Results 21 to 30 of about 7,747 (289)

Inverse design of high-NA metalens for maskless lithography

Nanophotonics, 2023
We demonstrate an axisymmetric inverse-designed metalens to improve the performance of zone-plate-array lithography (ZPAL), one of the maskless lithography approaches, that offer a new paradigm for nanoscale research and industry.
Chung Haejun, Zhang Feng, Li Hao, Miller Owen D., Smith Henry I.   +4 more
doaj   +1 more source

Transient Dynamical-Thermal-Optical System Modeling and Simulation [PDF]

EPJ Web of Conferences, 2020
In this work, methods and procedures are investigated for the holistic simulation of the dynamicalthermal behavior of high-performance optics like lithography objectives.
Hahn Luzia, Eberhard Peter
doaj   +1 more source

Computation Lithography: Virtual Reality and Virtual Virtuality [PDF]

ECS Transactions, 2009
Computation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensible-ness and technical feasibility.
Wong, AKK, Lam, EY
openaire   +5 more sources

Extended Abbe approach for fast and accurate lithography imaging simulations

, 2022
Paper 747007This paper presents an extended Abbe based imaging algorithm for faster and more accurate simulations of current and future projection lithography systems.
Evanschitzky, P., Erdmann, A., Fühner, T.   +2 more
core   +1 more source

Fast and Accurate Machine Learning Inverse Lithography Using Physics Based Feature Maps and Specially Designed DCNN

Journal of Microelectronic Manufacturing, 2020
Inverse lithography technology (ILT) is intended to achieve optimal mask design to print a lithography target for a given lithography process. Full chip implementation of rigorous inverse lithography remains a challenging task because of enormous ...
Xuelong Shi, Yan Yan, Tao Zhou, Xueru Yu, Chen Li, Shoumian Chen, Yuhang Zhao   +6 more
doaj   +1 more source

Line-Edge Roughness from Extreme Ultraviolet Lithography to Fin-Field-Effect-Transistor: Computational Study

Micromachines, 2021
Although extreme ultraviolet lithography (EUVL) has potential to enable 5-nm half-pitch resolution in semiconductor manufacturing, it faces a number of persistent challenges.
Sang-Kon Kim
doaj   +1 more source

Basic approaches to simulation of resist mask formation in computational lithography [PDF]

Modern Electronic Materials, 2020
Main currently used resist mask formation models and problems solved have been overviewed. Stages of "full physical simulation" have been briefly analyzed based on physicochemical principles for conventional diazonapthoquinone (DNQ ...
Nikita N. Balan, Vladidmir V. Ivanov, Alexey V. Kuzovkov, Evgenia V. Sokolova, Evgeniy S. Shamin   +4 more
doaj   +3 more sources

Compressive Sensing Approaches for Lithographic Source and Mask Joint Optimization

Journal of Microelectronic Manufacturing, 2018
Source and mask joint optimization (SMO) is a widely used computational lithography method for state-of-the-art optical lithography process to improve the yield of semiconductor wafers.
Xu Ma, Zhiqiang Wang, Gonzalo R. Arce
doaj   +1 more source

Resolution enhancements for semiconductor lithography: A computational perspective

, 2022
Paper IM4F.3The presentation reviews optics- and material-driven resolution enhancements in DUV and EUV projection lithography for semiconductor fabrication with special emphasis on the application of computational methods for the exploration and ...
Erdmann, A.
core   +1 more source

Computational modelling and optimisation of the fabrication of nano-structures using focused ion beam and imprint forming technologies [PDF]

, 2010
Focused Ion Beam (FIB) and Nano-Imprint Forming (NIF) have gained recently major interest because of their potential to enable the fabrication of precision engineering parts and to deliver high resolution, low-cost and high-throughput production of fine
Desmulliez, M.; id_orcid, Bailey, C., Marson, S., D Allen, Stoyanov, S., Marson, Silvia, C Bailey, A Dyer, Desmulliez, M., Allen, D., Y K Tang, Dyer, A., M Desmulliez, Allen, David M., Tang, Y.K., S Marson, Tang, Y. K., S Stoyanov   +17 more
core   +1 more source