Scalable Crackle-Lithography for Multifunctional Enclosed Plastic Nanofluidic Devices. [PDF]
Adv Sci (Weinh)Crackle‐lithography enables scalable fabrication of enclosed plastic‐substrate‐based nanofluidic devices with interconnected nanochannels that enable molecular transport, optical interrogation, confined electroless copper deposition, and ionic memristive behavior.
Dumpala TR +8 more
europepmc +2 more sources
Micromachines, 2021 Although extreme ultraviolet lithography (EUVL) has potential to enable 5-nm half-pitch resolution in semiconductor manufacturing, it faces a number of persistent challenges.
Sang-Kon Kim
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Basic approaches to simulation of resist mask formation in computational lithography [PDF]
Modern Electronic Materials, 2020 Main currently used resist mask formation models and problems solved have been overviewed. Stages of "full physical simulation" have been briefly analyzed based on physicochemical principles for conventional diazonapthoquinone (DNQ ...
Nikita N. Balan +4 more
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Application of the three-state lithography model for grayscale lithography
, 2022 In this work, we focus on the application of the "three-state lithography model" developed for the production of 3D-topographies in photoresist through grayscale lithography.
Badawi, Bassem, Kutter, Christoph
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Compressive Sensing Approaches for Lithographic Source and Mask Joint Optimization
Journal of Microelectronic Manufacturing, 2018 Source and mask joint optimization (SMO) is a widely used computational lithography method for state-of-the-art optical lithography process to improve the yield of semiconductor wafers.
Xu Ma, Zhiqiang Wang, Gonzalo R. Arce
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The Evolution and Challenges of Lithography Technology in the Integrated Circuit Industry [PDF]
MATEC Web of ConferencesAs transistor continue to shrink, the quantum tunnelling effect increases significantly, which causes Moore’s Law gradually becoming invalid, and the society’s demand of computational power grow continually.
Zhang Jiazhen
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Charge storage in mesoscopic graphitic islands fabricated using AFM bias lithography [PDF]
, 2011 Electrochemical oxidation and etching of highly oriented pyrolytic graphite (HOPG) has been achieved using biased atomic force microscopy (AFM) lithography, allowing patterns of varying complexity to be written into the top layers of HOPG.
G U Kulkarni +11 more
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Extended Abbe approach for fast and accurate lithography imaging simulations
, 2022 Paper 747007This paper presents an extended Abbe based imaging algorithm for faster and more accurate simulations of current and future projection lithography systems.
Evanschitzky, P. +2 more
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Advanced mask aligner lithography (AMALITH)
, 2022 Paper 83261YMask aligners were the dominating lithography tool for the first 20 years of semiconductor industry. In the 1980s industry changed over to projection lithography.
Motzek, K. +9 more
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Graphene nanoribbons with zigzag and armchair edges prepared by scanning tunneling microscope lithography on gold substrates [PDF]
, 2014 The properties of graphene nanoribbons are dependent on both the nanoribbon width and the crystallographic orientation of the edges. Scanning tunneling microscope lithography is a method which is able to create graphene nanoribbons with well defined edge
Dobrik, G. +7 more
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