Results 31 to 40 of about 19,199 (250)

Curvilinear Sub-Resolution Assist Feature Placement Through a Data-Driven U-Net Model

Micromachines
In advanced semiconductor manufacturing, computational lithography, particularly sub-resolution assist features (SRAFs), is crucial for enhancing the process window.
Jiale Liu, Wenjing He, Wenhao Ding, Yuhang Wang, Yijiang Shen   +4 more
doaj   +1 more source

Electrical Test Structures for the Characterization of Optical Proximity Correction [PDF]

IEEE Transactions on Semiconductor Manufacturing, 2007
Resistive electrical test structures have been designed to enable the characterization of optical proximity correction (OPC) applied to a right-angled corner in a conducting track. The OPC consists of square serifs that are either added to the outside corner or subtracted from the inner corner. Varying degrees of OPC can be applied by changing the size
Tsiamis, A., Smith, S., McCallum, M., Hourd, A., Stevenson, T., Walton, A. J.   +5 more
openaire   +2 more sources

Molecular characterization of covRS mutations in M1UK Streptococcus pyogenes

FEBS Open Bio, EarlyView.
Group A Streptococcus (GAS) acquires covRS mutations driving a hypervirulent bacterial state, frequently associated with invasive disease‐like necrotizing fasciitis. We demonstrate that the newly emerged M1UK GAS lineage can also acquire these mutations.
Jarrad Pritchard, Emma‐Jayne Proctor, Jiawa Wang, Nikolas P. Johnston, Andrew Hayes, Georgia McCorkell, Haibo Yu, Jai Tree, Mark R. Davies, Mark J. Walker, Ronald Sluyter, Stephan Brouwer, Martina L. Sanderson‐Smith   +12 more
wiley   +1 more source

Optical proximity correction in IC production

Технологія та конструювання в електронній апаратурі, 2007
Methods and types of figures for optical proximity correction are considered. The lithography process was simulated using the discussed correction figures, and the modeling results were experimentally ...
I. A. Rodionov, V. V. Makarchuk
doaj  

A new flow chip in combination with multiphoton microscopy as a protocol for longitudinal 3D imaging of tissue calcification under shear stress

FEBS Open Bio, EarlyView.
Miniaturized flow chip platform enabling continuous perfusion and longitudinal multiphoton 3D imaging of vascular smooth muscle cell constructs under physiological flow. Brightfield imaging guides region selection, while CellTracker Green and mRuby‐labeled fetuin‐A visualize cells and mineral deposition, respectively. Magnesium supplementation markedly
Vytautas Kučikas, Aaron D. Morgan, Ignas Čiurlionis, Christian Böhm, Stefan Jockenhövel, Willi Jahnen‐Dechent, Marc A. M. J. van Zandvoort   +6 more
wiley   +1 more source

Machine Learning-Enhanced Model-Based Optical Proximity Correction Framework With Convolutional Neural Network-Based Variable Threshold Method Near the Diffraction Limit

IEEE Access
As semiconductor manufacturing approaches the diffraction limit of lithography, traditional model-based optical proximity correction (MBOPC) techniques face accuracy bottlenecks due to physical modeling errors. This study proposes a Machine Learning (ML)-
Jinhao Zhu, Liwan Yue, Ying Li, Xianhe Liu, Qiang Wu, Qi Wang, Yanli Li   +6 more
doaj   +1 more source

Dual native G‐quadruplex folding is associated with chromatin looping at the MYC locus

FEBS Open Bio, EarlyView.
BG4‐detectable G‐quadruplex (G4) in HaCaT and NHEK keratinocytes identified folded and unfolded G4s enriched at promoters/TSSs and active enhancers, whereas unfolded G4s also overlapped weak/poised enhancers. At MYC–PVT1, 3C‐qPCR detected enhancer–promoter looping only when G4s were simultaneously folded at both regulatory elements under native ...
Dieila Giomo de Lima, Gustavo Narvaes Guimarães, Emilyane de Oliveira Santana Amaral, Bianca Caroline Figueiredo Bianco, Manuel Jara‐Espejo, Sérgio Roberto Peres Line, Ana Paula de Souza, Aline Cristiane Planello   +7 more
wiley   +1 more source

Machine Learning-Enhanced Model-Based Optical Proximity Correction by Using Convolutional Neural Network-Based Variable Threshold Method

IEEE Access
As the lithography process continues to become more rigorous in advanced technology nodes, the model-based optical proximity correction (MBOPC), as a core component within computational lithography, necessitates the development of highly precise ...
Jinhao Zhu, Zhiwei Ren, Ying Li, Xianhe Liu, Qiang Wu, Yanli Li, Qi Wang   +6 more
doaj   +1 more source

Placement of Sub-Resolution Assist Features Based on a Genetic Algorithm

IEEE Access, 2019
Resolution enhancement techniques compatible with an ArF (193 nm) immersion optical lithography system may constitute an effective means of minimizing the size of technology nodes of the dynamic random access memory.
Wei-Ming Kan, Yu-Ru Huang, Chao-Yi Huang, Chun-Sheng Wu, Kao-Tun Chen, Yu-Shin Lin, Hung-Fei Kuo   +6 more
doaj   +1 more source

Structure–Function Decoupling of the Sensorimotor and Default Mode Networks in Black Americans With MS

Annals of Clinical and Translational Neurology, EarlyView.
ABSTRACT Background and Objectives Multiple sclerosis (MS) exhibits racially disparate rates of disease progression. Black people with MS (B‐PwMS) experience a more severe disease course than non‐Hispanic White people with MS (NHW‐PwMS). Here we investigated structural and functional connectivity as well as structure–function decoupling in the ...
Emilio Cipriano, Giacomo Boffa, Maria Petracca, Marta Ponzano, Nicole Graziano, Claire Wigley, Claire Riley, Jonathan Howard, Pietro Bontempi, Sylvia Klineova, Fred Lublin, Matilde Inglese   +11 more
wiley   +1 more source