Results 31 to 40 of about 98 (86)

Performance of a glider‐mounted multifrequency echosounder for measuring the vertical distribution and abundance of large pelagic copepods

open access: yesLimnology and Oceanography: Methods, Volume 24, Issue 6, June 2026.
Abstract The difficulty of sampling zooplankton communities in situ has driven advancements in autonomous, remote sensing technology. The goal of this paper was to perform a gear comparison study testing the performance of one such piece of technology—a glider‐mounted four‐frequency echosounder—against traditional shipboard methods of measuring ...
Delphine Mossman   +3 more
wiley   +1 more source

Multiple patterning bi-line/tri-line structure at limiting resolution for 7 nm by negative tone development of ArF immersion lithography

open access: yesAlexandria Engineering Journal
Since the advanced Integrated Circuit (IC) manufacturing process has reached the 14 nm technology node and beyond, the pattern size of integrated circuits has become much smaller than the theoretical minimum resolution of lithography. In order to further
Jinhao Zhu   +3 more
doaj   +1 more source

Genetic Diagnosis and Discovery Enabled by Large Language Models

open access: yesAdvanced Science, Volume 13, Issue 22, 17 April 2026.
We demonstrate that large language models (LLMs) can facilitate genetic diagnosis and discovery. LLMs were used to solve four types of genetic problems of sequentially increased complexity. An LLM‐based pipeline could analyze genetic variants in the genomic sequences of human hearing loss or rare genetic disease patients and assist in identifying ...
Tao Tu   +25 more
wiley   +1 more source

Roadmap on Artificial Intelligence‐Augmented Additive Manufacturing

open access: yesAdvanced Intelligent Systems, Volume 8, Issue 4, April 2026.
This Roadmap outlines the transformative role of artificial intelligence‐augmented additive manufacturing, highlighting advances in design, monitoring, and product development. By integrating tools such as generative design, computer vision, digital twins, and closed‐loop control, it presents pathways toward smart, scalable, and autonomous additive ...
Ali Zolfagharian   +37 more
wiley   +1 more source

Metalearning‐Driven Inverse Optimization for Precision Microstructure Fabrication in Digital Light Processing Three‐Dimensional Printing

open access: yesAdvanced Intelligent Systems, Volume 8, Issue 4, April 2026.
Metalearning‐based inverse optimization enables precise microscale three‐dimensional printing using a DLP system. Distorted structures from conventional printing are analyzed via neural network regression, which predicts optimal exposure time and mask design.
Jae Won Choi   +3 more
wiley   +1 more source

TOMM40 suppression promotes neuronal cholesterol imbalance and molecular and behavioral phenotypes of Alzheimer's disease

open access: yesAlzheimer's &Dementia, Volume 22, Issue 4, April 2026.
Abstract INTRODUCTION While the apolipoprotein E (APOE) ε4 allele is a major risk factor for Alzheimer's disease (AD), the role of translocase of outer mitochondrial membrane 40 (TOMM40)—an adjacent gene involved in mitochondrial protein import—is not known. METHODS Human brain tissue, human induced pluripotent stem cell–derived neurons (iNeurons), and
Neil V. Yang   +8 more
wiley   +1 more source

Programmable Dimensional Lithography with Digital Micromirror Devices for Multifunctional Microarchitectures

open access: yesAdvanced Materials Technologies, Volume 11, Issue 5, 6 March 2026.
This review explores recent advances in digital micromirror device (DMD)‐based lithography, focusing on its programmable light modulation, multi‐material compatibility, and dimensional patterning strategies. It highlights innovations from optical system design to materials integration and multifunctional applications, positioning DMD lithography as a ...
Yubin Lee   +5 more
wiley   +1 more source

Publication Only

open access: yes
HemaSphere, Volume 10, Issue S1, June 2026.
wiley   +1 more source

ePoster

open access: yes
European Journal of Neurology, Volume 33, Issue S1, June 2026.
wiley   +1 more source

A Novel Optical Proximity Correction (OPC) System Based on Deep Learning Method for the Extreme Ultraviolet (EUV) Lithography

open access: yesProgress In Electromagnetics Research, 2023
Li-Ye Xiao   +5 more
openaire   +1 more source

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