Results 131 to 140 of about 161,284 (157)
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2004
Container-managed persistent Enterprise JavaBeans (EJBs) are one of the most widely used Java 2 Enterprise Edition (J2EE) components. The significance of Container-Managed Persistence (CMP) beans has become manifold in the J2EE world since the introduction of EJB 2.0 and the support for container-managed relations.
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Container-managed persistent Enterprise JavaBeans (EJBs) are one of the most widely used Java 2 Enterprise Edition (J2EE) components. The significance of Container-Managed Persistence (CMP) beans has become manifold in the J2EE world since the introduction of EJB 2.0 and the support for container-managed relations.
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2004
Tungsten CMP slurry chemistries are more reactive than oxide CMP slurries. Abrasive in a pH controlled fluid is not able to remove the tungsten metal, presumably due to the hardness and the relative inertness of tungsten. To overcome these difficulties, an oxidizer is incorporated in tungsten CMP slurries. Kaufman et al. [1] introduced the first widely
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Tungsten CMP slurry chemistries are more reactive than oxide CMP slurries. Abrasive in a pH controlled fluid is not able to remove the tungsten metal, presumably due to the hardness and the relative inertness of tungsten. To overcome these difficulties, an oxidizer is incorporated in tungsten CMP slurries. Kaufman et al. [1] introduced the first widely
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2004
Although polishing is an old technology [1, 2, 3], it has become an enabling process for the manufacture of leading-edge semiconductor devices. In the manufacture of such devices, polishing is used to maintain planarity at each step in the process of depositing and photolithographically imaging sequential insulating dielectric and conductive metal ...
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Although polishing is an old technology [1, 2, 3], it has become an enabling process for the manufacture of leading-edge semiconductor devices. In the manufacture of such devices, polishing is used to maintain planarity at each step in the process of depositing and photolithographically imaging sequential insulating dielectric and conductive metal ...
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2002
Cytidine monophosphate-N-acetylneuraminic acid hydroxylase (CMP-NeuAc hydroxylase) participates in the hydroxylation reaction of CMP-NeuAc to form CMP-N- glycolylneuraminic acid (CMP-NeuGc). The hydroxylation is carried out by an enzyme complex composed of cytochrome b5, NADH cytochrome b5 reductase, and CMP-NeuAc hydroxylase in the presence of NADH ...
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Cytidine monophosphate-N-acetylneuraminic acid hydroxylase (CMP-NeuAc hydroxylase) participates in the hydroxylation reaction of CMP-NeuAc to form CMP-N- glycolylneuraminic acid (CMP-NeuGc). The hydroxylation is carried out by an enzyme complex composed of cytochrome b5, NADH cytochrome b5 reductase, and CMP-NeuAc hydroxylase in the presence of NADH ...
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