Results 51 to 60 of about 1,697,138 (284)

Wearable Smart Patches on Sustainable Chitosan With Reversible Microbial Growth‐Inhibitory Properties

Advanced Functional Materials, EarlyView.
ABSTRACT Chitosan, a polysaccharide upcycled from biowaste, has long promised sustainable, biocompatible, and antimicrobial films and devices, an appeal reinforced by its recent regulatory recognition, with several chitosan‐based antibacterial dressings gaining clearance through the Food and Drug Administration's 510(k) pathway.
Jacopo Nicoletti, Kubra Kocak, Andrea Michel, Enrico Cavarzerani, Ali Raza, Petr Rohzin, Nouha Loudhaief, Saimir Frroku, Nicolò Baldovin, Hazrat Bilal, Alvise Perosa, Maurizio Selva, Flavio Rizzolio, Luca Sbuelz, Sabrina Tamburini, Domenico De Fazio, Giovanni Antonio Salvatore   +16 more
wiley   +1 more source

Reduced basis method for computational lithography [PDF]

SPIE Proceedings, 2009
A bottleneck for computational lithography and optical metrology are long computational times for near field simulations. For design, optimization, and inverse scatterometry usually the same basic layout has to be simulated multiple times for different values of geometrical parameters. The reduced basis method allows to split up the solution process of
Pomplun, J., Zschiedrich, L., Burger, S., Schmidt, F.   +3 more
openaire   +2 more sources

Optoelectronic Synaptic Devices Using Molecular Telluride Phase‐Change Inks for Three‐Factor Learning

Advanced Functional Materials, EarlyView.
Optoelectronic synaptic devices based on solution‐processed molecular telluride GST‐225 phase‐change inks are demonstrated for three‐factor learning. A global optical signal broadcast through a silicon waveguide induces non‐volatile conductance updates exclusively in locally electrically flagged memristors.
Kevin Portner, Dhananjeya Kumaar, Giacomo Torti, Killian Keller, Till Zellweger, Florian M. Schenk, Christoph Weilenmann, Daniel Chelladurai, Vara Prasad Jonnalagadda, Ghazi Sarwat Syed, Vanessa Wood, Jürg Leuthold, Alexandros Emboras, Maksym Yarema, Mathieu Luisier   +14 more
wiley   +1 more source

Fast source mask co-optimization method for high-NA EUV lithography

Opto-Electronic Advances
Extreme ultraviolet (EUV) lithography with high numerical aperture (NA) is a future technology to manufacture the integrated circuit in sub-nanometer dimension.
Ziqi Li, Lisong Dong, Xu Ma, Yayi Wei
doaj   +1 more source

Experimental investigation of a near-field focusing performance of the IP-Dip polymer based 2D and 3D Fresnel zone plate geometries fabricated using 3D laser lithography coated with hyperbolic dispersion surface layered metamaterial

Nanophotonics, 2023
Herein we investigate the character of the near-field emission of a two- (2D) and novel three-dimensional (3D) probe geometries fabricated using 3D direct laser writing lithography.
Micek Patrik, Belosludtsev Alexandr, Gric Tatjana, Pudis Dusan, Gaso Peter, Goraus Matej   +5 more
doaj   +1 more source

Architecture‐Driven Functional Coupling in Vertically Aligned Nanocomposites

Advanced Functional Materials, EarlyView.
Vertically aligned nanocomposites define a growth‐engineered architecture in which vertical interfaces, strain fields, defect pathways, and phase connectivity are created simultaneously. This review shows how these architectural features couple ferroic, optical, ionic, electrochemical, and device responses, establishing design rules and open challenges
Md Shatil Islam‐Shanto, Javier Zamudio‐García, Abraham Sánchez‐Caballero, David Marrero‐López, Vincenzo Esposito   +4 more
wiley   +1 more source

Optimization of Lens Adjustment in Semiconductor Lithography Equipment Using Quadratically Constrained and Second-Order Cone Programming

Journal of Advanced Mechanical Design, Systems, and Manufacturing, 2010
The present paper considers optimization of lens adjustment in semiconductor lithography equipment. For improving productivity, the laser irradiation power of recent semiconductor lithography equipment has been boosted, which causes significant ...
Yuji SHINANO, Toshiyuki YOSHIHARA, Ryuhei MIYASHIRO, Youzou FUKAGAWA   +3 more
doaj   +1 more source

Optimized phase-shifting masks for high-resolution resist patterning by interference lithography

, 2022
Paper 104502A, 12 S.The EUV laboratory exposure tool (EUV-LET) is a versatile stand-alone resist patterning tool. Main applications are resist characterization for industrial lithography as well as the patterning of high-resolution arrays over large ...
Juschkin, L., Danylyuk, S., Loosen, P., Bahrenberg, L., Lebert, R., Brose, S.   +5 more
core   +1 more source

Covalent Functionalization of 2D Semiconductors: A Roadmap to Advanced Electronic Devices

Advanced Functional Materials, EarlyView.
This Review presents recent advances in the covalent functionalization strategies for two‐dimensional semiconductors and their implementation in modern technologies. Layered materials are modified through diverse molecular chemistries (e.g., thiols, diazonium salts, alkyl halides, and electron‐deficient species) to tailor their surface properties ...
Ramiro Quirós‐Ovies, Bin Han, Paolo Samorì   +2 more
wiley   +1 more source

Resolution enhancements for semiconductor lithography: A computational perspective

, 2022
Paper IM4F.3The presentation reviews optics- and material-driven resolution enhancements in DUV and EUV projection lithography for semiconductor fabrication with special emphasis on the application of computational methods for the exploration and ...
Erdmann, A.
core   +1 more source