Results 1 to 10 of about 361 (102)

An Improved 3D OPC Method for the Fabrication of High-Fidelity Micro Fresnel Lenses [PDF]

Micromachines, 2023
Based on three-dimensional optical proximity correction (3D OPC), recent advancements in 3D lithography have enabled the high-fidelity customization of 3D micro-optical elements.
Fei Peng, Chao Sun, Hui Wan, Chengqun Gui   +3 more
doaj   +2 more sources

Improvement of YX42° Cut LiTaO₃ SAW Filters with Optical Proximity Effect Correction Method [PDF]

Micromachines, 2023
Due to the influence of the optical proximity effect (OPE), it is easy for a pattern of photoresistance to be inconsistent with a design pattern, thus damaging the performance of a SAW resonator. To solve this problem, this paper proposes an optimization
Ping Luo, Yali Zou, Xinyu Yang, Juntao Li, Xuan Huang, Jian Zhou, Xing Han, Yushuai Liu, Yuhao Liu, Tao Wu   +9 more
doaj   +2 more sources

Inverse Lithography Technology (ILT) Under Chip Manufacture Context [PDF]

Micromachines
As semiconductor process nodes shrink to 3 nm and beyond, traditional optical proximity correction (OPC) and resolution enhancement technologies (RETs) can no longer meet the high patterning precision needs of advanced chip manufacturing due to the sub ...
Xiaodong Meng, Cai Chen, Jie Ni
doaj   +2 more sources

Adaptive reinforcement learning for lithography optimization: a scalable AI-driven solution for next-generation semiconductor manufacturing [PDF]

Scientific Reports
Semiconductor lithography, a pivotal process in integrated circuit (IC) fabrication, accounts for approximately 30% of production costs and faces significant challenges as feature sizes shrink to sub-nanometer scales.
Umar Rashid, Fahad Shafique, Hamza Atif, Waleed Waheed, Rizwan Khan, Muhammad Akmal   +5 more
doaj   +2 more sources

300 mm Large Area Wire Grid Polarizers with 50 nm Half-Pitch by ArF Immersion Lithography

Nanomaterials, 2022
The large area wire grid polarizers (LA-WGPs) with 50 nm half-pitch were fabricated using ArF immersion lithography overcoming the limit of the shot field size.
Jungchul Song, Jae Sub Oh, Min Jun Bak, Il-Suk Kang, Sung Jung Lee, Ga-Won Lee   +5 more
doaj   +1 more source

Optical Proximity Correction Using Machine Learning Assisted Human Decision

IEEE Photonics Journal, 2023
Optical proximity correction (OPC) is a critical step in semiconductor manufacturing due to its high complexity and significant influence on the subsequent process steps. Conventional OPC using the Maxwell equation can become more and more challenging as
Albert Lin, Tejender Rawat, Chung-Yuan Chang, Han-Chun Tung, Hsueh-Li Liu, Peichen Yu   +5 more
doaj   +1 more source

Machine Learning based Optical Proximity Correction Techniques

Journal of Microelectronic Manufacturing, 2020
The shrinking of the size of the advanced technological nodes brings up new challenges to the semiconductor manufacturing community. The optical proximity correction (OPC) is invented to reduce the errors of the lithographic process. The conventional OPC
Pengpeng Yuan, Taian Fan, Yaobin Feng, Peng Xu , Yayi Wei   +4 more
doaj   +1 more source

Study of Inverse Lithography Approaches based on Deep Learning

Journal of Microelectronic Manufacturing, 2020
Computational lithography (CL) has become an indispensable technology to improve imaging resolution and fidelity of deep sub-wavelength lithography. The state-of-the-art CL approaches are capable of optimizing pixel-based mask patterns to effectively ...
Xianqiang Zheng, Xu Ma, Shengen Zhang, Yihua Pan, Gonzalo R. Arce   +4 more
doaj   +1 more source

Fast and Robust DCNN Based Lithography SEM Image Contour Extraction Models

Journal of Microelectronic Manufacturing, 2021
Scanning electron microscope (SEM) metrology is critical in semiconductor manufacturing for patterning process quality assessment and monitoring. Besides feature width and feature-feature space dimension measurements from critical dimension SEM (CDSEM ...
Tao Zhou, Xuelong Shi, Chen Li, Yan Yan, Bowen Xu, Shoumian Chen, Yuhang Zhao, Wenzhan Zhou, Kan Zhou, Xuan Zeng   +9 more
doaj   +1 more source

Intelligent Photolithography Corrections Using Dimensionality Reductions

IEEE Photonics Journal, 2019
With the shrinking of the IC technology node, optical proximity effects (OPC) and etch proximity effects (EPC) are the two major tasks in advanced photolithography patterning.
Parag Parashar, Chandni Akbar, Tejender S. Rawat, Sparsh Pratik, Rajat Butola, Shih H. Chen, Yung-Sung Chang, Sirapop Nuannimnoi, Albert S. Lin   +8 more
doaj   +1 more source