Results 1 to 10 of about 260 (208)
Information theoretical approaches in computational lithography
Optics Express, 2018 Computational lithography is nowadays playing an indispensible role in improving the imaging performance of optical lithography systems. This paper develops a new and powerful approach to computational lithography by introducing an information theoretical channel modeling in partially coherent lithography systems.
Gonzalo Arce +2 more
exaly +3 more sources
Publication guidelines for papers involving computational lithography [PDF]
Journal of Micro-nanopatterning, Materials, and Metrology, 2021 Editor-in-Chief Harry Levinson introduces a new set of guidelines for papers related to computational lithography.
Harry J Levinson
exaly +2 more sources
Optics Express, 2023 This paper reminds the principle and characteristics of plasmonic lithography, and points out the importance of establishing a fast and high precision plasmonic lithography imaging model and developing computational lithography. According to the characteristics of plasmonic lithography, the rigorous coupled-wave analysis (RCWA) algorithm is a very ...
Libin Zhang, Huwen Ding
exaly +3 more sources
IEEE Access, 2022 The mode matching method is an efficient solution to conventional microwave waveguide problems for its dimensionality advantages. It is theoretically extendable to computational lithography problems in nano scales with periodic boundary condition.
Jia Liu +4 more
doaj +1 more source
Study of Inverse Lithography Approaches based on Deep Learning
Journal of Microelectronic Manufacturing, 2020 Computational lithography (CL) has become an indispensable technology to improve imaging resolution and fidelity of deep sub-wavelength lithography. The state-of-the-art CL approaches are capable of optimizing pixel-based mask patterns to effectively ...
Xianqiang Zheng +4 more
doaj +1 more source
Inverse design of high-NA metalens for maskless lithography
Nanophotonics, 2023 We demonstrate an axisymmetric inverse-designed metalens to improve the performance of zone-plate-array lithography (ZPAL), one of the maskless lithography approaches, that offer a new paradigm for nanoscale research and industry.
Chung Haejun +4 more
doaj +1 more source
Critical Pattern Selection Method Based on CNN Embeddings for Full-Chip Optimization
Photonics, 2023 Source mask optimization (SMO), a primary resolution enhancement technology, is one of the most pivotal technologies for enhancing lithography imaging quality.
Qingyan Zhang +6 more
doaj +1 more source
Transient Dynamical-Thermal-Optical System Modeling and Simulation [PDF]
EPJ Web of Conferences, 2020 In this work, methods and procedures are investigated for the holistic simulation of the dynamicalthermal behavior of high-performance optics like lithography objectives.
Hahn Luzia, Eberhard Peter
doaj +1 more source
Computation Lithography: Virtual Reality and Virtual Virtuality [PDF]
ECS Transactions, 2009 Computation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensible-ness and technical feasibility.
Wong, AKK, Lam, EY
openaire +5 more sources
Journal of Microelectronic Manufacturing, 2020 Inverse lithography technology (ILT) is intended to achieve optimal mask design to print a lithography target for a given lithography process. Full chip implementation of rigorous inverse lithography remains a challenging task because of enormous ...
Xuelong Shi +6 more
doaj +1 more source