fluence amorphization window than NIR methods. Optimized fluence and overlap yield 20–45 nm uniform and continuous amorphous layers. Microscopy shows sharp interfaces, and real‐time reflectivity reveals nanosecond melt–resolidification ...
Wissal Benali +5 more
wiley +1 more source
Inverse metal-assisted chemical etching of germanium with gold and hydrogen peroxide
Nanotechnology, 2022 Abstract Metal-assisted chemical etching (MACE) is a flexible technique for texturing the surface of semiconductors. In this work, we study the spatial variation of the etch profile, the effect of angular orientation relative to the crystallographic planes, and the effect of doping type. We employ gold in direct contact with germanium as
D Lidsky +3 more
openaire +2 more sources
Biomass Native Structure Into Functional Carbon‐Based Catalysts for Fenton‐Like Reactions
Advanced Functional Materials, EarlyView.This study indicates that eight biomasses with 2D flaky and 1D acicular structures influence surface O types, morphology, defects, N doping, sp2 C, and Co nanoparticles loading in three series of carbon, N‐doped carbon, and cobalt/graphitic carbon. This work identifies how these structural factors impact catalytic pathways, enhancing selective electron
Wenjie Tian +7 more
wiley +1 more source
Nano ExpressMetal-assisted chemical etching of silicon, especially in the vapour phase, is a highly promising technique for fabricating nanostructures with high aspect ratios.
Hanna Ohlin +3 more
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Preparation of Silicon Nanowires Photocathode for Photoelectrochemical Water Splitting
Iraqi Journal of Physics, 2022 A metal-assisted chemical etching process employing p-type silicon wafers with varied etching durations is used to produce silicon nanowires. Silver nanoparticles prepared by chemical deposition are utilized as a catalyst in the formation of silicon ...
Zainab K. Ali, Mazin A. Mahdi
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Porous Silicon Formation by Metal-Assisted Chemical Etching
Acta Physica Polonica A, 2009 The method of metal-assisted chemical etching produces a porous silicon layer. Palladium particles are deposited on both: multi-crystalline and Czochralski grown mono-crystalline Si wafers by immersing them in PdCl2 solution for 1 to 3 min. X-ray photoelectron spectroscopy analysis of Pd clusters shows a decrease in Pd metal fraction by prolonged ...
M. Lipinski +3 more
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Advanced Functional Materials, EarlyView.In MOCVD MoS2 memristors, a current compliance‐regulated Ag filament mechanism is revealed. The filament ruptures spontaneously during volatile switching, while subsequent growth proceeds vertically through the MoS2 layers and then laterally along the van der Waals gaps during nonvolatile switching.
Yuan Fa +19 more
wiley +1 more source
Nanomaterials, 2019 In this study, needle-like and pyramidal hybrid black silicon structures were prepared by performing metal-assisted chemical etching (MACE) on alkaline-etched silicon wafers.
Chia-Hsun Hsu +8 more
doaj +1 more source
Advanced Functional Materials, EarlyView.Optoelectronic synaptic devices based on solution‐processed molecular telluride GST‐225 phase‐change inks are demonstrated for three‐factor learning. A global optical signal broadcast through a silicon waveguide induces non‐volatile conductance updates exclusively in locally electrically flagged memristors.
Kevin Portner +14 more
wiley +1 more source