Results 61 to 70 of about 1,697,138 (284)

An Adaptive Inhibitory WSe2 Transistor for Retinomorphic In‐Sensor Image Processing

Advanced Functional Materials, EarlyView.
Conventional retinomorphic devices typically require deliberate gate‐bias tuning for each illumination condition. In this paper, we demonstrate an adaptive inhibitory WSe2 transistor that uses photo‐induced regime shift between the subthreshold and accumulation modes to achieve decision‐free, intensity‐adaptive image processing within a single pixel ...
Juhwan Baek, Junhwa Oh, Hyeonjung Kim, Minsik Park, Haein Cho, Jin Young Park, Hyeonchang Son, Taeyun Kim, Sung‐Un An, Yamin Zhang, Hyeon‐Jin Shin, Seyong Oh, Dong‐Ho Kang   +12 more
wiley   +1 more source

Deciphering the Photopolymerization‐Induced Nanostructures and Interface Formation for Submicrometer Additive Manufacturing

Advanced Functional Materials, EarlyView.
This work reveals the UV‐curing‐induced monomer‐rich domain, oligomer‐rich domain, and entangled oligomer domain. The cured submicron films in stressed state induce interlayer nano‐wrinkle structures during the deposition of the second layer. Stress‐free cured films in relaxed state form non‐diffusive, diffusive and semi‐diffusive interlayer ...
Shouzheng Chen, Yufeng Zhai, Jungui Zhou, Lixing Li, Simon Schraad, Guangjiu Pan, Xuehe Jiang, Sarathlal Koyiloth Vayalil, Rolf A. T. M. van Benthem, Julien R. G. Navarro, Johan F. G. A. Jansen, Mats K. G. Johansson, Peter Müller‐Buschbaum, Stephan V. Roth   +13 more
wiley   +1 more source

FIRM: a new software tool for calibration of lithography simulation

, 2022
S.161-173In general, simulation requires a thorough understanding of the physics and/or chemistry of the processes. This should lend itself to models which can be used to establish simulation software.
Feike, A., Krüger, D., Erdmann, A., Friedrich, C., Kalus, C.K., Käsmaier, R.   +5 more
core   +1 more source

Numerical study of mass transfer in drop and film systems using a regularized finite difference scheme in evaporative lithography

Vestnik Samarskogo Gosudarstvennogo Tehničeskogo Universiteta. Seriâ: Fiziko-Matematičeskie Nauki, 2018
Mass transfer in drying drops and films is interesting with practical point of view, since it is used in problems of evaporative lithography. Compensatory flows arise when conditions of nonuniform evaporation from the surface of the liquid layer are ...
Konstantin S Kolegov, Alexey I Lobanov
doaj   +1 more source

Multi-frontal multi-thread direct solver for finite element simulation of step-and-flash imprint lithography [PDF]

Computer Methods in Materials Science, 2012
The paper presents the multi-thread multi-frontal direct solver for shared memory architectures. The solver algorithm consists in a sequence of tasks executing recursive forward eliminations and backward substitutions over the constructed elimination ...
Paweł Obrok, Maciej Paszyński
doaj   +1 more source

Sacrificial‐Layer‐Assisted Heat‐Affected‐Zone Suppression in Laser Patterning of PET for High‐Performance Flexible Devices

Advanced Functional Materials, EarlyView.
A removable sacrificial polymer layer engineers the thermal boundary condition during nanosecond laser ablation of PET, suppressing heat‐affected‐zone formation without relying on costly ultrafast lasers. This strategy enables deep, high‐aspect‐ratio trenches with no detectable heat‐affected zone, templating silver‐filled mesh electrodes with record ...
Mehdi Zarei, Mirza Sahaluddin, Mostafa Bedewy, Paul W. Leu   +3 more
wiley   +1 more source

Contact Hole Shrinkage: Simulation Study of Resist Flow Process and Its Application to Block Copolymers

Micromachines
For vertical interconnect access (VIA) in three-dimensional (3D) structure chips, including those with high bandwidth memory (HBM), shrinking contact holes (C/Hs) using the resist flow process (RFP) represents the most promising technology for low-k1 ...
Sang-Kon Kim
doaj   +1 more source

Lithographic process window optimization for mask aligner proximity lithography

, 2022
Paper 90520G, 11 S.We introduce a complete methodology for process window optimization in proximity mask aligner lithography. The commercially available lithography simulation software LAB from GenISys GmbH was used for simulation of light propagation ...
Hofmann, U., Zoberbier, R., Erdmann, A., Nguyen, D., Voelkel, R., Bramati, A., Brugger, J., Ünal, N., Hennemeyer, M., Vogler, U.   +9 more
core   +1 more source

Multidimensional‐Encoded High‐Fidelity Spectrometers With a Floating‐Base Bipolar Junction

Advanced Functional Materials, EarlyView.
A floating‐base bipolar junction photodetector enables multidimensional spectral encoding through synergistic gate‐ and drain‐bias modulation of interfacial barrier matching. The resulting complementary spectral responses form a diverse, weakly correlated response matrix, enabling robust and high‐fidelity spectral reconstruction even at sub‐nanoampere ...
Sang‐Hyeon Lee, Junho Min, Yonas Tsegaye Megra, Min‐Hye Jeong, Hwi Je Woo, Jaewon Han, Junheon Ha, Gyunghyun Jang, Young Jae Song, Hyun‐Soo Ra, Hoon Hahn Yoon, Jong‐Soo Lee   +11 more
wiley   +1 more source

Frequency-Decoupled Dual-Stage Inverse Lithography Optimization via Hierarchical Sampling and Morphological Enhancement

Micromachines
Inverse lithography technology (ILT) plays a pivotal role in advanced semiconductor manufacturing because it enables pixel-level mask modifications, significantly enhances pattern fidelity, and expands process windows. However, traditional gradient-based
Jie Zhou, Qingyan Zhang, Haifeng Sun, Chuan Jin, Ji Zhou, Junbo Liu   +5 more
doaj   +1 more source