Results 11 to 20 of about 168 (150)
ILILT: Implicit Learning of Inverse Lithography Technologies
Lithography, transferring chip design masks to the silicon wafer, is the most important phase in modern semiconductor manufacturing flow. Due to the limitations of lithography systems, Extensive design optimizations are required to tackle the design and silicon mismatch.
Haoyu Yang, Haoxing Ren
openaire +3 more sources
Functional Micro–Nano Structure with Variable Colour: Applications for Anti-Counterfeiting
Colour patterns based on micro-nano structure have attracted enormous research interests due to unique optical switches and smart surface applications in photonic crystal, superhydrophobic surface modification, controlled adhesion, inkjet printing ...
Hailu Liu +4 more
doaj +1 more source
Inverse lithography technology (ILT) plays a pivotal role in advanced semiconductor manufacturing because it enables pixel-level mask modifications, significantly enhances pattern fidelity, and expands process windows. However, traditional gradient-based
Jie Zhou +5 more
doaj +1 more source
Advances in Sustainable and Wearable Textile Based Soft Robotics
This Review examines advances in wearable textile‐based soft robotics, focusing on sustainable materials, integrated sensing, and scalable actuation. It discusses manufacturing and system integration across healthcare, assistive robotics, prosthetics, and human–machine interfaces, and highlights key challenges in circular design, including life‐cycle ...
Zahir Abbas +6 more
wiley +1 more source
Rect-SRAF method in inverse lithography technology
The effect of inserting curved and rectangular sub-resolution assist features (SRAFs) into the initial mask on inverse lithography technology (ILT) is studied. On the basis of level set based ILT, SRAFs are added when constructing the initial 3D surface, which will affect the output mask.
Fei Ai +5 more
openaire +2 more sources
A printed superparamagnetic nanoparticle‐based flux guide enables the realization of a hysteresis‐free three‐axis magnetic sensor. This innovative architecture efficiently redirects out‐of‐plane fields to planar sensing elements, facilitating simultaneous vector detection without complex reset protocols.
Changyeop Jeon +10 more
wiley +1 more source
Two‐photon grayscale lithography (2GL) enables high‐speed and precise 3D printing of thermolyzed silica glass microstructures with optical‐grade surface quality, high quality factors, and mechanical strength utilizing a custom‐made pre‐glass resist based on polyhedral oligomeric silsesquioxane (POSS) modified with a high‐sensitivity Norrish type II ...
Jonathan L. G. Schneider +4 more
wiley +1 more source
Inverse lithography technology (ILT) based on the gradient descent (GD) algorithm, which is a classical local optimal method, can effectively improve the lithographic imaging fidelity.
Haifeng Sun +6 more
doaj +1 more source
Ferroelectric Polarization Enabled Threshold Voltage Modulation in High Electron Mobility Transistor
A comprehensive model is developed to capture the coupled electrostatics of a ferroelectric capacitor and a metal‐insulator‐semiconductor high electron mobility transistor (MISHEMT) connected in ferroelectric‐metal high electron mobility transistor (FeMHEMT) configuration.
Wentian Gao +4 more
wiley +1 more source
One‐Step Curcumin‐Mediated Multiphoton Lithography for Bioactive 3D Scaffolds
Curcumin‐mediated multiphoton lithography enables one‐step fabrication of highly architected complex gelatin methacryloyl scaffolds by exploiting curcumin as a multifunctional bioactive photoinitiator. The resulting 3D structures support mesenchymal stem cell adhesion, proliferation, and migration, while exhibiting dual antibacterial activity through ...
Myrto Charitaki +7 more
wiley +1 more source

