Results 31 to 40 of about 260 (208)

Cellular Responses to Mechanical Cues Across Scales: From Fundamental Insights to Translational Potential

Advanced Healthcare Materials, EarlyView.
This review examines how cellular behavior is regulated by mechanical cues transmitted through soft biomaterials, from single‐cell mechanosensing to tissue‐level adaptation. It highlights why physiological relevance, rather than model complexity alone, is critical for translational mechanobiology and introduces a scoring framework linking material ...
Mathias Polz, Manuel P. Kainz, Niklas Haider, Theresa Rienmüller, Kerstin Lenk, Rupert Kargl, Michele Terzano, Gerhard Sommer, Gerhard A. Holzapfel, Julia Fuchs   +9 more
wiley   +1 more source

Tomographic Printing in a Chip: A Versatile Platform for Biomimetic 3D Organ‐on‐Chip

Advanced Healthcare Materials, EarlyView.
A novel light‐based bioprinting approach, TVAM‐in‐a‐chip, enables rapid, contactless fabrication of biomimetic 3D organ‐on‐chip devices directly within preassembled microfluidic platforms. This strategy supports diverse materials, including cell‐laden resins, and eliminates post‐assembly steps.
Riccardo Rizzo, Viola Sgarminato, Felix Wechsler, Christophe Moser   +3 more
wiley   +1 more source

Patterning Fidelity Enhancement and Aberration Mitigation in EUV Lithography Through Source–Mask Optimization

Micromachines
Extreme ultraviolet (EUV) lithography faces critical challenges in aberration control and patterning fidelity as technology nodes shrink below 3 nm. This work demonstrates how Source–Mask Optimization (SMO) simultaneously addresses both illumination and ...
Qi Wang, Qiang Wu, Ying Li, Xianhe Liu, Yanli Li   +4 more
doaj   +1 more source

Numerical study of mass transfer in drop and film systems using a regularized finite difference scheme in evaporative lithography

Vestnik Samarskogo Gosudarstvennogo Tehničeskogo Universiteta. Seriâ: Fiziko-Matematičeskie Nauki, 2018
Mass transfer in drying drops and films is interesting with practical point of view, since it is used in problems of evaporative lithography. Compensatory flows arise when conditions of nonuniform evaporation from the surface of the liquid layer are ...
Konstantin S Kolegov, Alexey I Lobanov
doaj   +1 more source

Multi-frontal multi-thread direct solver for finite element simulation of step-and-flash imprint lithography [PDF]

Computer Methods in Materials Science, 2012
The paper presents the multi-thread multi-frontal direct solver for shared memory architectures. The solver algorithm consists in a sequence of tasks executing recursive forward eliminations and backward substitutions over the constructed elimination ...
Paweł Obrok, Maciej Paszyński
doaj   +1 more source

Opportunities of Semiconducting Oxide Nanostructures as Advanced Luminescent Materials in Photonics

Advanced Materials, EarlyView.
The review discusses the challenges of wide and ultrawide bandgap semiconducting oxides as a suitable material platform for photonics. They offer great versatility in terms of tuning microstructure, native defects, doping, anisotropy, and micro‐ and nano‐structuring. The review focuses on their light emission, light‐confinement in optical cavities, and
Ana Cremades, Pedro Hidalgo, David Maestre, Ruth Martínez‐Casado, Emilio Nogales, Beatriz Rodríguez, G. Cristian Vásquez, Bianchi Méndez   +7 more
wiley   +1 more source

Room‐Temperature Skyrmionic Synapse in 2D Ferromagnet Fe3GaTe2 Operating via Collective Spin Texture Transformation

Advanced Materials, EarlyView.
We demonstrate a neuromorphic synapse in 2D Fe3GaTe2 flakes. The device operates via a current‐driven transformation from a skyrmion‐lattice to a stripe‐domain state, yielding a linear anomalous Hall resistance response with a tunable slope to enable multiply‐accumulate operations. Simulations confirm its viability in artificial neural networks.
Jixiang Huang, Tongji Zhu, PeiYu Cai, Xiaoming Ma, Zhen Wang, Ruifu Zhang, Yi Hao, Jingdi Lu, Liubing He, Jun Xu, Yuejie Zhang, Wanjun Jiang, Jing Tao, Shiming Lei, Pavel Parchinskiy, Jing Teng, Lingfei Wang, Wei Niu, Elton J.G. Santos, Xiaoqian Zhang, Peng Li   +20 more
wiley   +1 more source

Inverse Lithography Technology (ILT) Under Chip Manufacture Context

Micromachines
As semiconductor process nodes shrink to 3 nm and beyond, traditional optical proximity correction (OPC) and resolution enhancement technologies (RETs) can no longer meet the high patterning precision needs of advanced chip manufacturing due to the sub ...
Xiaodong Meng, Cai Chen, Jie Ni
doaj   +1 more source

Large-Scale Uniform Silver Nanocave Array for Visible Light Refractive Index Sensing Using Soft UV Nanoimprint

IEEE Photonics Journal, 2016
In this paper, a wafer-scale uniform silver nanocave array is fabricated by soft ultraviolet nanoimprint lithography. We investigate its plasmonic effects using far-field and near-field experimental approaches and illuminate the physics inside by ...
Jinfeng Zhu, Yanqiang Bai, Lirong Zhang, Zhengyong Song, Hai Liu, Jianyang Zhou, Timothy Lin, Qing Huo Liu   +7 more
doaj   +1 more source

Azobenzene's Cross‐Scale Optics and Photonics: Molecular Photoswitching, Mesoscopic Material Motions, and Adaptive Devices

Advanced Materials, EarlyView.
Azobenzene photoswitches translate molecular‐scale E/Z photoisomerization into macroscopic material responses and device‐level photonic functions. This Review highlights how azobenzene research has evolved from molecular photochemistry to photoalignment, mass migration, photomechanics, and heat release, ultimately enabling holography, reconfigurable ...
Heeju Son, Soyul Kwak, Heerin Noh, Minsang Kim, Doyeon Noh, Subhayan Chakraborty, Jaewon Lee, YongDeok Cho, Kyeongsoo Kim, Taewoong Eom, Moonyoung Kim, Jangwon Kim, Hoyoung Lee, Soyoung Lee, Jaehun Kim, Grace G. D. Han, Shin‐Tson Wu, Stefano Oscurato, Arri Priimagi, Marina Saphiannikova, Seungwoo Lee   +20 more
wiley   +1 more source