Results 11 to 20 of about 19,664 (279)

Electrical Test Structures for the Characterization of Optical Proximity Correction [PDF]

IEEE Transactions on Semiconductor Manufacturing, 2007
Resistive electrical test structures have been designed to enable the characterization of optical proximity correction (OPC) applied to a right-angled corner in a conducting track. The OPC consists of square serifs that are either added to the outside corner or subtracted from the inner corner. Varying degrees of OPC can be applied by changing the size
Tsiamis, A., Smith, S., McCallum, M., Hourd, A., Stevenson, T., Walton, A. J.   +5 more
core   +4 more sources

Optical proximity correction with principal component regression [PDF]

SPIE Proceedings, 2008
An important step in today's Integrated Circuit (IC) manufacturing is optical proximity correction (OPC). In model based OPC, masks are systematically modified to compensate for the non-ideal optical and process effects of optical lithography system.
Peiran Gao, Allan Gu, Avideh Zakhor
openaire   +2 more sources

Optical proximity correction for 0.13 μm SiGe:C BiCMOS

SPIE Proceedings, 2008
We present results for a rule based optical proximity (RB-OPC) and a model based optical proximity correction (MB-OPC) for 0.13 μm SiGe:C BiCMOS technology. The technology provides integrated high performance heterojunction bipolar transistors (HBTs) with cut-off frequencies up to 300 GHz.
Geisler, Sebastian, Bauer, Joachim, Haak, Ulrich, Jagdhold, Ulrich A., Pliquett, R., Matthus, E., Schrader, R., Wolf, H., Baetz, U., Beyer, Harald, Niehoff, Martin   +10 more
openaire   +3 more sources

A Novel Optical Proximity Correction Machine Learning Model Using a Single-Flow Convolutional Feedback Networks With Customized Attention

IEEE Access
In semiconductor fabrication, any deviation leads to significant mistakes in the result. Thus, the proximity effect is a critical issue that must be solved.
Ching-Hsuan Huang, Han-Chun Tung, Yen-Wei Feng, Hung-Tse Hsu, Hsueh-Li Liu, Albert Lin, Peichen Yu   +6 more
doaj   +2 more sources

Optical proximity correction in IC production

Технологія та конструювання в електронній апаратурі, 2007
Methods and types of figures for optical proximity correction are considered. The lithography process was simulated using the discussed correction figures, and the modeling results were experimentally ...
I. A. Rodionov, V. V. Makarchuk
doaj   +1 more source

Machine Learning based Optical Proximity Correction Techniques

Journal of Microelectronic Manufacturing, 2020
The shrinking of the size of the advanced technological nodes brings up new challenges to the semiconductor manufacturing community. The optical proximity correction (OPC) is invented to reduce the errors of the lithographic process. The conventional OPC
Pengpeng Yuan, Taian Fan, Yaobin Feng, Peng Xu , Yayi Wei   +4 more
doaj   +1 more source

A Multi-Angle Method for Simultaneous Retrieval of Aerosol Optical Depth and Bidirectional Reflectance Over Case II Waters

Frontiers in Environmental Science, 2022
Retrieval of aerosol optical depth (AOD) and bidirectional reflectance over Case II waters is a challenging task because of the optical complexity of water and the significant influence of atmospheric scattering.
Zeying Han, Zeying Han, Tianhai Cheng, Xingfa Gu, Xingfa Gu, Xingfa Gu, Shuaiyi Shi, Xiaoyang Li, Xiaoyang Li, Kaiyi Bi, Kaiyi Bi   +10 more
doaj   +1 more source

An Improved 3D OPC Method for the Fabrication of High-Fidelity Micro Fresnel Lenses

Micromachines, 2023
Based on three-dimensional optical proximity correction (3D OPC), recent advancements in 3D lithography have enabled the high-fidelity customization of 3D micro-optical elements.
Fei Peng, Chao Sun, Hui Wan, Chengqun Gui   +3 more
doaj   +1 more source

300 mm Large Area Wire Grid Polarizers with 50 nm Half-Pitch by ArF Immersion Lithography

Nanomaterials, 2022
The large area wire grid polarizers (LA-WGPs) with 50 nm half-pitch were fabricated using ArF immersion lithography overcoming the limit of the shot field size.
Jungchul Song, Jae Sub Oh, Min Jun Bak, Il-Suk Kang, Sung Jung Lee, Ga-Won Lee   +5 more
doaj   +1 more source

A deep learning-based stripe self-correction method for stitched microscopic images

Nature Communications, 2023
Stitched fluorescence microscope images inevitably exist in various types of stripes or artifacts caused by uncertain factors such as optical devices or specimens, which severely affects the image quality and downstream quantitative analysis.
Shu Wang, Xiaoxiang Liu, Yueying Li, Xinquan Sun, Qi Li, Yinhua She, Yixuan Xu, Xingxin Huang, Ruolan Lin, Deyong Kang, Xingfu Wang, Haohua Tu, Wenxi Liu, Feng Huang, Jianxin Chen   +14 more
doaj   +1 more source