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Optical Proximity Correction (OPC) Under Immersion Lithography
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Advancements and challenges in inverse lithography technology: a review of artificial intelligence-based approaches. [PDF]
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A Fast Manufacturability Aware Optical Proximity Correction (OPC) Algorithm with Adaptive Wafer Image Estimationidentifier:oai:t2r2.star.titech.ac.jp ...
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Efficient Mask Optimization for DMD-Based Maskless Lithography Using a Genetic-Hippo Hybrid Algorithm. [PDF]
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Patterning Fidelity Enhancement and Aberration Mitigation in EUV Lithography Through Source-Mask Optimization. [PDF]
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A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent. [PDF]
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EAAUnet-ILT: A Lightweight and Iterative Mask Optimization Resolution with SRAF Constraint Scheme. [PDF]
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Toward Accurate Real-Time Bioaerosol Monitoring in the Particle Size Range 1 μm-70 μm. [PDF]
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AI-Assisted Composite Etch Model for MPT. [PDF]
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