Inverse Lithography Technology (ILT) Under Chip Manufacture Context [PDF]
MicromachinesAs semiconductor process nodes shrink to 3 nm and beyond, traditional optical proximity correction (OPC) and resolution enhancement technologies (RETs) can no longer meet the high patterning precision needs of advanced chip manufacturing due to the sub ...
Xiaodong Meng, Cai Chen, Jie Ni
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Patterning Fidelity Enhancement and Aberration Mitigation in EUV Lithography Through Source–Mask Optimization [PDF]
MicromachinesExtreme ultraviolet (EUV) lithography faces critical challenges in aberration control and patterning fidelity as technology nodes shrink below 3 nm. This work demonstrates how Source–Mask Optimization (SMO) simultaneously addresses both illumination and ...
Qi Wang +4 more
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Adaptive reinforcement learning for lithography optimization: a scalable AI-driven solution for next-generation semiconductor manufacturing [PDF]
Scientific ReportsSemiconductor lithography, a pivotal process in integrated circuit (IC) fabrication, accounts for approximately 30% of production costs and faces significant challenges as feature sizes shrink to sub-nanometer scales.
Umar Rashid +5 more
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Advancements and challenges in inverse lithography technology: a review of artificial intelligence-based approaches [PDF]
Light: Science & ApplicationsInverse lithography technology (ILT) is a promising approach in computational lithography to address the challenges posed by shrinking semiconductor device dimensions.
Yixin Yang +4 more
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Information theoretical approaches in computational lithography
Optics Express, 2018 Computational lithography is nowadays playing an indispensible role in improving the imaging performance of optical lithography systems. This paper develops a new and powerful approach to computational lithography by introducing an information theoretical channel modeling in partially coherent lithography systems.
Xu Ma +2 more
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Publication guidelines for papers involving computational lithography [PDF]
Journal of Micro-nanopatterning, Materials, and Metrology, 2021 Editor-in-Chief Harry Levinson introduces a new set of guidelines for papers related to computational lithography.
Harry J Levinson
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Fast micromirror selection and angle setting algorithm for freeform pupil in the illumination system for immersion lithography machines [PDF]
Scientific ReportsAs lithography resolution improves, the performance requirements for illumination pupils in immersion lithography machines have become increasingly stringent, particularly regarding energy balance and polarization properties.
Zhenxin Huang, Zenghui Yang, Aijun Zeng
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Frequency-Decoupled Dual-Stage Inverse Lithography Optimization via Hierarchical Sampling and Morphological Enhancement [PDF]
MicromachinesInverse lithography technology (ILT) plays a pivotal role in advanced semiconductor manufacturing because it enables pixel-level mask modifications, significantly enhances pattern fidelity, and expands process windows. However, traditional gradient-based
Jie Zhou +5 more
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Optics Express, 2023 This paper reminds the principle and characteristics of plasmonic lithography, and points out the importance of establishing a fast and high precision plasmonic lithography imaging model and developing computational lithography. According to the characteristics of plasmonic lithography, the rigorous coupled-wave analysis (RCWA) algorithm is a very ...
Huwen Ding, Taian Fan, Libin Zhang
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EAAUnet-ILT: A Lightweight and Iterative Mask Optimization Resolution with SRAF Constraint Scheme [PDF]
MicromachinesWith the continuous scaling-down of integrated circuit feature sizes, inverse lithography technology (ILT), as the most groundbreaking resolution enhancement technique (RET), has become crucial in advanced semiconductor manufacturing.
Ke Wang, Kun Ren
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