Results 21 to 30 of about 168 (150)
EAAUnet-ILT: A Lightweight and Iterative Mask Optimization Resolution with SRAF Constraint Scheme
With the continuous scaling-down of integrated circuit feature sizes, inverse lithography technology (ILT), as the most groundbreaking resolution enhancement technique (RET), has become crucial in advanced semiconductor manufacturing.
Ke Wang, Kun Ren
doaj +1 more source
3D Hydrodynamic Flow Lithography
ABSTRACT Continuous‐ and stop‐flow lithography are widely used to fabricate multi‐dimensional microstructures whose cross‐sectional morphology is dictated by the flow profile of multiple co‐flowing streams. Here, we introduce three‐dimensional hydrodynamic flow lithography (3D HFL), a platform for programmable generation of multi‐layered flow profiles ...
Yiying Zou +5 more
wiley +1 more source
Semiconductor lithography, a pivotal process in integrated circuit (IC) fabrication, accounts for approximately 30% of production costs and faces significant challenges as feature sizes shrink to sub-nanometer scales.
Umar Rashid +5 more
doaj +1 more source
Inverse Reticle Optimization With Quantum Annealing and Hybrid Solvers
Reticle optimization is a computationally demanding task in optical microlithography for advanced semiconductor fabrication. In this study, we explore the effectiveness of D-Wave’s quantum annealing (QA) and hybrid steepest descent (SD) solvers in
Po-Hsun Fang +3 more
doaj +1 more source
Micro‐ and nano‐patterned elastin‐like recombinamer (ELR) hydrogels integrate bioactive matrix chemistry with defined surface topography. The combined cues promote rapid endothelial cell capture, alignment, and monolayer formation on soft substrates.
Jagoda Litowczenko +8 more
wiley +1 more source
Curvilinear Sub-Resolution Assist Feature Placement Through a Data-Driven U-Net Model
In advanced semiconductor manufacturing, computational lithography, particularly sub-resolution assist features (SRAFs), is crucial for enhancing the process window.
Jiale Liu +4 more
doaj +1 more source
Opportunities of Semiconducting Oxide Nanostructures as Advanced Luminescent Materials in Photonics
The review discusses the challenges of wide and ultrawide bandgap semiconducting oxides as a suitable material platform for photonics. They offer great versatility in terms of tuning microstructure, native defects, doping, anisotropy, and micro‐ and nano‐structuring. The review focuses on their light emission, light‐confinement in optical cavities, and
Ana Cremades +7 more
wiley +1 more source
Universal Conductance Fluctuations in Quantum Anomalous Hall Insulators
Universal conductance fluctuations are observed in mesoscopic quantum anomalous Hall insulators. Two distinct fluctuation patterns are identified, arising from different interference processes of bulk and chiral edge states, respectively. These findings unveil rich quantum interference phenomena in quantum anomalous Hall insulators and provide insights
Peng Deng +11 more
wiley +1 more source
A Nb‐proximitized Josephson junction based on a WTe2/α‐Fe2O3 heterostructure exhibits a robust superconducting diode effect with programmable polarity. The diode direction can be trained by magnetic fields and switched by temperature cycling, revealing tunable finite‐momentum pairing states and competing superconducting states in symmetry‐broken ...
Enze Zhang +9 more
wiley +1 more source
n‐Type Polymer Radio Frequency Rectifiers Operating at 18.5 GHz
Combining an n‐doped polymer semiconductor with wafer‐scale asymmetric planar electrodes featuring work function‐engineered contacts yields radio‐frequency diodes and rectifying circuits operating at up to 18.5 GHz. The devices combine scalable manufacturing with an operating frequency previously unattainable by large‐area organic electronics ...
Lazaros Panagiotidis +19 more
wiley +1 more source

