Results 11 to 20 of about 421 (134)

Intelligent Photolithography Corrections Using Dimensionality Reductions

IEEE Photonics Journal, 2019
With the shrinking of the IC technology node, optical proximity effects (OPC) and etch proximity effects (EPC) are the two major tasks in advanced photolithography patterning.
Parag Parashar, Chandni Akbar, Tejender S. Rawat, Sparsh Pratik, Rajat Butola, Shih H. Chen, Yung-Sung Chang, Sirapop Nuannimnoi, Albert S. Lin   +8 more
doaj   +1 more source

Pattern-Centric Computational System for Logic and Memory Manufacturing and Process Technology Development

Journal of Microelectronic Manufacturing, 2020
Chip designers employ computer-aided design, circuit simulation, and design rule check systems. Lithography engineers employ model-based OPC (Optical Proximity Correction) and model-based print-simulation systems.
Chenmin Hu, Khurram Zafar, Abhishek Vikram, Geoffrey Ying   +3 more
doaj   +1 more source

Intelligent Proximity Correction Enabled Large-Area Metasurfaces by KrF Photolithography

IEEE Access
Model-based optical proximity correction (OPC) is a widely adopted resolution enhancement technique that compensates for lithography proximity effects by adjusting and correcting mask pattern shapes.
Hsueh-Li Liu, Sheng-Hsiang Su, Po-Kai Chang, You-Chia Chang, Yao-Wei Huang, Chia-Wei Chang, Tsai-Ming Huang, Chun-Chi Chen, Wen-Hsien Huang, Jia-Min Shieh, Peichen Yu   +10 more
doaj   +1 more source

Placement of Sub-Resolution Assist Features Based on a Genetic Algorithm

IEEE Access, 2019
Resolution enhancement techniques compatible with an ArF (193 nm) immersion optical lithography system may constitute an effective means of minimizing the size of technology nodes of the dynamic random access memory.
Wei-Ming Kan, Yu-Ru Huang, Chao-Yi Huang, Chun-Sheng Wu, Kao-Tun Chen, Yu-Shin Lin, Hung-Fei Kuo   +6 more
doaj   +1 more source

Near-Field Lithography Optical Proximity Correction Based on Covariance Matrix Adaptation Evolution Strategy

Photonics
Near-field lithography (NFL) can achieve super-resolution patterning beyond the optical diffraction limit by using evanescent waves. However, optical proximity effects in NFL can lead to nonuniform near-field intensity distribution, reduced image ...
Chengyao Pu, Ge Yin, Yanqing Wang, Zeyu Zhao, Changtao Wang, Xiaoliang Ma, Mingbo Pu, Weijie Kong   +7 more
doaj   +1 more source

Composition‐Aware Cross‐Sectional Integration for Spatial Transcriptomics

Advanced Intelligent Discovery, EarlyView.
Multi‐section spatial transcriptomics demands coherent cell‐type deconvolution, domain detection, and batch correction, yet existing pipelines treat these tasks separately. FUSION unifies them within a composition‐aware latent framework, modeling reads as cell‐type–specific topics and clustering in embedding space.
Qishi Dong, Zijian Huang, Xuanwu Wang, Zhenghui Feng, Wei Liu, Bingding Huang   +5 more
wiley   +1 more source

A Graph‐Based Generative Artificial Intelligence Methodology for Autocorrection of Utility‐System P&IDs

Chemie Ingenieur Technik, EarlyView.
This work explores generative AI for automated revision of Piping and Instrumentation Diagrams (P&IDs). We frame P&ID correction as a translation problem, converting attributed P&ID graphs into sequences and learning revisions with a transformer‐based model.
Lukas Schulze Balhorn, Dominik P. Goldstein, Niels Seijsener, Kevin Dao, Ge H. M. Driessen, Artur M. Schweidtmann   +5 more
wiley   +1 more source

Feature Vector Effectiveness Evaluation for Pattern Selection in Computational Lithography

Photonics
Pattern selection is crucial for optimizing the calibration process of optical proximity correction (OPC) models in computational lithography. However, it remains a challenge to achieve a balance between representative coverage and computational ...
Yaobin Feng, Jiamin Liu, Hao Jiang, Shiyuan Liu   +3 more
doaj   +1 more source

Understanding extracellular vesicles in antiaging

Periodontology 2000, EarlyView.
Abstract Background Aging is a multifactorial process marked by gradual cellular dysregulation, regulated by hallmarks, including genomic instability, mitochondrial dysregulation, and chronic inflammation. Extracellular vesicles (EVs), especially exosomes, have emerged as pivotal mediators of cell‐to‐cell communication with potential roles in both ...
Paras Ahmad, Nathan E. Estrin, Anton Sculean, Richard J. Miron   +3 more
wiley   +1 more source

Glial Dysfunction and Memory Impairments in a Model of Pediatric Obstructive Sleep Apnea

Glia, Volume 74, Issue 11, November 2026.
Generation and analysis of an snRNA‐seq atlas of the hippocampus in POSA. Validation of reduced protein expression of six genes across four cell types. Cellular‐level investigation of aberrant glial function in POSA using transgenic reporter mice. ABSTRACT Pediatric obstructive sleep apnea (POSA) is a common childhood disease that often causes aberrant
Michael R. Williamson, Jorge Botas, Mahyar J. Hedayatpour, Thea Zlatkov, Akdes Serin Harmanci, Christopher J. Yates, Kenneth Nobleza, Roshan Ailani, Adam C. Adler, Farrah Kheradmand, Hyun Kyoung Lee, Benjamin Deneen, Hyun‐Hwan Jeong, Arvind Chandrakantan   +13 more
wiley   +1 more source