Results 21 to 30 of about 380 (120)

Performance of a glider‐mounted multifrequency echosounder for measuring the vertical distribution and abundance of large pelagic copepods

Limnology and Oceanography: Methods, Volume 24, Issue 6, June 2026.
Abstract The difficulty of sampling zooplankton communities in situ has driven advancements in autonomous, remote sensing technology. The goal of this paper was to perform a gear comparison study testing the performance of one such piece of technology—a glider‐mounted four‐frequency echosounder—against traditional shipboard methods of measuring ...
Delphine Mossman, Joseph D. Warren, Natasha J. Hynes, Kimberley T. A. Davies   +3 more
wiley   +1 more source

Genetic Diagnosis and Discovery Enabled by Large Language Models

Advanced Science, Volume 13, Issue 22, 17 April 2026.
We demonstrate that large language models (LLMs) can facilitate genetic diagnosis and discovery. LLMs were used to solve four types of genetic problems of sequentially increased complexity. An LLM‐based pipeline could analyze genetic variants in the genomic sequences of human hearing loss or rare genetic disease patients and assist in identifying ...
Tao Tu, Khaled Saab, Weida Liu, Zhouqing Fang, Zhuanfen Cheng, Svetolik Spasic, Maja Djurisic, Hiroaki Mohri, Wenlong Ren, Anil Palepu, Juraj Gottweis, Alan Karthikesalingam, Kavita Kulkarni, Annalisa Pawlosky, Devon Bonner, Elijah Kravets, Shruti Marwaha, Hector R. Mendez, Matthew T. Wheeler, Jonathan A. Bernstein, Undiagnosed Diseases Network, Cheng‐Yu Tsai, Chen‐Chi Wu, Konstantina M. Stankovic, Vivek Natarajan, Gary Peltz   +25 more
wiley   +1 more source

PolygonTailor: A Parallel Algorithm for Polygon Boolean Operations in IC Layout Processing

Algorithms
Polygon Boolean operations are widely used in integrated circuit (IC) layout processing tasks such as design rule checking (DRC) and optical proximity correction (OPC).
Zhirui Niu, Ruian Ji, Guan Wang, Siao Guo, Shijie Ye, Lan Chen   +5 more
doaj   +1 more source

Roadmap on Artificial Intelligence‐Augmented Additive Manufacturing

Advanced Intelligent Systems, Volume 8, Issue 4, April 2026.
This Roadmap outlines the transformative role of artificial intelligence‐augmented additive manufacturing, highlighting advances in design, monitoring, and product development. By integrating tools such as generative design, computer vision, digital twins, and closed‐loop control, it presents pathways toward smart, scalable, and autonomous additive ...
Ali Zolfagharian, Liuchao Jin, Qi Ge, Wei‐Hsin Liao, Andrés Díaz Lantada, Francisco Franco Martínez, Tianyu Zhang, Tao Liu, Charlie C. L. Wang, Mohammad Hossein Mosallanejad, Reza Ghanavati, Abdollah Saboori, Alejandro De Blas De Miguel, William Solórzano‐Requejo, Yi Cai, Xiangyang Dong, Huangyi Qu, Najmeh Samadiani, Guangyan Huang, Austin Downey, Yanzhou Fu, Lang Yuan, Tsz‐Kwan (Glory) Lee, Arbind Agrahari Baniya, Eisha Waseem, Abdul Rahman Sani, Abbas Z. Kouzani, Yijia Wu, Markus P. Nemitz, Masoud Shirzad, Dageon Oh, Seung Yun Nam, Amedeo Franco Bonatti, Irene Chiesa, Gabriele Maria Fortunato, Giovanni Vozzi, Carmelo De Maria, Mahdi Bodaghi   +37 more
wiley   +1 more source

Metalearning‐Driven Inverse Optimization for Precision Microstructure Fabrication in Digital Light Processing Three‐Dimensional Printing

Advanced Intelligent Systems, Volume 8, Issue 4, April 2026.
Metalearning‐based inverse optimization enables precise microscale three‐dimensional printing using a DLP system. Distorted structures from conventional printing are analyzed via neural network regression, which predicts optimal exposure time and mask design.
Jae Won Choi, Suhyeong Lim, Jeongsu Lee, Cheol Woo Ha   +3 more
wiley   +1 more source

Machine Learning-Enhanced Model-Based Optical Proximity Correction Framework With Convolutional Neural Network-Based Variable Threshold Method Near the Diffraction Limit

IEEE Access
As semiconductor manufacturing approaches the diffraction limit of lithography, traditional model-based optical proximity correction (MBOPC) techniques face accuracy bottlenecks due to physical modeling errors. This study proposes a Machine Learning (ML)-
Jinhao Zhu, Liwan Yue, Ying Li, Xianhe Liu, Qiang Wu, Qi Wang, Yanli Li   +6 more
doaj   +1 more source

TOMM40 suppression promotes neuronal cholesterol imbalance and molecular and behavioral phenotypes of Alzheimer's disease

Alzheimer's &Dementia, Volume 22, Issue 4, April 2026.
Abstract INTRODUCTION While the apolipoprotein E (APOE) ε4 allele is a major risk factor for Alzheimer's disease (AD), the role of translocase of outer mitochondrial membrane 40 (TOMM40)—an adjacent gene involved in mitochondrial protein import—is not known. METHODS Human brain tissue, human induced pluripotent stem cell–derived neurons (iNeurons), and
Neil V. Yang, Shaowei Wang, Boyang Li, Jeffrey Simms, Linsey Dinh, Annie Huang, Jacob H. Oei, Hussein N. Yassine, Ronald M. Krauss   +8 more
wiley   +1 more source

Vertical Surrounding Gate Transistor for High Density and Low Voltage Operation in DRAM

IEEE Access
In this article, a honeycomb vertical surrounding gate access transistor array scheme is proposed to further decrease the DRAM cell area with aggressively shrink bit line (BL) pitch and word line (WL) pitch adopting the ZigZag BL and WL air gap.
Wenqi Wang, Sang Don Yi, Fu Li, Qingchen Cao, Jiangliu Shi, Bok-Moon Kang, Meichen Jin, Chang Liu, Zhenhua Wu, Guilei Wang, Chao Zhao   +10 more
doaj   +1 more source

Programmable Dimensional Lithography with Digital Micromirror Devices for Multifunctional Microarchitectures

Advanced Materials Technologies, Volume 11, Issue 5, 6 March 2026.
This review explores recent advances in digital micromirror device (DMD)‐based lithography, focusing on its programmable light modulation, multi‐material compatibility, and dimensional patterning strategies. It highlights innovations from optical system design to materials integration and multifunctional applications, positioning DMD lithography as a ...
Yubin Lee, Byungcheon Yoo, Chaeyeong Ryu, Jongwon Oh, Dahye Baek, Jiseok Lee   +5 more
wiley   +1 more source

Physical model-based ArF photoresist formulation development

AIP Advances
Since the logic 28 nm technology and beyond, ArF immersion lithography has been widely used in manufacturing. To fully utilize the potential of the lithographic resolution, process simulation has been used since the lithography process setup step.
Liwan Yue, Zhibiao Mao, Qiang Wu, Yanli Li, Yanqiu Li   +4 more
doaj   +1 more source