Results 1 to 10 of about 110,417 (252)

Pattern fidelity in nanoimprinted films using CD-SAXS

SPIE Proceedings, 2005
The primary measure of process quality in nanoimprint lithography (NIL) is the fidelity of pattern transfer, comparing the dimensions of the imprinted pattern to those of the mold. As a potential next generation lithography, NIL is capable of true nanofabrication, producing patterns of sub-10 nm dimensions. Routine production of nanoscale patterns will
Ronald L. Jones, Christopher L. Soles, Eric K. Lin, Walter Hu, Ronald M. Reano, Stella W. Pang, Steven J. Weigand, Denis T. Keane, John P. Quintana   +8 more
openaire   +1 more source

Understanding Pattern Formation and Improving Fidelity in Phototropic Growth

2021
Phototropic growth of Se-Te yields highly anisotropic lamellar nanostructures and is achieved photoelectrochemically from an isotropic solution of oxidized Se and Te precursors deposited onto isotropic conductive substrates under conformal illumination.
openaire   +1 more source

Pattern transfer fidelity of nanoimprint lithography on six-inch wafers

Nanotechnology, 2002
We studied the pattern transfer fidelity of nanoimprint lithography (NIL) by patterning sub-micron MESFET gates on six-inch wafers. The critical dimensions (CD) of the gate patterns on the mould, imprinted in resist, as well as after oxygen reactive ion etching (RIE) and metal lift-off were measured, separately, using an ultrahigh-resolution scanning ...
Li, Mingtao, Chen, Lei, Zhang, Wei, Chou, Stephen   +3 more
openaire   +2 more sources

High fidelity radiation pattern measurement system for small antennas

2006 First European Conference on Antennas and Propagation, 2006
The paper describes a high fidelity system for measuring a radiation pattern of an electrically small antenna. In this system, the Antenna Under Test (AUT) equipped with a battery powered signal generator is suspended by a dielectric foam in the centre of a pair of dielectric rings that are supported by a pedestal of a spherical positioning mechanical ...
Kabacik, P., Byndas, A., Hossa, R., Bialkowski, M. E.   +3 more
openaire   +2 more sources

Holistic lithography and metrology's importance in driving patterning fidelity

SPIE Proceedings, 2016
There has been 43 years of overlay metrology in microlithography, and how did we get here? This presentation covered three areas: stepper metrology improvements, improved correction potential, and extended feedback loop outside stepper. The presenter went on to discuss where we are today In terms of holistic lithography, as well as where we are going ...
openaire   +1 more source

Novel method for quality assurance of two-dimensional pattern fidelity

SPIE Proceedings, 2007
This paper proposes an evaluation pattern generating method that realizes stable printing for any two-dimensional feature. Below 65nm design node, even in the case of using the most advanced optical techniques, the resolution limit is approached. As a result, patterning fidelity to the target worsens in low k 1 lithography conditions. Complex layout
Shimon Maeda, Ryuji Ogawa, Seiji Shibazaki, Tadashi Nakajima   +3 more
openaire   +1 more source

Method and apparatus for pattern fidelity control

2021
HASAN TANBIR, JAIN VIVEK KUMAR, HUNSCHE STEFAN, LA FONTAINE BRUNO   +3 more
openaire   +2 more sources

Control over pattern fidelity and surface wettability of imprinted templates for flexible color filter manufacturing

Microelectronic Engineering, 2011
Alexander Bessonov, Jeong-Gil Kim
exaly  

Effects of Printed UWB Antenna Miniaturization on Pulse Fidelity and Pattern Stability

IEEE Transactions on Antennas and Propagation, 2014
Karu Esselle, Stuart G HAY, Shunshi Zhong   +2 more
exaly  

Pattern fidelity enhancement with directional patterning technology

2020
SHEN YU-TIEN, HUNG CHI-CHENG, LIN CHIN-HSIANG, WANG CHIEN-WEI, CHANG CHING-YU, TING CHIH-YUAN, CHEN KUEI-SHUN, LIU RU-GUN, LIN WEI-LIANG, CHANG YA HUI, LUNG YUAN-HSIANG, CHEN YEN-MING, YEN YUNG-SUNG   +12 more
openaire   +2 more sources