Results 41 to 50 of about 3,728 (141)
The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm
, 2023 As an effective resolution enhancement technology, source optimization (SO) is considered key for significantly improving the image quality of optical lithography at advanced nodes.
Haifeng Sun +5 more
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Lithography aware physical design and layout optimization for manufacturability [PDF]
, 2014 textAs technology continues to scale down, semiconductor manufacturing with 193nm lithography is greatly challenging because the required half pitch size is beyond the resolution limit.
Gao, Jhih-Rong
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Experimental Machine Learning for Aperiodic Wafer-Scale Photonics Inverse Design
In this work, we propose a novel framework for large-scale aperiodic nanophotonic inverse design utilizing an experimental machine-learning technique. With this technique, we create an extensive dataset of 10 million experimental structures for enhanced ...
Wang, Qizhou +5 more
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On the Schwarzschild Effect in 3D Two‐Photon Laser Lithography
, 2019 International audienceThe two‐photon Schwarzschild effect in photoresists suitable for 3D laser lithography is revisited. The study ranges over seven orders of magnitude in exposure time (from 1 µs to 10 s) and investigates a wide variety of different ...
Kadic, Muamer +17 more
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Nanoimprint Lithography for Nanophotonics in Silicon [PDF]
, 2008 A novel inverse imprinting procedure for nanolithography is presented which offers a transfer accuracy and feature definition that is comparable to state-of-the-art nanofabrication techniques.
Burresi, Matteo +10 more
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, 2007 The scientific problems treated in this thesis are expressed within the framework of statistical optics and are generated out of the optical lithography industry. Optical lithography uses partially coherent light, i.e.
Rydberg, Christer
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Synthesis of Critical Patterns for Lithography Optimizations Through Machine Learning
Critical patterns are layout patterns that cannot be corrected by standard MB-OPC with enough accuracy. Since they are infrequent, lithography applications targeting critical patterns such as inverse lithography technology (ILT) can suffer from ...
Zhang, Shilong +2 more
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, 2011 Inverse lithography technique, which treats mask synthesis as an inverse problem, has been considered as a strong contender to deal with the 45 nm technology node and beyond.
Yao Peng +3 more
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Computational lithography with advanced optimization algorithms
, 2016 Lithography techniques have long been the driving power for the advancement of Moore’s law for the semiconductor industry. In recent years, next generation lithog- raphy techniques, such as extreme ultraviolet lithography, have been extensively de- layed.
吴小飞, Wu, Xiaofei
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Advanced materials, process, and designs for silicon photonic integration [PDF]
, 2009 Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2009.Includes bibliographical references (p. 229-235).The copper (Cu) interconnect has become the bottleneck for bandwidth scaling due to its increasing ...
Sun, Rong, Ph. D. Massachusetts Institute of Technology
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