Results 51 to 60 of about 7,747 (289)

Neural Lithography: Close the Design-to-Manufacturing Gap in Computational Optics with a 'Real2Sim' Learned Photolithography Simulator

, 2023
We introduce neural lithography to address the 'design-to-manufacturing' gap in computational optics. Computational optics with large design degrees of freedom enable advanced functionalities and performance beyond traditional optics.
Cheng Zheng (227957), Peter T. C. So (11720040), Guangyuan Zhao (3959972)   +2 more
core   +1 more source

Optoelectronic Synaptic Devices Using Molecular Telluride Phase‐Change Inks for Three‐Factor Learning

Advanced Functional Materials, EarlyView.
Optoelectronic synaptic devices based on solution‐processed molecular telluride GST‐225 phase‐change inks are demonstrated for three‐factor learning. A global optical signal broadcast through a silicon waveguide induces non‐volatile conductance updates exclusively in locally electrically flagged memristors.
Kevin Portner, Dhananjeya Kumaar, Giacomo Torti, Killian Keller, Till Zellweger, Florian M. Schenk, Christoph Weilenmann, Daniel Chelladurai, Vara Prasad Jonnalagadda, Ghazi Sarwat Syed, Vanessa Wood, Jürg Leuthold, Alexandros Emboras, Maksym Yarema, Mathieu Luisier   +14 more
wiley   +1 more source

Oxygen‐Tunnel Indium Tin Oxide Vertical Channel Transistors with Enhanced Current Density and Reliability for Monolithic 3D Compute‐In‐Memory Systems

Advanced Functional Materials, EarlyView.
Oxygen‐tunnel (OT) indium tin oxide (ITO) vertical channel transistors (VCTs) enable reliable, high‐density gain‐cell memory for monolithic 3D integration. A sandwiched SiN/SiO2/SiN OT stack selectively regulates oxygen transport, suppressing parasitic electrode oxidation while stabilizing channel oxygen vacancies, thereby suppressing carrier injection
Hyeonho Gu, Haksoon Jung, Yongwoo Lee, Hoichang Jeong, Yanfeng Zhao, Heesoo Yang, Minho Park, Hyeonjin Lee, Seunghun Baek, Minju Song, Junghwan Kim, Youngmin Jo, Hyunjin Park, Munhyeon Kim, Jae‐Joon Kim, Kyuho Jason Lee, Byungjo Kim, Jimin Kwon   +17 more
wiley   +1 more source

Numerical study of mass transfer in drop and film systems using a regularized finite difference scheme in evaporative lithography

Vestnik Samarskogo Gosudarstvennogo Tehničeskogo Universiteta. Seriâ: Fiziko-Matematičeskie Nauki, 2018
Mass transfer in drying drops and films is interesting with practical point of view, since it is used in problems of evaporative lithography. Compensatory flows arise when conditions of nonuniform evaporation from the surface of the liquid layer are ...
Konstantin S Kolegov, Alexey I Lobanov
doaj   +1 more source

Computational imaging technologies for optical lithography extension

, 2014
With the development and production of integrated circuits at the 22nm node, optical lithography faces increasing challenges to keep up with the specifications on its performance along various metrics, such as pattern fidelity and process window.
Li, Jia, 李佳
core   +1 more source

Powering Nanocrystal‐Based Heat Engines With Light‐Emitting Metasurfaces That Influence Their Temperature

Advanced Functional Materials, EarlyView.
Metasurfaces and other structured photonic environments can dramatically modify the absorption and/or light emission of semiconductors. However, the consequences of these changes on the temperature of the system are not well understood. The authors address this problem for colloidal nanocrystals and leverage their findings to convert light into ...
Hugo Kowalczyk, Yihao Yuan, Augustin Caillas, Amel Saidoun, Roméo Bonnet, Pascal Filloux, Emmanuel Lhuillier, Aloyse Degiron   +7 more
wiley   +1 more source

Oxidized MoS2‐Based Multifunctional Memristive Hardware for Energy‐Efficient mmWave Signal Processing and In‐Memory Matrix Multiplication

Advanced Functional Materials, EarlyView.
Thermally oxidized MoS2‐based radio‐frequency switches enable a multifunctional platform that unifies broadband RF switching and in‐memory computation. The device achieves a cutoff frequency of 33.2 THz with high energy efficiency and supports hardware‐aware signal processing.
Juho Son, Changwoo Pyo, Sungmoon Park, Yoongi Cho, Seungchan Lee, Myungsoo Kim   +5 more
wiley   +1 more source

Large-Scale Uniform Silver Nanocave Array for Visible Light Refractive Index Sensing Using Soft UV Nanoimprint

IEEE Photonics Journal, 2016
In this paper, a wafer-scale uniform silver nanocave array is fabricated by soft ultraviolet nanoimprint lithography. We investigate its plasmonic effects using far-field and near-field experimental approaches and illuminate the physics inside by ...
Jinfeng Zhu, Yanqiang Bai, Lirong Zhang, Zhengyong Song, Hai Liu, Jianyang Zhou, Timothy Lin, Qing Huo Liu   +7 more
doaj   +1 more source

Advances in lithography: Introduction to the feature. Editorial

, 2022
S.L11-L12Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years.
Erdmann, A., Liang, R.G., Sezginer, A., Smith, B.   +3 more
core   +1 more source

Controlled Engineering of 2D Alkali‐Iron‐Chloride Compounds and Lateral Quantum Heterostructures Within Confined Graphene Nanoreactors

Advanced Functional Materials, EarlyView.
This work presents a programmable atomic engineering strategy for 2D materials using Å‐scale nanoreactors formed by bilayer graphene (BLG) intercalation. A new class of alkali‐iron‐chloride compounds, along with lateral heterostructures composed of monolayer alkali halides and iron chlorides, is revealed.
Haiming Sun, Qiunan Liu, Yung‐Chang Lin, Mahdi Ghorbani‐Asl, Hiroki Ago, Arkady V. Krasheninnikov, Kazu Suenaga   +6 more
wiley   +1 more source