Results 21 to 30 of about 98 (86)
Semiconductor lithography, a pivotal process in integrated circuit (IC) fabrication, accounts for approximately 30% of production costs and faces significant challenges as feature sizes shrink to sub-nanometer scales.
Umar Rashid +5 more
doaj +1 more source
Overview of the paper organization, illustrating the hierarchical structure of cybersecurity domains in ICS and CPS, including attack analysis, security approaches, offensive tactics, career guidance, and concluding discussions. ABSTRACT The convergence of operational technology (OT) with IP‐based information systems has exposed industrial control ...
M. A. Khalifa +2 more
wiley +1 more source
Stratigraphy Preserved on the Jezero Crater Rim Reveals Repeated Impacts on Early Mars
Abstract The outer slopes of the western Jezero crater rim are hypothesized to expose sections of Early‐ to Pre‐Noachian crust uplifted by the Jezero impact, providing an excellent opportunity to investigate the earliest geologic processes active on terrestrial planets.
Alexander J. Jones +27 more
wiley +1 more source
PolygonTailor: A Parallel Algorithm for Polygon Boolean Operations in IC Layout Processing
Polygon Boolean operations are widely used in integrated circuit (IC) layout processing tasks such as design rule checking (DRC) and optical proximity correction (OPC).
Zhirui Niu +5 more
doaj +1 more source
Abstract Cloud condensation nuclei (CCN) modulate the properties and thus the climate effects of clouds. The North African dust plume is an important source of CCN in the North Atlantic trade‐wind zone. Yet, research into the nature and sources of these CCN is sparse, making it difficult to fully assess related cloud effects. Using combined airborne in
Adrian Walser +11 more
wiley +1 more source
ALKBH3 m1A Demethylase Deficiency Reduces Alzheimer's Amyloid‐β Pathology
This study identifies that ALKBH3‐driven m1A demethylation orchestrates Alzheimer's disease progression by disrupting mitochondrial and synaptic homeostasis. This epitranscriptomic mechanism suppresses PINK1‐mediated mitophagy via m1A erasure, leading to mitochondrial dysfunction, oxidative stress, elevated Aβ production, and impaired microglial ...
Yueyang Li +25 more
wiley +1 more source
As semiconductor manufacturing approaches the diffraction limit of lithography, traditional model-based optical proximity correction (MBOPC) techniques face accuracy bottlenecks due to physical modeling errors. This study proposes a Machine Learning (ML)-
Jinhao Zhu +6 more
doaj +1 more source
Abstract INTRODUCTION Whether cholinergic activity in the septohippocampal network affects cognitive dysfunction via hippocampal cholinergic neurostimulating peptide (HCNP) in Alzheimer's pathogenesis remains unclear. METHODS An Alzheimer's pathogenesis by mutation in amyloid‐beta precursor protein gene (AppNL‐G‐F) knock‐in (KI) and HCNP precursor ...
Yo Tsuda +10 more
wiley +1 more source
Vertical Surrounding Gate Transistor for High Density and Low Voltage Operation in DRAM
In this article, a honeycomb vertical surrounding gate access transistor array scheme is proposed to further decrease the DRAM cell area with aggressively shrink bit line (BL) pitch and word line (WL) pitch adopting the ZigZag BL and WL air gap.
Wenqi Wang +10 more
doaj +1 more source
Physical model-based ArF photoresist formulation development
Since the logic 28 nm technology and beyond, ArF immersion lithography has been widely used in manufacturing. To fully utilize the potential of the lithographic resolution, process simulation has been used since the lithography process setup step.
Liwan Yue +4 more
doaj +1 more source

