Results 161 to 170 of about 260 (208)
Polarity‐engineered Sn‐Ti cluster photoresists for sub‐10‐nm high‐resolution lithography
Smart Molecules, EarlyView.Enhancing the polarity of clusters can optimize their patterning performance; inspired by this strategy, we designed polarity‐enhanced Sn‐Ti oxo clusters via ligand engineering. The optimal TS‐3 with exposure‐induced polarity switch achieves 8 nm patterning in lithography and achieves simultaneous improvement in resolution and patterning performance ...
Daohan Wang +10 more
wiley +1 more source
Recent advances in polymeric chemically amplified positive resists: Materials and design strategies
Smart Molecules, EarlyView.This review summarizes recent advances in the molecular design of positive chemically amplified resists, focusing on photoacid generators and polymer architectures. Key strategies for enhancing sensitivity—including self‐amplification effects, copolymerization of sensitive monomers, controlled polymerization, and photosensitized chemically amplified ...
Litao Zhou +3 more
wiley +1 more source
Small Methods, EarlyView.A local‐biasing system using AFM induces site‐specific threshold switching in Ge0.17Te0.83 films, enabling direct observation of crystalline/amorphous interface formation. First‐principles calculations reveal that this structural change induces Te 5p‐dominated mid‐gap states and electric field‐enhanced charge redistribution.
Young‐Min Kim +3 more
wiley +1 more source
Small Methods, EarlyView.We compartmentalize samples into picoliter volumes using a microfluidic device, allowing us to determine biomolecular concentration by counting molecules to depletion within a known volume without calibration. By integrating a nanopore sensor for this counting process, we also obtain real‐time data on the size, shape, and conformation of each ...
Morteza Safari +5 more
wiley +1 more source
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2020 China Semiconductor Technology International Conference (CSTIC), 2020
Machine learning based computational lithography is intended to accelerate the speed of the solutions significantly. There are three critical aspects of AI computational lithography: (1). The feature vector design, (2). The approximate mapping function construction, (3). The model training scheme.
Xuelong Shi, Shoumian Chen
exaly +2 more sources
Machine learning based computational lithography is intended to accelerate the speed of the solutions significantly. There are three critical aspects of AI computational lithography: (1). The feature vector design, (2). The approximate mapping function construction, (3). The model training scheme.
Xuelong Shi, Shoumian Chen
exaly +2 more sources
Inverse e-beam lithography on photomask for computational lithography
Journal of Micro/ Nanolithography, MEMS, and MOEMS, 2013Computational lithography, e.g., inverse lithography technique (ILT) and source mask optimization, is considered necessary for the “extremely low k1” lithography process of sub-20 nm device node. The ideal design of a curvilinear mask for computational lithography requires many changes during photomask fabrication.
Jin Choi +3 more
exaly +2 more sources
Development of a computational lithography roadmap
Proceedings of SPIE, 2008While lithography R&D community at large has already gotten the mind set for 32nm, all eyes are on 22nm node. Current consensus is to employ computational lithography to meet wafer CD uniformity (CDU) requirement. Resolution enhancement technologies (RET) and model OPC are the two fundamental components for computational lithography.
Robert John Socha +2 more
exaly +2 more sources
Photomask Technology 2020, 2020
For nanoimprint lithography, computational technologies are still being developed. In this paper, we introduce a new NIL process simulator which simulates the whole imprinting process, and evaluates the quality of the resulting resist film. To overcome the scale difference of each component of the system, which makes it difficult to calculate the ...
Toshiya Asano +2 more
exaly +2 more sources
For nanoimprint lithography, computational technologies are still being developed. In this paper, we introduce a new NIL process simulator which simulates the whole imprinting process, and evaluates the quality of the resulting resist film. To overcome the scale difference of each component of the system, which makes it difficult to calculate the ...
Toshiya Asano +2 more
exaly +2 more sources
Advances in compute hardware platforms for computational lithography
SPIE Proceedings, 2007The last six years have seen the increasing advance of computational and algorithmic complexity to compute mask patterns that retain sufficient lithographic fidelity to print and yield well enough to maintain the advances in circuit density that are the engine of the semiconductor economy.
John L Sturtevant
exaly +2 more sources
Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 2011In the recent past, scaling of semiconductor fabrication systems has been dominated by wavelength and numerical aperture modifications. This is now no longer the case for 193-nm immersion projection lithography (193i) systems as there are no technical paths for continued benefit from the in these areas.
David O. S. Melville +10 more
exaly +2 more sources