Results 21 to 30 of about 3,728 (141)
Manufacturing flexible light-emitting polymer displays with conductive lithographic film technology
, 2001 We report on a new low-cost manufacturing process for flexible displays that has the potential to rapidly expand the market into areas that have traditionally been outside the scope of such technology.
Kilitziraki, M +3 more
core +1 more source
Functional Micro–Nano Structure with Variable Colour: Applications for Anti-Counterfeiting
Advances in Polymer Technology, 2019 Colour patterns based on micro-nano structure have attracted enormous research interests due to unique optical switches and smart surface applications in photonic crystal, superhydrophobic surface modification, controlled adhesion, inkjet printing ...
Hailu Liu +4 more
doaj +1 more source
Rect-SRAF method in inverse lithography technology
Optics ExpressThe effect of inserting curved and rectangular sub-resolution assist features (SRAFs) into the initial mask on inverse lithography technology (ILT) is studied. On the basis of level set based ILT, SRAFs are added when constructing the initial 3D surface, which will affect the output mask.
Fei Ai +5 more
openaire +2 more sources
RF circulator structures via offset lithography
, 1999 Further developments are reported of the conductive lithographic film (CLF) process in which components of radio-frequency circulators are fabricated economically via offset lithography.
Harrey, PM +3 more
core +1 more source
Ordered arrays of 〈100〉-oriented silicon nanorods by CMOS-compatible block copolymer lithography
, 2021 Dense, ordered arrays of 〈100〉-oriented Si nanorods with uniform aspect ratios up to 5:1 and a uniform diameter of 15 nm were fabricated by block copolymer lithography based on the inverse of the traditional cylindrical hole strategy and reactive ion ...
김동하
core +1 more source
, 2010 Inverse lithography, as a mask design tool, has the capability of producing unintuitive patterns with topologies much different from those obtained from either rule-based or model-based optical proximity correction (OPC). These mask patterns may have the
Edmund Y. Lam, Lam, EY
core +1 more source
Pixelated source mask optimization for process robustness in optical lithography [PDF]
, 2011 Optical lithography has enabled the printing of progressively smaller circuit patterns over the years. However, as the feature size shrinks, the lithographic process variation becomes more pronounced.
Edmund Y. Lam +3 more
core +1 more source
Inverse Reticle Optimization With Quantum Annealing and Hybrid Solvers
IEEE AccessReticle optimization is a computationally demanding task in optical microlithography for advanced semiconductor fabrication. In this study, we explore the effectiveness of D-Wave’s quantum annealing (QA) and hybrid steepest descent (SD) solvers in
Po-Hsun Fang +3 more
doaj +1 more source
Development of paper membrane switches for fully featured computer keyboards
, 2000 This paper documents the successful development and evaluation of a novel membrane switch. The process results in lower environmental burdens and manufacturing costs than current screen-printed polyester solutions.
B. Ramsey +3 more
core +1 more source
End-to-end metasurface inverse design for single-shot multi-channel imaging
, 2022 We introduce end-to-end inverse design for multi-channel imaging, in which a nanophotonic frontend is optimized in conjunction with an image-processing backend to extract depth, spectral and polarization channels from a single monochrome image.
Pestourie, Raphaël +6 more
core +1 more source