Results 51 to 60 of about 18,025 (163)

Nanoscale Surface Refinement of CoCrMo Alloy for Artificial Knee Joints via Chemical Mechanical Polishing. [PDF]

Materials (Basel), 2023
Zhang H, Zhang J, Lai J, Chen Y, Tian M, Pan G, Yang X, Qi Y.   +7 more
europepmc   +1 more source

Research on Chemical Mechanical Polishing Technology for Zirconium-Based Amorphous Alloys. [PDF]

Micromachines (Basel), 2023
Hang W, Song C, Yin Z, Liu Y, Wang Q, Wang Y, Ma Y, Zeng Q.   +7 more
europepmc   +1 more source

New Atomistic Insights on the Chemical Mechanical Polishing of Silica Glass with Ceria Nanoparticles. [PDF]

Langmuir, 2023
Brugnoli L, Miyatani K, Akaji M, Urata S, Pedone A.   +4 more
europepmc   +1 more source

Composition design and optimization of electrochemical mechanical polishing slurry for single crystal SiC

Jin'gangshi yu moliao moju gongcheng
Objectives: Single crystal silicon carbide (SiC) is known for its high hardness and high chemical inertness, making it chanllenging to process effectively using traditional chemical mechanical polishing (CMP) methods.
Zhibin GU, Haoxiang WANG, Xin SONG, Renke KANG, Shang GAO   +4 more
doaj   +1 more source

Recent Advances In Silicon Carbide Chemical Mechanical Polishing Technologies. [PDF]

Micromachines (Basel), 2022
Hsieh CH, Chang CY, Hsiao YK, Chen CA, Tu CC, Kuo HC.   +5 more
europepmc   +1 more source

The Effects of Precursors on the Morphology and Chemical Mechanical Polishing Performance of Ceria-Based Abrasives. [PDF]

Materials (Basel), 2022
Zheng Y, Wang N, Feng Z, Tan X, Zhang Z, Han H, Huang X.   +6 more
europepmc   +1 more source

Polymer Nanoparticles Applied in the CMP (Chemical Mechanical Polishing) Process of Chip Wafers for Defect Improvement and Polishing Removal Rate Response. [PDF]

Polymers (Basel), 2023
Chiu WL, Huang CI.
europepmc   +1 more source

Dispersion and Polishing Mechanism of a Novel CeO₂-LaOF-Based Chemical Mechanical Polishing Slurry for Quartz Glass. [PDF]

Materials (Basel), 2023
Zhao Z, Zhang Z, Shi C, Feng J, Zhuang X, Li L, Meng F, Li H, Xue Z, Liu D.   +9 more
europepmc   +1 more source

Numerical Analysis of the Effect of Retaining Ring Structure on the Chemical Mechanical Polishing Abrasive Motion State. [PDF]

Materials (Basel), 2022
Zhang S, Liu Y, Li W, Cao J, Huang J, Zhu L, Guan Z.   +6 more
europepmc   +1 more source

Atomic-level flatness on oxygen-free copper surface in lapping and chemical mechanical polishing. [PDF]

Nanoscale Adv, 2022
Liu D, Zhang Z, Feng J, Yu Z, Meng F, Xu G, Wang J, Wen W, Liu W.   +8 more
europepmc   +1 more source