Results 31 to 40 of about 3,728 (141)
L2O-ILT: Learning to Optimize Inverse Lithography Techniques
Inverse lithography technique (ILT) is one of the most widely used resolution enhancement techniques (RETs) to compensate for the diffraction effect in the lithography process.
Chen, Guojin +7 more
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, 2010 Inverse lithography technology (ILT) synthesizes photomasks by solving an inverse imaging problem through optimization of an appropriate functional. Much effort on ILT is dedicated to deriving superior masks at a nominal process condition.
Jia, N, Lam, EY
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High-performance grating couplers by inverse design for perfectly vertical coupling
, 2023 In the application of free-space optical (FSO) communication, grating couplers (GCs) are the key components, enabling the coupling of the vertically incident optical beam to optical waveguides.
YUNJIE YAN (14710696) +4 more
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Efficient mask synthesis with augmented Lagrangian methods in computational lithography
, 2013 A fast approach based on augmented Lagrangian methods (ALMs) is proposed to solve the inverse imaging problem in optical lithography, known as inverse lithography technology.
Lam, EY, Li, J
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Line search based inverse lithography technique for mask design
, 2012 Following moore's law, microelectronic fabrication techniques have been developed to fabricate deep-submicron devices. Device feature size on wafer turns to be much smaller than the illumination source of nowadays widely used lithography equipments ...
Zhao, Xin
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Evolutionary Multi-Agent Computing In Inverse Problems
, 2013 The paper tackles the application of evolutionary multi-agent computing to solving inverse problems. High costs of fitness function call become a major difficulty when approachingthese problems with population-based heuristics, however evolutionary agent-
Paszyński, M +11 more
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Regularization of inverse photomask synthesis to enhance manufacturability [PDF]
, 2009 Mask manufacturability has been considered as a major issue in the adoption of inverse lithography (IL) in practice. With smaller technology nodes, IL distorts the mask pattern more aggressively.
Wong, AK, Jia, N, Lam, EY
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Inverse lithography technology based on a physics-guided reinforcement learning framework
Optics ExpressInverse lithography technology (ILT) is a pixel-level mask optimization technique that enhances the resolution of lithography systems to improve chip manufacturing yields. Although ILT has been widely studied in academia, its practical applications are often limited by computational complexity and mask manufacturability issues.
Haoyu Wang +3 more
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RuleLearner: OPC Rule Extraction From Inverse Lithography Technique Engine
Model-based optical proximity correction (OPC) with subresolution assist feature (SRAF) generation is a critical standard practice for compensating lithography distortions in the fabrication of integrated circuits at advanced technology nodes.
Chen, Guojin +8 more
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Design for Manufacturability in Advanced Lithography Technologies
, 2016 As the technology nodes keep shrinking following Moore's law, lithography becomes increasingly critical to the fabrication of integrated circuits.
Ding, Yixiao
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