Results 11 to 20 of about 20,720 (256)

Design and validation of a high-speed rotor balancer based on influence coefficient method and dual-speed control [PDF]

Scientific Reports
Balancing of rotors requires a specialized device known as a balancer, which measures centrifugal forces by rotating the rotor and applies corrective masses to achieve balance. Higher rotational speeds enhance the accuracy of the balancing process due to
Pourya Kord Gharehcheloo, Farhad Fani Saberi, Mahnaz Shamshirsaz   +2 more
doaj   +2 more sources

Toward High-Resolution Polymeric Neural Interfaces: A Practical Guide for Electron Beam Lithography. [PDF]

Adv Sci (Weinh)
Electron beam lithography (EBL) enables sub‐micron patterning of polymer‐based neural implants, overcoming the resolution limits of optical lithography. By addressing challenges such as charging, non‐planarity, and substrate heating, it supports higher channel density, improved miniaturization, and better long‐term tissue integration.
Karlsson-Fernberg H, Asplund M.
europepmc   +2 more sources

High-speed, large-area and high-precision fabrication of aspheric micro-lens array based on 12-bit direct laser writing lithography

Light: Advanced Manufacturing, 2022
Aspheric micro-lens array (AMLA), featured with low dispersion and diffraction-limited imaging quality, plays an important role in advanced optical imaging. Ideally, the fabrication of commercially applicable AMLAs should feature low cost, high precision,
Shiyi Luan, Fei Peng, Guoxing Zheng, Chengqun Gui, Yi Song, Sheng Liu   +5 more
doaj   +1 more source

Study of Inverse Lithography Approaches based on Deep Learning

Journal of Microelectronic Manufacturing, 2020
Computational lithography (CL) has become an indispensable technology to improve imaging resolution and fidelity of deep sub-wavelength lithography. The state-of-the-art CL approaches are capable of optimizing pixel-based mask patterns to effectively ...
Xianqiang Zheng, Xu Ma, Shengen Zhang, Yihua Pan, Gonzalo R. Arce   +4 more
doaj   +1 more source

The Variables and Invariants in the Evolution of Logic Optical Lithography Process

Journal of Microelectronic Manufacturing, 2019
Photolithography has been a major enabler for the continuous shrink of the semiconductor manufacturing design rules. Throughout the years of the development of the photolithography, many new technologies have been invented and successfully implemented ...
Qiang Wu
doaj   +1 more source

Improved two-photon photopolymerisation and optical trapping with aberration-corrected structured light

Frontiers in Nanotechnology, 2022
We demonstrate the effectiveness of phase only aberration corrections of structured light and their application to versatile optical trapping setups. We calculate phase corrections before (ex-situ) and after (in-situ) a high numerical aperture microscope
D. J. Armstrong, A. B Stilgoe, T. A. Nieminen, H. Rubinsztein-Dunlop   +3 more
doaj   +1 more source

Intelligent Proximity Correction Enabled Large-Area Metasurfaces by KrF Photolithography

IEEE Access
Model-based optical proximity correction (OPC) is a widely adopted resolution enhancement technique that compensates for lithography proximity effects by adjusting and correcting mask pattern shapes.
Hsueh-Li Liu, Sheng-Hsiang Su, Po-Kai Chang, You-Chia Chang, Yao-Wei Huang, Chia-Wei Chang, Tsai-Ming Huang, Chun-Chi Chen, Wen-Hsien Huang, Jia-Min Shieh, Peichen Yu   +10 more
doaj   +1 more source

Fast and Robust DCNN Based Lithography SEM Image Contour Extraction Models

Journal of Microelectronic Manufacturing, 2021
Scanning electron microscope (SEM) metrology is critical in semiconductor manufacturing for patterning process quality assessment and monitoring. Besides feature width and feature-feature space dimension measurements from critical dimension SEM (CDSEM ...
Tao Zhou, Xuelong Shi, Chen Li, Yan Yan, Bowen Xu, Shoumian Chen, Yuhang Zhao, Wenzhan Zhou, Kan Zhou, Xuan Zeng   +9 more
doaj   +1 more source

A Novel Optical Proximity Correction Machine Learning Model Using a Single-Flow Convolutional Feedback Networks With Customized Attention

IEEE Access
In semiconductor fabrication, any deviation leads to significant mistakes in the result. Thus, the proximity effect is a critical issue that must be solved.
Ching-Hsuan Huang, Han-Chun Tung, Yen-Wei Feng, Hung-Tse Hsu, Hsueh-Li Liu, Albert Lin, Peichen Yu   +6 more
doaj   +1 more source

Intelligent Photolithography Corrections Using Dimensionality Reductions

IEEE Photonics Journal, 2019
With the shrinking of the IC technology node, optical proximity effects (OPC) and etch proximity effects (EPC) are the two major tasks in advanced photolithography patterning.
Parag Parashar, Chandni Akbar, Tejender S. Rawat, Sparsh Pratik, Rajat Butola, Shih H. Chen, Yung-Sung Chang, Sirapop Nuannimnoi, Albert S. Lin   +8 more
doaj   +1 more source