Results 11 to 20 of about 3,728 (141)
ILILT: Implicit Learning of Inverse Lithography Technologies
CoRRLithography, transferring chip design masks to the silicon wafer, is the most important phase in modern semiconductor manufacturing flow. Due to the limitations of lithography systems, Extensive design optimizations are required to tackle the design and silicon mismatch.
Haoyu Yang, Haoxing Ren
openaire +4 more sources
Inverse Lithography Physics-informed Deep Neural Level Set for Mask Optimization
, 2023 As the feature size of integrated circuits continues to decrease, optical proximity correction (OPC) has emerged as a crucial resolution enhancement technology for ensuring high printability in the lithography process.
Ma, Xing-Yu, Hao, Shaogang
core +2 more sources
Journal of Microelectronic Manufacturing, 2020 Inverse lithography technology (ILT) is intended to achieve optimal mask design to print a lithography target for a given lithography process. Full chip implementation of rigorous inverse lithography remains a challenging task because of enormous ...
Xuelong Shi +6 more
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A Study of 2D Assist Feature Placement
Journal of Microelectronic Manufacturing, 2020 Sub-resolution assist features have been widely recognized in lithography patterning. In general, the insertion of assist features in optically adjacent space around main designed features, will change the aerial image intensity profiles of corresponding
Liang Zhu +3 more
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Study of Inverse Lithography Approaches based on Deep Learning
Journal of Microelectronic Manufacturing, 2020 Computational lithography (CL) has become an indispensable technology to improve imaging resolution and fidelity of deep sub-wavelength lithography. The state-of-the-art CL approaches are capable of optimizing pixel-based mask patterns to effectively ...
Xianqiang Zheng +4 more
doaj +1 more source
Scientific Reports, 2023 Efficient grating couplers (GCs) for perfectly vertical coupling are difficult to realize due to the second-order back reflection. In this study, apodized GCs (AGCs) are presented for achieving perfectly-vertical coupling to 220 nm thick silicon-on ...
Mingxiang Yang +6 more
doaj +1 more source
Optics Express, 2014 Traditionally, aberration correction in extreme ultraviolet (EUV) projection optics requires the use of multiple lossy mirrors, which results in prohibitively high source power requirements. We analyze a single spherical mirror projection optical system where aberration correction is built into the mask itself, through Inverse Lithography Technology ...
Gregg, Scranton +3 more
openaire +2 more sources
Multi-Objective Defocus Robust Source and Mask Optimization Using Sensitive Penalty
Applied Sciences, 2019 The continuous decrease in the size of lithographic technology nodes has led to the development of source and mask optimization (SMO) and also to the control of defocus becoming stringent in the actual lithography process.
Pengzhi Wei +5 more
doaj +1 more source
Advances in lithography: Introduction to the feature. Editorial
, 2022 S.L11-L12Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years.
Erdmann, A. +3 more
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Self-assembled photonic mesostructures for water splitting photoanodes [PDF]
, 2015 Solar water splitting is a relevant principle for the production of green hydrogen fuel. A wealth of different designs has been envisioned to produce hydrogen using sunlight.
Boudoire, Florent
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