Results 11 to 20 of about 380 (120)

Virtualization as a New Scaling Law for Semiconductor Devices Beyond Geometric Scaling. [PDF]

Small
AI‐enabled semiconductor scaling law. Virtualization emerges as an AI‐enabled scaling law for semiconductors, where progress depends on replacing physical iteration with credible virtual evidence. Surrogate modeling accelerates design‐space exploration, digital twins virtualize process learning, and defect‐to‐reliability inference advances ...
Wang Z, Chen X, Lin F, Li X, Wang F, Guo S, Yu S, Li L, Huang JK.   +8 more
europepmc   +2 more sources

Pattern-Centric Computational System for Logic and Memory Manufacturing and Process Technology Development

Journal of Microelectronic Manufacturing, 2020
Chip designers employ computer-aided design, circuit simulation, and design rule check systems. Lithography engineers employ model-based OPC (Optical Proximity Correction) and model-based print-simulation systems.
Chenmin Hu, Khurram Zafar, Abhishek Vikram, Geoffrey Ying   +3 more
doaj   +1 more source

Intelligent Proximity Correction Enabled Large-Area Metasurfaces by KrF Photolithography

IEEE Access
Model-based optical proximity correction (OPC) is a widely adopted resolution enhancement technique that compensates for lithography proximity effects by adjusting and correcting mask pattern shapes.
Hsueh-Li Liu, Sheng-Hsiang Su, Po-Kai Chang, You-Chia Chang, Yao-Wei Huang, Chia-Wei Chang, Tsai-Ming Huang, Chun-Chi Chen, Wen-Hsien Huang, Jia-Min Shieh, Peichen Yu   +10 more
doaj   +1 more source

Placement of Sub-Resolution Assist Features Based on a Genetic Algorithm

IEEE Access, 2019
Resolution enhancement techniques compatible with an ArF (193 nm) immersion optical lithography system may constitute an effective means of minimizing the size of technology nodes of the dynamic random access memory.
Wei-Ming Kan, Yu-Ru Huang, Chao-Yi Huang, Chun-Sheng Wu, Kao-Tun Chen, Yu-Shin Lin, Hung-Fei Kuo   +6 more
doaj   +1 more source

Feature Vector Effectiveness Evaluation for Pattern Selection in Computational Lithography

Photonics
Pattern selection is crucial for optimizing the calibration process of optical proximity correction (OPC) models in computational lithography. However, it remains a challenge to achieve a balance between representative coverage and computational ...
Yaobin Feng, Jiamin Liu, Hao Jiang, Shiyuan Liu   +3 more
doaj   +1 more source

Composition‐Aware Cross‐Sectional Integration for Spatial Transcriptomics

Advanced Intelligent Discovery, EarlyView.
Multi‐section spatial transcriptomics demands coherent cell‐type deconvolution, domain detection, and batch correction, yet existing pipelines treat these tasks separately. FUSION unifies them within a composition‐aware latent framework, modeling reads as cell‐type–specific topics and clustering in embedding space.
Qishi Dong, Zijian Huang, Xuanwu Wang, Zhenghui Feng, Wei Liu, Bingding Huang   +5 more
wiley   +1 more source

Anthropogenic Pollution Accounts for a Substantial Part of Cloud Condensation Nuclei in North African Dust Layer

Geophysical Research Letters, Volume 53, Issue 12, 28 June 2026.
Abstract Cloud condensation nuclei (CCN) modulate the properties and thus the climate effects of clouds. The North African dust plume is an important source of CCN in the North Atlantic trade‐wind zone. Yet, research into the nature and sources of these CCN is sparse, making it difficult to fully assess related cloud effects. Using combined airborne in
Adrian Walser, Agnieszka Kupc, Nathalie Benker, Maximilian Dollner, Bernd Heinold, Konrad Kandler, Thomas Bjerring Kristensen, Thomas Müller, Anne Tipka, Petra Seibert, Ina Tegen, Bernadett Weinzierl   +11 more
wiley   +1 more source

Machine Learning-Enhanced Model-Based Optical Proximity Correction by Using Convolutional Neural Network-Based Variable Threshold Method

IEEE Access
As the lithography process continues to become more rigorous in advanced technology nodes, the model-based optical proximity correction (MBOPC), as a core component within computational lithography, necessitates the development of highly precise ...
Jinhao Zhu, Zhiwei Ren, Ying Li, Xianhe Liu, Qiang Wu, Yanli Li, Qi Wang   +6 more
doaj   +1 more source

ALKBH3 m1A Demethylase Deficiency Reduces Alzheimer's Amyloid‐β Pathology

Advanced Science, Volume 13, Issue 32, 9 June 2026.
This study identifies that ALKBH3‐driven m1A demethylation orchestrates Alzheimer's disease progression by disrupting mitochondrial and synaptic homeostasis. This epitranscriptomic mechanism suppresses PINK1‐mediated mitophagy via m1A erasure, leading to mitochondrial dysfunction, oxidative stress, elevated Aβ production, and impaired microglial ...
Yueyang Li, Sifei Yu, Kaidong Lu, Yujie Zhang, Mingjie Dong, Yan Peng, Liang Xue, Waleed Alam, Yuxuan Shui, Yi Zhou, Wuyunhan Ma, Meng Bao, Peiming Li, Peiyi Luo, Tiezhan Lu, Jiajia Li, Kang Zhang, Yuying Wang, Shuchen Yang, Nuoya Yin, Francesco Faiola, Zilong Gao, Jingfeng Zhou, Fei Zhao, Yali He, Magdalena J. Koziol   +25 more
wiley   +1 more source

Reduction in hippocampal cholinergic neurostimulating peptide enhances memory impairment in AppNL‐G‐F KI mice

Alzheimer's &Dementia, Volume 22, Issue 6, June 2026.
Abstract INTRODUCTION Whether cholinergic activity in the septohippocampal network affects cognitive dysfunction via hippocampal cholinergic neurostimulating peptide (HCNP) in Alzheimer's pathogenesis remains unclear. METHODS An Alzheimer's pathogenesis by mutation in amyloid‐beta precursor protein gene (AppNL‐G‐F) knock‐in (KI) and HCNP precursor ...
Yo Tsuda, Yuta Madokoro, Kengo Suzuki, Takuya Ooba, Toyohiro Sato, Yuto Uchida, Itsumi Nagai‐Arakawa, Takashi Saito, Hideaki Hara, Hideki Hida, Noriyuki Matsukawa   +10 more
wiley   +1 more source