Results 11 to 20 of about 19,199 (250)
Frontiers in Environmental Science, 2022 Retrieval of aerosol optical depth (AOD) and bidirectional reflectance over Case II waters is a challenging task because of the optical complexity of water and the significant influence of atmospheric scattering.
Zeying Han +10 more
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An Improved 3D OPC Method for the Fabrication of High-Fidelity Micro Fresnel Lenses
Micromachines, 2023 Based on three-dimensional optical proximity correction (3D OPC), recent advancements in 3D lithography have enabled the high-fidelity customization of 3D micro-optical elements.
Fei Peng +3 more
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300 mm Large Area Wire Grid Polarizers with 50 nm Half-Pitch by ArF Immersion Lithography
Nanomaterials, 2022 The large area wire grid polarizers (LA-WGPs) with 50 nm half-pitch were fabricated using ArF immersion lithography overcoming the limit of the shot field size.
Jungchul Song +5 more
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A deep learning-based stripe self-correction method for stitched microscopic images
Nature Communications, 2023 Stitched fluorescence microscope images inevitably exist in various types of stripes or artifacts caused by uncertain factors such as optical devices or specimens, which severely affects the image quality and downstream quantitative analysis.
Shu Wang +14 more
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Light: Advanced Manufacturing, 2022 Aspheric micro-lens array (AMLA), featured with low dispersion and diffraction-limited imaging quality, plays an important role in advanced optical imaging. Ideally, the fabrication of commercially applicable AMLAs should feature low cost, high precision,
Shiyi Luan +5 more
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Frontiers in Nanotechnology, 2022 We demonstrate the effectiveness of phase only aberration corrections of structured light and their application to versatile optical trapping setups. We calculate phase corrections before (ex-situ) and after (in-situ) a high numerical aperture microscope
D. J. Armstrong +3 more
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Study of Inverse Lithography Approaches based on Deep Learning
Journal of Microelectronic Manufacturing, 2020 Computational lithography (CL) has become an indispensable technology to improve imaging resolution and fidelity of deep sub-wavelength lithography. The state-of-the-art CL approaches are capable of optimizing pixel-based mask patterns to effectively ...
Xianqiang Zheng +4 more
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The Variables and Invariants in the Evolution of Logic Optical Lithography Process
Journal of Microelectronic Manufacturing, 2019 Photolithography has been a major enabler for the continuous shrink of the semiconductor manufacturing design rules. Throughout the years of the development of the photolithography, many new technologies have been invented and successfully implemented ...
Qiang Wu
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Optical Proximity Correction With Linear Regression [PDF]
IEEE Transactions on Semiconductor Manufacturing, 2008 An important step in today's integrated circuit (IC) manufacturing is optical proximity correction (OPC). In model-based OPC, masks are systematically modified to compensate for the nonideal optical and process effects of an optical lithography system.
Allan Gu, Avideh Zakhor
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Fast and Robust DCNN Based Lithography SEM Image Contour Extraction Models
Journal of Microelectronic Manufacturing, 2021 Scanning electron microscope (SEM) metrology is critical in semiconductor manufacturing for patterning process quality assessment and monitoring. Besides feature width and feature-feature space dimension measurements from critical dimension SEM (CDSEM ...
Tao Zhou +9 more
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