Results 31 to 40 of about 7,747 (289)

Optical and EUV projection lithography: A computational view

, 2022
S.21-34This article reviews modeling approaches for optical and extreme ultraviolet (EUV) projection lithography. It explains the models for the rigorous computation of light diffraction from lithographic masks, a vector formulation of image formation in
Evanschitzky, P., Erdmann, A., Agudelo, V., Fühner, T., Freund, C., Michalak, P., Xu, D.B.   +6 more
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Lithography-Free, Large-Area Spatially Segmented Disordered Structure for Light Harvesting in Photovoltaic Modules

, 2022
Optical losses in photovoltaic (PV) systems cause nonradiative recombination or incomplete absorption of incident light, hindering the attainment of high energy conversion efficiency.
Young Min Song (7401251), Joo Hwan Ko (9017384), Se-Yeon Heo (9625138), Young Jin Yoo (5646755), Heon Lee (1842823), So Hee Kim (588305), Min Seok Kim (6162890), Yeong Jae Kim (5006693)   +7 more
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Mitigating the Impact of Mask Absorber Error on Lithographic Performance by Lithography System Holistic Optimization

Applied Sciences, 2019
The non-ideal mask absorber can cause an increase in critical dimension error (CDE) and decrease in process window (PW). However, the random mask absorber errors induced during mask fabricating and measuring are not considered in computational ...
Naiyuan Sheng, Enze Li, Yiyu Sun, Tie Li, Yanqiu Li, Pengzhi Wei, Lihui Liu   +6 more
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Modeling of grayscale lithography and calibration with experimental data for blazed gratings

, 2022
Paper 118750K, 14 S.This paper discusses a collaborative effort of two Fraunhofer institutes to develop a lithography model that simulates the fabrication of blazed gratings using grayscale lithography.
Leitel, R., Erdmann, A., Bhardwaj, P.
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Approach to combine electron-beam lithography and two-photon polymerization for enhanced nano-channels in network-based biocomputation devices

, 2018
Although conventional computer technology made a huge leap forward in the past decade, a vast number of computational problems remain inaccessible due to their inherently complex nature.
Lindberg, F., Steenhusen, S.,, Meinecke, Ch, Groß, M.,, Till Korten, Dietz, St, Heiner Linke, Reuter, D., Frida Lindberg, Schulz, St E.,, Matteo Groß, Steenhusen, S., Stefan Dietz, Stefan E. Schulz, Linke, H.,, Domann, G., Domann, G.,, Dietz, St,, Christoph Meinecke, Schulz, St E., Meinecke, Ch,, Lindberg, F.,, Heldt, G., Reuter, D.,, Groß, M., Korten, T.,, Linke, H., Heldt, G.,, Danny Reuter, Korten, T., Georg Heldt, Gerhard Domann, Lund University., Sönke Steenhusen   +33 more
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Multi-Objective Defocus Robust Source and Mask Optimization Using Sensitive Penalty

Applied Sciences, 2019
The continuous decrease in the size of lithographic technology nodes has led to the development of source and mask optimization (SMO) and also to the control of defocus becoming stringent in the actual lithography process.
Pengzhi Wei, Yanqiu Li, Tie Li, Naiyuan Sheng, Enze Li, Yiyu Sun   +5 more
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3D Mask Simulation and Lithographic Imaging using Physics-Informed Neural Networks

, 2023
The increasing demands on computational lithography and imaging in the design and optimization of lithography processes necessitate rigorous modeling of EUV light diffracted from the mask.
Erdmann, Andreas, Medvedev, Vlad, Roßkopf, Andreas   +2 more
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Machine Learning-Enhanced Model-Based Optical Proximity Correction by Using Convolutional Neural Network-Based Variable Threshold Method

IEEE Access
As the lithography process continues to become more rigorous in advanced technology nodes, the model-based optical proximity correction (MBOPC), as a core component within computational lithography, necessitates the development of highly precise ...
Jinhao Zhu, Zhiwei Ren, Ying Li, Xianhe Liu, Qiang Wu, Yanli Li, Qi Wang   +6 more
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Mass production-enabled computational spectrometers based on multilayer thin films

Scientific Reports, 2022
Multilayer thin film (MTF) filter arrays for computational spectroscopy are fabricated using stencil lithography. The MTF filter array is a 6 × 6 square grid, and 169 identical arrays are fabricated on a single wafer.
Cheolsun Kim, Pavel Ni, Kang Ryeol Lee, Heung-No Lee   +3 more
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Guest Editorial: Computational Lithography [PDF]

Journal of Micro/Nanolithography, MEMS, and MOEMS, 2009
This PDF file contains the editorial “Guest Editorial: Computational Lithography” for JM3 Vol.
openaire   +1 more source