Results 11 to 20 of about 3,871 (202)
Journal of Microelectronic Manufacturing, 2020 Inverse lithography technology (ILT) is intended to achieve optimal mask design to print a lithography target for a given lithography process. Full chip implementation of rigorous inverse lithography remains a challenging task because of enormous ...
Xuelong Shi +6 more
doaj +1 more source
A Study of 2D Assist Feature Placement
Journal of Microelectronic Manufacturing, 2020 Sub-resolution assist features have been widely recognized in lithography patterning. In general, the insertion of assist features in optically adjacent space around main designed features, will change the aerial image intensity profiles of corresponding
Liang Zhu +3 more
doaj +1 more source
Study of Inverse Lithography Approaches based on Deep Learning
Journal of Microelectronic Manufacturing, 2020 Computational lithography (CL) has become an indispensable technology to improve imaging resolution and fidelity of deep sub-wavelength lithography. The state-of-the-art CL approaches are capable of optimizing pixel-based mask patterns to effectively ...
Xianqiang Zheng +4 more
doaj +1 more source
Toward High-Resolution Polymeric Neural Interfaces: A Practical Guide for Electron Beam Lithography. [PDF]
Adv Sci (Weinh)Electron beam lithography (EBL) enables sub‐micron patterning of polymer‐based neural implants, overcoming the resolution limits of optical lithography. By addressing challenges such as charging, non‐planarity, and substrate heating, it supports higher channel density, improved miniaturization, and better long‐term tissue integration.
Karlsson-Fernberg H, Asplund M.
europepmc +2 more sources
Scientific Reports, 2023 Efficient grating couplers (GCs) for perfectly vertical coupling are difficult to realize due to the second-order back reflection. In this study, apodized GCs (AGCs) are presented for achieving perfectly-vertical coupling to 220 nm thick silicon-on ...
Mingxiang Yang +6 more
doaj +1 more source
Microfluidic Gratings for X-Ray Phase Contrast Imaging. [PDF]
Adv Sci (Weinh)This work establishes a new protocol for the fabrication of X‐ray gratings that exploits the advantages of microfluidics and enables a more inexpensive, faster, and scalable production process. These X‐ray devices are fundamental for implementing X‐ray phase contrast imaging (XPCI) in laboratory and clinical settings, yet their costly and complex ...
Rossi A +10 more
europepmc +2 more sources
Optics Express, 2014 Traditionally, aberration correction in extreme ultraviolet (EUV) projection optics requires the use of multiple lossy mirrors, which results in prohibitively high source power requirements. We analyze a single spherical mirror projection optical system where aberration correction is built into the mask itself, through Inverse Lithography Technology ...
Gregg, Scranton +3 more
openaire +2 more sources
Multi-Objective Defocus Robust Source and Mask Optimization Using Sensitive Penalty
Applied Sciences, 2019 The continuous decrease in the size of lithographic technology nodes has led to the development of source and mask optimization (SMO) and also to the control of defocus becoming stringent in the actual lithography process.
Pengzhi Wei +5 more
doaj +1 more source
ILILT: Implicit Learning of Inverse Lithography Technologies
CoRRLithography, transferring chip design masks to the silicon wafer, is the most important phase in modern semiconductor manufacturing flow. Due to the limitations of lithography systems, Extensive design optimizations are required to tackle the design and silicon mismatch.
Haoyu Yang, Haoxing Ren
openaire +4 more sources
Functional Micro–Nano Structure with Variable Colour: Applications for Anti-Counterfeiting
Advances in Polymer Technology, 2019 Colour patterns based on micro-nano structure have attracted enormous research interests due to unique optical switches and smart surface applications in photonic crystal, superhydrophobic surface modification, controlled adhesion, inkjet printing ...
Hailu Liu +4 more
doaj +1 more source