Results 1 to 10 of about 112 (109)

Optical Proximity Correction With Linear Regression [PDF]

IEEE Transactions on Semiconductor Manufacturing, 2008
An important step in today's integrated circuit (IC) manufacturing is optical proximity correction (OPC). In model-based OPC, masks are systematically modified to compensate for the nonideal optical and process effects of an optical lithography system.
Avideh Zakhor
exaly   +2 more sources

Optical Proximity Correction Using Machine Learning Assisted Human Decision

IEEE Photonics Journal, 2023
Optical proximity correction (OPC) is a critical step in semiconductor manufacturing due to its high complexity and significant influence on the subsequent process steps. Conventional OPC using the Maxwell equation can become more and more challenging as
Albert Lin, Tejender Rawat, Chung-Yuan Chang, Han-Chun Tung, Hsueh-Li Liu, Peichen Yu   +5 more
doaj   +1 more source

Improvement of YX42° Cut LiTaO₃ SAW Filters with Optical Proximity Effect Correction Method

Micromachines, 2023
Due to the influence of the optical proximity effect (OPE), it is easy for a pattern of photoresistance to be inconsistent with a design pattern, thus damaging the performance of a SAW resonator. To solve this problem, this paper proposes an optimization
Ping Luo, Yali Zou, Xinyu Yang, Juntao Li, Xuan Huang, Jian Zhou, Xing Han, Yushuai Liu, Yuhao Liu, Tao Wu   +9 more
doaj   +1 more source

Evaluation of Atmospheric Correction Algorithms over Lakes for High-Resolution Multispectral Imagery: Implications of Adjacency Effect

Remote Sensing, 2022
Atmospheric correction of satellite optical imagery over inland waters is a key remaining challenge in aquatic remote sensing. This is due to numerous confounding factors such as the complexity of water optical properties, the surface glint, the ...
Yanqun Pan, Simon Bélanger, Yannick Huot   +2 more
doaj   +1 more source

Machine Learning based Optical Proximity Correction Techniques

Journal of Microelectronic Manufacturing, 2020
The shrinking of the size of the advanced technological nodes brings up new challenges to the semiconductor manufacturing community. The optical proximity correction (OPC) is invented to reduce the errors of the lithographic process. The conventional OPC
Pengpeng Yuan, Taian Fan, Yaobin Feng, Peng Xu , Yayi Wei   +4 more
doaj   +1 more source

A Multi-Angle Method for Simultaneous Retrieval of Aerosol Optical Depth and Bidirectional Reflectance Over Case II Waters

Frontiers in Environmental Science, 2022
Retrieval of aerosol optical depth (AOD) and bidirectional reflectance over Case II waters is a challenging task because of the optical complexity of water and the significant influence of atmospheric scattering.
Zeying Han, Zeying Han, Tianhai Cheng, Xingfa Gu, Xingfa Gu, Xingfa Gu, Shuaiyi Shi, Xiaoyang Li, Xiaoyang Li, Kaiyi Bi, Kaiyi Bi   +10 more
doaj   +1 more source

Efficient fullwave-guided optical proximity correction [PDF]

AIP Advances
The continuous shrinking of process nodes in lithography intensifies wave effects and causes mismatches between the designed mask patterns and the actual features printed on the wafer.
Zekui Jia, Luis Gomez, Weng Cho Chew, Austin Peng, Ronald Goossens   +4 more
doaj   +1 more source

An Improved 3D OPC Method for the Fabrication of High-Fidelity Micro Fresnel Lenses

Micromachines, 2023
Based on three-dimensional optical proximity correction (3D OPC), recent advancements in 3D lithography have enabled the high-fidelity customization of 3D micro-optical elements.
Fei Peng, Chao Sun, Hui Wan, Chengqun Gui   +3 more
doaj   +1 more source

300 mm Large Area Wire Grid Polarizers with 50 nm Half-Pitch by ArF Immersion Lithography

Nanomaterials, 2022
The large area wire grid polarizers (LA-WGPs) with 50 nm half-pitch were fabricated using ArF immersion lithography overcoming the limit of the shot field size.
Jungchul Song, Jae Sub Oh, Min Jun Bak, Il-Suk Kang, Sung Jung Lee, Ga-Won Lee   +5 more
doaj   +1 more source

A deep learning-based stripe self-correction method for stitched microscopic images

Nature Communications, 2023
Stitched fluorescence microscope images inevitably exist in various types of stripes or artifacts caused by uncertain factors such as optical devices or specimens, which severely affects the image quality and downstream quantitative analysis.
Shu Wang, Xiaoxiang Liu, Yueying Li, Xinquan Sun, Qi Li, Yinhua She, Yixuan Xu, Xingxin Huang, Ruolan Lin, Deyong Kang, Xingfu Wang, Haohua Tu, Wenxi Liu, Feng Huang, Jianxin Chen   +14 more
doaj   +1 more source