Results 41 to 50 of about 421 (134)

Publication Only

HemaSphere, Volume 10, Issue S1, June 2026.
wiley   +1 more source

A Novel Optical Proximity Correction (OPC) System Based on Deep Learning Method for the Extreme Ultraviolet (EUV) Lithography

Progress In Electromagnetics Research, 2023
Li-Ye Xiao, Jun-Nan Yi, Yiqian Mao, Xin-Yue Qi, Ronghan Hong, Qing Huo Liu   +5 more
openaire   +1 more source

Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation. [PDF]

Microsyst Nanoeng, 2023
Han D, Deng S, Ye T, Wei Y.
europepmc   +1 more source

Optical Proximity Correction (OPC) Under Immersion Lithography

, 2018
Ahmed Awad, Atsushi Takahashi, Chikaaki Kodaman   +2 more
openaire   +2 more sources

Advancements and challenges in inverse lithography technology: a review of artificial intelligence-based approaches. [PDF]

Light Sci Appl
Yang Y, Liu K, Gao Y, Wang C, Cao L.
europepmc   +1 more source

Efficient Mask Optimization for DMD-Based Maskless Lithography Using a Genetic-Hippo Hybrid Algorithm. [PDF]

Micromachines (Basel)
Chen Z, Tu C, Sun H, Kang X, Liu J, Hu S.   +5 more
europepmc   +1 more source

Patterning Fidelity Enhancement and Aberration Mitigation in EUV Lithography Through Source-Mask Optimization. [PDF]

Micromachines (Basel)
Wang Q, Wu Q, Li Y, Liu X, Li Y.
europepmc   +1 more source

A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent. [PDF]

Micromachines (Basel)
Sun H, Zhang Q, Zhou J, Gong J, Jin C, Zhou J, Liu J.   +6 more
europepmc   +1 more source

EAAUnet-ILT: A Lightweight and Iterative Mask Optimization Resolution with SRAF Constraint Scheme. [PDF]

Micromachines (Basel)
Wang K, Ren K.
europepmc   +1 more source

A Study on Condition-Based Maintenance for Wafer Table Edge Degradation in Photolithography Equipment. [PDF]

Sensors (Basel)
Joo K, Lee KH, Jeon JW.
europepmc   +1 more source