Results 1 to 10 of about 168 (150)
Inverse Lithography Technology (ILT) Under Chip Manufacture Context
MicromachinesAs semiconductor process nodes shrink to 3 nm and beyond, traditional optical proximity correction (OPC) and resolution enhancement technologies (RETs) can no longer meet the high patterning precision needs of advanced chip manufacturing due to the sub ...
Xiaodong Meng, Cai Chen, Jie Ni
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Light: Science & ApplicationsInverse lithography technology (ILT) is a promising approach in computational lithography to address the challenges posed by shrinking semiconductor device dimensions.
Yixin Yang +4 more
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IEEE Photonics Journal, 2023 Inverse lithography technologies (ILTs) are critical for improving the imaging performance of lithography in advanced technology nodes. Pixel-based source optimization (SO), as an efficient part of ILTs, can be implemented via heuristic approaches to ...
Haifeng Sun +7 more
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Label-free neural networks-based inverse lithography technology
Optics Express, 2022 Neural network-based inverse lithography technology (NNILT) has been used to improve the computational efficiency of large-scale mask optimization for advanced photolithography. NNILT is now mostly based on labels, and its performance is affected by the quality of labels.
Jing-Tao Chen +4 more
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Journal of Microelectronic Manufacturing, 2020 Inverse lithography technology (ILT) is intended to achieve optimal mask design to print a lithography target for a given lithography process. Full chip implementation of rigorous inverse lithography remains a challenging task because of enormous ...
Xuelong Shi +6 more
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A Study of 2D Assist Feature Placement
Journal of Microelectronic Manufacturing, 2020 Sub-resolution assist features have been widely recognized in lithography patterning. In general, the insertion of assist features in optically adjacent space around main designed features, will change the aerial image intensity profiles of corresponding
Liang Zhu +3 more
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Study of Inverse Lithography Approaches based on Deep Learning
Journal of Microelectronic Manufacturing, 2020 Computational lithography (CL) has become an indispensable technology to improve imaging resolution and fidelity of deep sub-wavelength lithography. The state-of-the-art CL approaches are capable of optimizing pixel-based mask patterns to effectively ...
Xianqiang Zheng +4 more
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Scientific Reports, 2023 Efficient grating couplers (GCs) for perfectly vertical coupling are difficult to realize due to the second-order back reflection. In this study, apodized GCs (AGCs) are presented for achieving perfectly-vertical coupling to 220 nm thick silicon-on ...
Mingxiang Yang +6 more
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Optics Express, 2014 Traditionally, aberration correction in extreme ultraviolet (EUV) projection optics requires the use of multiple lossy mirrors, which results in prohibitively high source power requirements. We analyze a single spherical mirror projection optical system where aberration correction is built into the mask itself, through Inverse Lithography Technology ...
Gregg, Scranton +3 more
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Multi-Objective Defocus Robust Source and Mask Optimization Using Sensitive Penalty
Applied Sciences, 2019 The continuous decrease in the size of lithographic technology nodes has led to the development of source and mask optimization (SMO) and also to the control of defocus becoming stringent in the actual lithography process.
Pengzhi Wei +5 more
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