Optical Proximity Correction With Linear Regression [PDF]
IEEE Transactions on Semiconductor Manufacturing, 2008 An important step in today's integrated circuit (IC) manufacturing is optical proximity correction (OPC). In model-based OPC, masks are systematically modified to compensate for the nonideal optical and process effects of an optical lithography system.
Avideh Zakhor
exaly +2 more sources
Efficient Mask Optimization for DMD-Based Maskless Lithography Using a Genetic–Hippo Hybrid Algorithm [PDF]
MicromachinesMask optimization is a critical technique for enhancing imaging performance in digital micromirror device (DMD)-based maskless lithography. Conventional algorithms, however, often suffer from slow convergence and limited adaptability, particularly when ...
Zhiyong Chen +5 more
doaj +2 more sources
Design and validation of a high-speed rotor balancer based on influence coefficient method and dual-speed control [PDF]
Scientific ReportsBalancing of rotors requires a specialized device known as a balancer, which measures centrifugal forces by rotating the rotor and applies corrective masses to achieve balance. Higher rotational speeds enhance the accuracy of the balancing process due to
Pourya Kord Gharehcheloo +2 more
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Advancements and challenges in inverse lithography technology: a review of artificial intelligence-based approaches [PDF]
Light: Science & ApplicationsInverse lithography technology (ILT) is a promising approach in computational lithography to address the challenges posed by shrinking semiconductor device dimensions.
Yixin Yang +4 more
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Inverse Lithography Technology (ILT) Under Chip Manufacture Context [PDF]
MicromachinesAs semiconductor process nodes shrink to 3 nm and beyond, traditional optical proximity correction (OPC) and resolution enhancement technologies (RETs) can no longer meet the high patterning precision needs of advanced chip manufacturing due to the sub ...
Xiaodong Meng, Cai Chen, Jie Ni
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Data-driven optimization of maskless grayscale laser lithography [PDF]
Scientific ReportsA data-driven optimization algorithm is described for maskless grayscale laser lithography (MGLL), providing effective correction for topography errors deriving from the non-linear response of the photoresist to exposure dose, proximity effects and sharp
Adrian H. A. Lutey +8 more
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Adaptive reinforcement learning for lithography optimization: a scalable AI-driven solution for next-generation semiconductor manufacturing [PDF]
Scientific ReportsSemiconductor lithography, a pivotal process in integrated circuit (IC) fabrication, accounts for approximately 30% of production costs and faces significant challenges as feature sizes shrink to sub-nanometer scales.
Umar Rashid +5 more
doaj +2 more sources
Optical Proximity Correction Using Machine Learning Assisted Human Decision
IEEE Photonics Journal, 2023 Optical proximity correction (OPC) is a critical step in semiconductor manufacturing due to its high complexity and significant influence on the subsequent process steps. Conventional OPC using the Maxwell equation can become more and more challenging as
Albert Lin +5 more
doaj +1 more source
Improvement of YX42° Cut LiTaO3 SAW Filters with Optical Proximity Effect Correction Method
Micromachines, 2023 Due to the influence of the optical proximity effect (OPE), it is easy for a pattern of photoresistance to be inconsistent with a design pattern, thus damaging the performance of a SAW resonator. To solve this problem, this paper proposes an optimization
Ping Luo +9 more
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Remote Sensing, 2022 Atmospheric correction of satellite optical imagery over inland waters is a key remaining challenge in aquatic remote sensing. This is due to numerous confounding factors such as the complexity of water optical properties, the surface glint, the ...
Yanqun Pan +2 more
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