Results 21 to 30 of about 19,664 (279)

High-speed, large-area and high-precision fabrication of aspheric micro-lens array based on 12-bit direct laser writing lithography

Light: Advanced Manufacturing, 2022
Aspheric micro-lens array (AMLA), featured with low dispersion and diffraction-limited imaging quality, plays an important role in advanced optical imaging. Ideally, the fabrication of commercially applicable AMLAs should feature low cost, high precision,
Shiyi Luan, Fei Peng, Guoxing Zheng, Chengqun Gui, Yi Song, Sheng Liu   +5 more
doaj   +1 more source

Improved two-photon photopolymerisation and optical trapping with aberration-corrected structured light

Frontiers in Nanotechnology, 2022
We demonstrate the effectiveness of phase only aberration corrections of structured light and their application to versatile optical trapping setups. We calculate phase corrections before (ex-situ) and after (in-situ) a high numerical aperture microscope
D. J. Armstrong, A. B Stilgoe, T. A. Nieminen, H. Rubinsztein-Dunlop   +3 more
doaj   +1 more source

Study of Inverse Lithography Approaches based on Deep Learning

Journal of Microelectronic Manufacturing, 2020
Computational lithography (CL) has become an indispensable technology to improve imaging resolution and fidelity of deep sub-wavelength lithography. The state-of-the-art CL approaches are capable of optimizing pixel-based mask patterns to effectively ...
Xianqiang Zheng, Xu Ma, Shengen Zhang, Yihua Pan, Gonzalo R. Arce   +4 more
doaj   +1 more source

The Variables and Invariants in the Evolution of Logic Optical Lithography Process

Journal of Microelectronic Manufacturing, 2019
Photolithography has been a major enabler for the continuous shrink of the semiconductor manufacturing design rules. Throughout the years of the development of the photolithography, many new technologies have been invented and successfully implemented ...
Qiang Wu
doaj   +1 more source

Fast and Robust DCNN Based Lithography SEM Image Contour Extraction Models

Journal of Microelectronic Manufacturing, 2021
Scanning electron microscope (SEM) metrology is critical in semiconductor manufacturing for patterning process quality assessment and monitoring. Besides feature width and feature-feature space dimension measurements from critical dimension SEM (CDSEM ...
Tao Zhou, Xuelong Shi, Chen Li, Yan Yan, Bowen Xu, Shoumian Chen, Yuhang Zhao, Wenzhan Zhou, Kan Zhou, Xuan Zeng   +9 more
doaj   +1 more source

Intelligent Proximity Correction Enabled Large-Area Metasurfaces by KrF Photolithography

IEEE Access
Model-based optical proximity correction (OPC) is a widely adopted resolution enhancement technique that compensates for lithography proximity effects by adjusting and correcting mask pattern shapes.
Hsueh-Li Liu, Sheng-Hsiang Su, Po-Kai Chang, You-Chia Chang, Yao-Wei Huang, Chia-Wei Chang, Tsai-Ming Huang, Chun-Chi Chen, Wen-Hsien Huang, Jia-Min Shieh, Peichen Yu   +10 more
doaj   +1 more source

Intelligent Photolithography Corrections Using Dimensionality Reductions

IEEE Photonics Journal, 2019
With the shrinking of the IC technology node, optical proximity effects (OPC) and etch proximity effects (EPC) are the two major tasks in advanced photolithography patterning.
Parag Parashar, Chandni Akbar, Tejender S. Rawat, Sparsh Pratik, Rajat Butola, Shih H. Chen, Yung-Sung Chang, Sirapop Nuannimnoi, Albert S. Lin   +8 more
doaj   +1 more source

Somatic mutational landscape in von Hippel–Lindau familial hemangioblastoma

Molecular Oncology, EarlyView.
The causes of central nervous system (CNS) hemangioblastoma in Von Hippel–Lindau (vHL) disease are unclear. We used Whole Exome Sequencing (WES) on familial hemangioblastoma to investigate events that underlie tumor development. Our findings suggest that VHL loss creates a permissive environment for tumor formation, while additional alterations ...
Maja Dembic, Anne Nørremølle, Lilian Bomme Ousager, Lars van Brakel Andersen, Marie Louise Mølgaard Binderup, Mads Thomassen   +5 more
wiley   +1 more source

Pattern-Centric Computational System for Logic and Memory Manufacturing and Process Technology Development

Journal of Microelectronic Manufacturing, 2020
Chip designers employ computer-aided design, circuit simulation, and design rule check systems. Lithography engineers employ model-based OPC (Optical Proximity Correction) and model-based print-simulation systems.
Chenmin Hu, Khurram Zafar, Abhishek Vikram, Geoffrey Ying   +3 more
doaj   +1 more source

Interpreting the effects of DNA polymerase variants at the structural level

Molecular Oncology, EarlyView.
Using MAVISp and molecular dynamics simulations, we analyzed over 60 000 missense variants in POLE and POLD1 from ClinVar, COSMIC, cBioPortal, and saturation mutagenesis. Identified mechanistic indicators, including stability, binding, and long‐range, enable structural interpretation, providing ACMG‐like evidence for possible reclassification of VUS ...
Matteo Arnaudi, Karolina Krzesińska, Ludovica Beltrame, Pablo Sánchez‐Izquierdo Besora, Matteo Tiberti, Mef Nilbert, Anna Rohlin, Elena Papaleo   +7 more
wiley   +1 more source