Results 31 to 40 of about 1,697,138 (284)
Advanced coatings for next generation lithography
, 2022 Paper 94221K, 7 S.Beyond EUV lithography at 6.X nm wavelength has a potential to extend EUVL beyond the 11 nm node. To implement B-based mirrors and to enable their industrial application in lithography tools, a reflectivity level of > 70% has to be ...
Yulin, Sergiy A. +3 more
core +1 more source
Advanced photomask fabrication by e-beam lithography for mask aligner applications
, 2022 Paper 1003204Photomasks contain geometric information that will be transferred to substrates or pre-structured surfaces. Conventional mask aligner lithography in the sense of shadow printing of the photomask suffers from limited achievable resolution ...
Zeitner, U.D. +3 more
core +1 more source
Applied Sciences, 2019 The non-ideal mask absorber can cause an increase in critical dimension error (CDE) and decrease in process window (PW). However, the random mask absorber errors induced during mask fabricating and measuring are not considered in computational ...
Naiyuan Sheng +6 more
doaj +1 more source
Novel high-contrast phase-shifting masks for EUV interference lithography
, 2022 Paper 113231Q, 10 S.When it comes to the patterning of periodic structures like lines and spaces or contact hole arrays interference lithography can be effectively applied.
Lüttgenau, Bernhard +4 more
core +1 more source
Computational proximity lithography with extreme ultraviolet radiation
Optics Express, 2020 The potential of extreme ultraviolet (EUV) computational proximity lithography for fabrication of arbitrary nanoscale patterns is investigated. We propose to use a holographic mask (attenuating phase shifting mask) consisting of structures of two phase levels.
Deuter, Valerie +8 more
openaire +4 more sources
Incorporating photomask shape uncertainty in computational lithography [PDF]
, 2016 The lithographic performance of a photomask is sensitive to shape uncertainty caused by manufacturing and measurement errors. This work proposes incorporating the photomask shape uncertainty in computational lithography such as inverse lithography.
Xiaofei Wu +7 more
core +2 more sources
, 2022 Paper 1077517, 8 S.Although conventional computer technology made a huge leap forward in the past decade, a vast number of computational problems remain inaccessible due to their inherently complex nature.
Linke, H. +10 more
core +2 more sources
Lithography-free directional control of thermal emission
, 2022 Blackbody thermal emission is spatially diffuse. Achieving highly directional thermal emission typically requires nanostructuring the surface of the thermally emissive medium. The most common configuration is a subwavelength grating that scatters surface
Mitradeep Sarkar (1653787) +3 more
core +1 more source
FPGA based high-speed system solutions for innovative maskless lithography systems
, 2022 Paper 62832 KMaskless lithography is one of the possible solutions to manage the escalating mask costs and demands for faster production cycles. One of the major issues with the maskless lithography technology however is the management and transfer of ...
Talmi, M., Voss, S.-H.
core +1 more source
Multi-Objective Defocus Robust Source and Mask Optimization Using Sensitive Penalty
Applied Sciences, 2019 The continuous decrease in the size of lithographic technology nodes has led to the development of source and mask optimization (SMO) and also to the control of defocus becoming stringent in the actual lithography process.
Pengzhi Wei +5 more
doaj +1 more source