Results 1 to 10 of about 3,575 (112)

Inverse Lithography Technology (ILT) Under Chip Manufacture Context [PDF]

Micromachines
As semiconductor process nodes shrink to 3 nm and beyond, traditional optical proximity correction (OPC) and resolution enhancement technologies (RETs) can no longer meet the high patterning precision needs of advanced chip manufacturing due to the sub ...
Xiaodong Meng, Cai Chen, Jie Ni
doaj   +5 more sources

Advancements and challenges in inverse lithography technology: a review of artificial intelligence-based approaches [PDF]

Light: Science & Applications
Inverse lithography technology (ILT) is a promising approach in computational lithography to address the challenges posed by shrinking semiconductor device dimensions.
Yixin Yang, Kexuan Liu, Yunhui Gao, Chen Wang, Liangcai Cao   +4 more
doaj   +4 more sources

Adaptive reinforcement learning for lithography optimization: a scalable AI-driven solution for next-generation semiconductor manufacturing [PDF]

Scientific Reports
Semiconductor lithography, a pivotal process in integrated circuit (IC) fabrication, accounts for approximately 30% of production costs and faces significant challenges as feature sizes shrink to sub-nanometer scales.
Umar Rashid, Fahad Shafique, Hamza Atif, Waleed Waheed, Rizwan Khan, Muhammad Akmal   +5 more
doaj   +2 more sources

A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent [PDF]

Micromachines
Inverse lithography technology (ILT) based on the gradient descent (GD) algorithm, which is a classical local optimal method, can effectively improve the lithographic imaging fidelity.
Haifeng Sun, Qingyan Zhang, Jie Zhou, Jianwen Gong, Chuan Jin, Ji Zhou, Junbo Liu   +6 more
doaj   +2 more sources

EAAUnet-ILT: A Lightweight and Iterative Mask Optimization Resolution with SRAF Constraint Scheme [PDF]

Micromachines
With the continuous scaling-down of integrated circuit feature sizes, inverse lithography technology (ILT), as the most groundbreaking resolution enhancement technique (RET), has become crucial in advanced semiconductor manufacturing.
Ke Wang, Kun Ren
doaj   +2 more sources

Curvilinear Sub-Resolution Assist Feature Placement Through a Data-Driven U-Net Model [PDF]

Micromachines
In advanced semiconductor manufacturing, computational lithography, particularly sub-resolution assist features (SRAFs), is crucial for enhancing the process window.
Jiale Liu, Wenjing He, Wenhao Ding, Yuhang Wang, Yijiang Shen   +4 more
doaj   +2 more sources

Frequency-Decoupled Dual-Stage Inverse Lithography Optimization via Hierarchical Sampling and Morphological Enhancement [PDF]

Micromachines
Inverse lithography technology (ILT) plays a pivotal role in advanced semiconductor manufacturing because it enables pixel-level mask modifications, significantly enhances pattern fidelity, and expands process windows. However, traditional gradient-based
Jie Zhou, Qingyan Zhang, Haifeng Sun, Chuan Jin, Ji Zhou, Junbo Liu   +5 more
doaj   +2 more sources

Graphene patterning without plasma etching via SU-8 pattern peel-off [PDF]

Scientific Reports
Although graphene has made its way into many areas of science and technology, proper tools for patterning graphene are not available to all researchers. Therefore, any new patterning method is useful. This research investigates the patterning of graphene
Maryam Riyahi, Gholam-Mohammad Parsanasab, Mohammad Sabaeian   +2 more
doaj   +2 more sources

Inverse Lithography Source Optimization via Particle Swarm Optimization and Genetic Combined Algorithm

IEEE Photonics Journal, 2023
Inverse lithography technologies (ILTs) are critical for improving the imaging performance of lithography in advanced technology nodes. Pixel-based source optimization (SO), as an efficient part of ILTs, can be implemented via heuristic approaches to ...
Haifeng Sun, Qingyan Zhang, Chuan Jin, Yanli Li, Yan Tang, Jian Wang, Song Hu, Junbo Liu   +7 more
doaj   +1 more source

Label-free neural networks-based inverse lithography technology

Optics Express, 2022
Neural network-based inverse lithography technology (NNILT) has been used to improve the computational efficiency of large-scale mask optimization for advanced photolithography. NNILT is now mostly based on labels, and its performance is affected by the quality of labels.
Jing-Tao Chen, Yuan-Yuan Zhao, Yang Zhang, Jian-Xin Zhu, Xuan-Ming Duan   +4 more
openaire   +2 more sources