Results 41 to 50 of about 98 (86)
Optical Proximity Correction (OPC) Under Immersion Lithography
, 2018 Ahmed Awad +2 more
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A Fast Manufacturability Aware Optical Proximity Correction (OPC) Algorithm with Adaptive Wafer Image Estimationidentifier:oai:t2r2.star.titech.ac.jp ...
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Stray-light implementation in optical proximity correction (OPC)
SPIE Proceedings, 2007It is suggested that stray-light (SL, also called flare, scattered light) impact can be compensated by modifying standard OPC method. Compared to traditional optical proximity effect caused by diffraction limit, stray light leads to extremely long range (~ 100 micrometer ~ 10 millimeter) proximity effect.
Young-Chang Kim +2 more
exaly +2 more sources
Transferring Optical Proximity Correction (OPC) Effect into Optical Mode
8th International Symposium on Quality Electronic Design (ISQED'07), 2007Because of the ever-decreasing feature size in modern photolithography, the complexity of pattern increases dramatically and tape-out time becomes prolonged. It is desirable to transfer OPC process into optical model for the sake of time. In this report, we introduce a novel method of calculating the OPC effect by modifying the optical model, which is ...
Jianliang Li +2 more
exaly +2 more sources
Line end optimization through optical proximity correction (OPC): a case study
SPIE Proceedings, 2006Device performance is highly associated with the line end performance of critical layers. Poly line end shortening (LES) or bridging can result in leakage or short circuit. Model-based optical proximity correction (OPC) prioritized to fit one-dimensional pitch structures can also improve two-dimensional line end performance.
Dyiann Chou, Ken McAllister
exaly +2 more sources
Proceedings of the 2016 Design, Automation & Test in Europe Conference & Exhibition (DATE), 2016
Aggressive Optical Proximity Correction (OPC) has been widely adopted in optical lithography to preserve circuit performance for sub-20nm technology nodes. However, complex mask patterns are output resulting in lower mask manufacturability and large computational time.
exaly +3 more sources
Aggressive Optical Proximity Correction (OPC) has been widely adopted in optical lithography to preserve circuit performance for sub-20nm technology nodes. However, complex mask patterns are output resulting in lower mask manufacturability and large computational time.
exaly +3 more sources
SPIE Proceedings, 2002
Advanced hybrid optical proximity correction (OPC) system with OPC segment library and a model-based correction module has been found to be much promising for reducing the mask data processing time. Recycling the OPC segment library made of previous products for next derivative products with common design rule could reduce the OPC process time down to ...
Soichi Inoue +2 more
exaly +2 more sources
Advanced hybrid optical proximity correction (OPC) system with OPC segment library and a model-based correction module has been found to be much promising for reducing the mask data processing time. Recycling the OPC segment library made of previous products for next derivative products with common design rule could reduce the OPC process time down to ...
Soichi Inoue +2 more
exaly +2 more sources
Full-depth optical proximity correction (FD-OPC) based on E-D forest
SPIE Proceedings, 1999When the k 1 number approaches 0.6 and below, optical proximity correction (OPC) is inevitable. Most existing OPC schemes correct the image in the focal planes without considering the possibility of different optimum focuses for the features to be corrected.
Burn J. Lin, Peter Young
exaly +2 more sources
Proceedings of SPIE, 2008
In this study, we discuss modeling finite laser bandwidth for application to optical proximity modeling and correction. We discuss the accuracy of commonly-used approximations to the laser spectrum shape, namely the modified Lorentzian and Gaussian forms compared to using measurement-derived laser fingerprints. In this work, we show that the use of the
Ivan Lalovic +5 more
exaly +2 more sources
In this study, we discuss modeling finite laser bandwidth for application to optical proximity modeling and correction. We discuss the accuracy of commonly-used approximations to the laser spectrum shape, namely the modified Lorentzian and Gaussian forms compared to using measurement-derived laser fingerprints. In this work, we show that the use of the
Ivan Lalovic +5 more
exaly +2 more sources
P‐79: New Applications of Optical Proximity Correction (OPC) Technology in the Display Industry
Digest of Technical Papers SID International SymposiumThis article introduces two new application cases of Optical Proximity Correction (OPC) technology in display backboards. The first method is to use OPC technology on the mask template layout to solve the Mura defect problem caused by diffraction induced exposure increase during the splicing process of the Over Coat (OC) layer mask template.
Jing Wang +4 more
exaly +2 more sources