Results 51 to 60 of about 3,728 (141)

Bandwidth-aware fast inverse lithography technology using Nesterov accelerated gradient

Optics Express
Inverse lithography technology (ILT) is a leading-edge method for improving the resolution and image fidelity of optical lithography systems in semiconductor manufacturing. However, the massive computational complexity of ILT presents the inherent runtime bottleneck, which hinders its application to the large-scale lithography layouts.
Wensheng Chen, Xu Ma, Shengen Zhang
openaire   +1 more source

Fabrication of Silicon Monolithic Tubes with High-Aspect-Ratio Cavities Using Langmuir-Blodgett Colloidal Lithography and Bayesian-Optimized Continuous Plasma Etching. [PDF]

ACS Omega
Osipov A, Fumina A, Belyanov I, Speshilova A, Endiiarova E, Gerdt A.   +5 more
europepmc   +1 more source

High-Efficiency Fiber Edge Coupling for Silicon Nitride Integrated Photonics. [PDF]

Micromachines (Basel)
Avdeev SS, Baburin AS, Sergeev EV, Kramarenko AB, Belyaev AV, Kushnev DV, Buzaverov KA, Stepanov IA, Echeistov VV, Loginov AS, Bukatin SV, Amiraslanov AS, Lotkov ES, Baklykov DA, Rodionov IA.   +14 more
europepmc   +1 more source

Full-space inverse-designed meta-optics for complex vector field shaping of intracavity landscapes. [PDF]

Light Sci Appl
Xu M, Sang D, Pu M, Gao P, Zhao B, Zheng Y, Zeng Q, Chen L, Zhang F, Guo Y, Li X, Ma X, Fu Y, Luo X.   +13 more
europepmc   +1 more source

Extending the boundaries of ultraviolet-visible meta-optics via direct imprinting of tantalum pentoxide composite. [PDF]

Microsyst Nanoeng
Lee E, Kang H, Yun H, Rho J.
europepmc   +1 more source

Prepatterned Superconducting Contacts for Clean Superconductor-Topological Material Interfaces Enabling Long-Range Josephson Coupling. [PDF]

Nano Lett
Choi YB, Choi CW, Holtzman L, Kim H, Kang S, Watanabe K, Taniguchi T, Hone J, Kim JS, Choi SY, Lee GH.   +10 more
europepmc   +1 more source

The Principle and Development of Optical Maskless Lithography Based Digital Micromirror Device (DMD). [PDF]

Micromachines (Basel)
Li X, Cui G, Xu G.
europepmc   +1 more source

EPE contribution analysis method of multiple patterning lithography by Monte Carlo and Sobol sensitivity analysis. [PDF]

Nanoscale Adv
Ai F, Su X, Su Y, Wei Y.
europepmc   +1 more source

Bayesian Optimization for the Formation of Vertically Oriented Silicon Structures Using Langmuir-Blodgett Colloidal Lithography and Plasma Chemical Etching. [PDF]

ACS Omega
Osipov A, Fumina A, Belyanov I, Speshilova A, Endiiarova E, Gerdt A.   +5 more
europepmc   +1 more source

Ultraviolet metasurface-enabled flat-top beam shaping with size preservation uniformity and broadband robustness. [PDF]

Sci Rep
Li W, Li J, Zhao T, Li Y, Wang C, Li P, Zheng Z, Ding F, Li H.   +8 more
europepmc   +1 more source