Results 31 to 40 of about 6,984 (242)

CMOS-MEMS Oscillator Architecture and Phase Noise: A Mini-Review

open access: yesFrontiers in Mechanical Engineering, 2022
Over the past two decades, the advancement in microelectromechanical systems (MEMS) has been making headway in the development of miniaturized mechanical structures with integrated electronics.
Ming-Huang Li
doaj   +1 more source

CMOS voltage-controlled oscillator with high-performance MEMS tunable inductor

open access: yesMicro and Nano Systems Letters, 2021
LC CMOS voltage-controlled oscillators (VCOs) with tunable inductors are essential for high-performance, multi-band communication systems, such as IoT applications and 5G communication.
Uikyu Chae   +4 more
doaj   +1 more source

CMOS-MEMS Vibro-Impact Devices and Applications

open access: yesFrontiers in Mechanical Engineering, 2022
CMOS-MEMS-based vibro-impact devices that utilize impact-induced nonlinear dynamics have been shown to yield unique and unprecedented functionalities with on-chip integration capability.
Chun-Pu Tsai, Wei-Chang Li
doaj   +1 more source

Manufacturing Issues of BEOL CMOS-MEMS Devices

open access: yesIEEE Access, 2021
In this paper we present a comprehensive report on the issues found during the manufacturing of high-yield CMOS-MEMS sensors based on vapor-phase hydrogen fluoride (vapor- $HF$ ) oxide etching.
Juan Valle   +3 more
doaj   +1 more source

Monolithic ultrasound fingerprint sensor. [PDF]

open access: yes, 2017
This paper presents a 591×438-DPI ultrasonic fingerprint sensor. The sensor is based on a piezoelectric micromachined ultrasonic transducer (PMUT) array that is bonded at wafer-level to complementary metal oxide semiconductor (CMOS) signal processing ...
Boser, Bernhard E   +7 more
core   +1 more source

Prototype MEMS Capacitive Pressure Sensor Design and Manufacturing. [PDF]

open access: yes, 2013
This paper is intended to describe the design and manufacturing aspects of a simple micromachined capacitive pressure sensor working in the pressure range of 0-1000 mbar. 500 µm thick Borofloat® 33 glass and silicon wafers were used as substrates.
Csikósné Pap, Andrea Edit   +2 more
core   +2 more sources

Porous Alumina Based Capacitive MEMS RH Sensor [PDF]

open access: yes, 2008
The aim of a joint research and development project at the BME and HWU is to produce a cheap, reliable, low-power and CMOS-MEMS process compatible capacitive type relative humidity (RH) sensor that can be incorporated into a state-of-the-art, wireless ...
Desmulliez, Marc   +4 more
core   +4 more sources

SI-based unreleased hybrid MEMS-CMOS resonators in 32nm technology [PDF]

open access: yes, 2012
This work presents the first unreleased Silicon resonators fabricated at the transistor level of a standard CMOS process, and realized without any release steps or packaging.
Marathe, Radhika A.   +2 more
core   +2 more sources

Experiments on MEMS Integration in 0.25 μm CMOS Process

open access: yesSensors, 2018
In this paper, we share our practical experience gained during the development of CMOS-MEMS (Complementary Metal-Oxide Semiconductor Micro Electro Mechanical Systems) devices in IHP SG25 technology.
Piotr Michalik   +4 more
doaj   +1 more source

Design, fabrication and characterization of monolithic embedded parylene microchannels in silicon substrate [PDF]

open access: yes, 2006
This paper presents a novel channel fabrication technology of bulk-micromachined monolithic embedded polymer channels in silicon substrate. The fabrication process favorably obviates the need for sacrifical materials in surface-micromachined channels and
Chen, Po-Jui   +2 more
core   +2 more sources

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