Results 61 to 70 of about 7,747 (289)

Submicron Metasurface Reconfigured Multiband Smart Windows

Advanced Functional Materials, EarlyView.
This work presents a submicron metasurface reconfigured multiband thermochromic smart window. By integrating subwavelength nanostructures into a Fabry−Perot resonator configuration, it mitigates conventional trade‐offs to simultaneously deliver high luminous transmittance and robust solar heating and radiative cooling modulation capabilities ...
Guanya Wang, Shancheng Wang, Bin Li, Xinyi Tian, Rong Liu, Jian Chen, Zhendong Dai, Shouqin Tian, Yi Long   +8 more
wiley   +1 more source

Aerial image analysis for defective masks in optical lithography

, 2022
S.450The quality of photomasks in optical lithography is important for the quality of the wafer printing process. Lithography simulation software can be used to compute the influence of mask defects on the aerial or resist image of lithographic processes.
Evanschitzky, P., Höllein, I., Teuber, S., Erdmann, A., Ziebold, R., Tollkühn, B., Eggers, K., Graf, T.   +7 more
core   +1 more source

Microgel‐Based 3D Bioprinting: A Convergent Strategy Integrating Material Design, Jamming Dynamics, and Biological Function

Advanced Healthcare Materials, EarlyView.
Microgel‐based 3D printed constructs represent a compelling and versatile innovation for engineering architecturally complex, dynamically remodelable, and biocompatible structures with high structural fidelity and bioactivity. By integrating material design, biofabrication, and biological function, these systems enable the development of adaptive ...
Elena Ghighină, Andreea Ioana Dinu, Jana Ghițman   +2 more
wiley   +1 more source

Contact Hole Shrinkage: Simulation Study of Resist Flow Process and Its Application to Block Copolymers

Micromachines
For vertical interconnect access (VIA) in three-dimensional (3D) structure chips, including those with high bandwidth memory (HBM), shrinking contact holes (C/Hs) using the resist flow process (RFP) represents the most promising technology for low-k1 ...
Sang-Kon Kim
doaj   +1 more source

Implementation of an autocorrelation-based adaptive alignment mark detection method in electron beam lithography [PDF]

Nanotechnology and Precision Engineering
High accuracy and precision overlay and stitching in electron beam lithography demand rapid and robust detection of alignment marks. Here, we implement an autocorrelation-based adaptive alignment mark detection method that processes one-dimensional ...
Zhixuan Pan, Bohua Yin, Jingyu Huang, Botong Sun, Zhengjie Li, Guanglu Xu, Liping Zhang, Huibin Zhao, Li Han   +8 more
doaj   +1 more source

Computational Proximity Lithography with extreme ultraviolet Radiation

, 2021
Nowadays, EUV projection lithography has been proven effective for high-volume manufacturing of microchips. In parallel, high-resolution nanopatterning has been demonstrated utilizing interference lithography. However, the former suffers from the complexity of projection optics, and the latter is limited to periodic structures. The presented approach –
openaire   +2 more sources

Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model

, 2022
Paper CW1B.4This paper describes an approach to incorporate a random field uncertainty in level-set-based inverse lithography in a vector imaging model.
Wu, X., Erdmann, A., Lam, E.Y., Fühner, T.   +3 more
core   +1 more source

Opportunities of Semiconducting Oxide Nanostructures as Advanced Luminescent Materials in Photonics

Advanced Materials, EarlyView.
The review discusses the challenges of wide and ultrawide bandgap semiconducting oxides as a suitable material platform for photonics. They offer great versatility in terms of tuning microstructure, native defects, doping, anisotropy, and micro‐ and nano‐structuring. The review focuses on their light emission, light‐confinement in optical cavities, and
Ana Cremades, Pedro Hidalgo, David Maestre, Ruth Martínez‐Casado, Emilio Nogales, Beatriz Rodríguez, G. Cristian Vásquez, Bianchi Méndez   +7 more
wiley   +1 more source

Plasmonic Filters Based on Lithographically Patterned and Hexagonally Arranged Triangular Silver Nanoparticles Array

Advances in Materials Science and Engineering, 2015
A plasmonic filter applied in visible regime is proposed on the basis of hexagonally arranged triangular silver nanoparticle arrays. A method using discrete dipole approximation (DDA) to aid design parameters of the silver nanoparticle arrays is adopted
Jing Liu, Haoyuan Cai, Kai Tang, Lingqi Kong   +3 more
doaj   +1 more source

Pattern-Centric Computational System for Logic and Memory Manufacturing and Process Technology Development

Journal of Microelectronic Manufacturing, 2020
Chip designers employ computer-aided design, circuit simulation, and design rule check systems. Lithography engineers employ model-based OPC (Optical Proximity Correction) and model-based print-simulation systems.
Chenmin Hu, Khurram Zafar, Abhishek Vikram, Geoffrey Ying   +3 more
doaj   +1 more source