Results 71 to 80 of about 1,697,138 (284)

Large-Scale Uniform Silver Nanocave Array for Visible Light Refractive Index Sensing Using Soft UV Nanoimprint

IEEE Photonics Journal, 2016
In this paper, a wafer-scale uniform silver nanocave array is fabricated by soft ultraviolet nanoimprint lithography. We investigate its plasmonic effects using far-field and near-field experimental approaches and illuminate the physics inside by ...
Jinfeng Zhu, Yanqiang Bai, Lirong Zhang, Zhengyong Song, Hai Liu, Jianyang Zhou, Timothy Lin, Qing Huo Liu   +7 more
doaj   +1 more source

Advancing Human Skin Equivalents: The Crucial Role of Neurovascular Integration

Advanced Healthcare Materials, EarlyView.
This review discusses the importance of integrating vascular and peripheral nerve systems into human skin equivalents (HSEs) to better recapitulate native skin physiology. Recent advances in vascularized, innervated, and neurovascularized HSEs are highlighted, together with emerging bioengineering strategies, current challenges, and future ...
Hao Wu, Lorenzo Moroni, Nicolas Lebonvallet, Vincent Flacher, Paul Wieringa   +4 more
wiley   +1 more source

n‐Type Polymer Radio Frequency Rectifiers Operating at 18.5 GHz

Advanced Materials, EarlyView.
Combining an n‐doped polymer semiconductor with wafer‐scale asymmetric planar electrodes featuring work function‐engineered contacts yields radio‐frequency diodes and rectifying circuits operating at up to 18.5 GHz. The devices combine scalable manufacturing with an operating frequency previously unattainable by large‐area organic electronics ...
Lazaros Panagiotidis, Filip Aniés, Yiyang Yu, Mohammed Ghadiyali, Hendrik Faber, Zhanibek Bizak, Youssef Kabri, Pavlos Tzourmpakis, Suman Mandal, Linqu Luo, Temur Maksudov, Mohamad Insan Nugraha, Harold F. Mazo‐Mantilla, Patrice Vanelle, Julie Broggi, Khaled N. Salama, Udo Schwingenschlögl, Martin Heeney, Atif Shamim, Thomas D. Anthopoulos   +19 more
wiley   +1 more source

Computational modelling and optimisation of the fabrication of nano-structures using focused ion beam and imprint forming technologies [PDF]

, 2010
Focused Ion Beam (FIB) and Nano-Imprint Forming (NIF) have gained recently major interest because of their potential to enable the fabrication of precision engineering parts and to deliver high resolution, low-cost and high-throughput production of fine
Desmulliez, M.; id_orcid, Bailey, C., Marson, S., D Allen, Stoyanov, S., Marson, Silvia, C Bailey, A Dyer, Desmulliez, M., Allen, D., Y K Tang, Dyer, A., M Desmulliez, Allen, David M., Tang, Y.K., S Marson, Tang, Y. K., S Stoyanov, B León   +18 more
core   +1 more source

Advancements in EUV photoresists for high-NA lithography

, 2023
EUV resist materials play a vital role in enabling advanced lithographic technologies for high-volume manufacturing (HVM) targeting nodes below 5 nm. In this study, we report an extensive performance characterization of available EUV photoresists for ...
Develioglu, Aysegul (author), Van Lent-Protasova, Lidia (author), Vockenhuber, Michaela (author), Kazazis, Dimitrios (author), Mochi, Iacopo (author), Ekinci, Yasin (author)   +5 more
core   +1 more source

Neuromorphic Electronics for Intelligence Everywhere: Emerging Devices, Flexible Platforms, and Scalable System Architectures

Advanced Materials, EarlyView.
The perspective presents an integrated view of neuromorphic technologies, from device physics to real‐time applicability, while highlighting the necessity of full‐stack co‐optimization. By outlining practical hardware‐level strategies to exploit device behavior and mitigate non‐idealities, it shows pathways for building efficient, scalable, and ...
Kapil Bhardwaj, Roshni Satheesh Babu, Yuxin Xia, Eva Bestelink, Radu Sporea, Nikos Hastas, Ioannis Zeimpekis, Dimitra G. Georgiadou, Sayani Majumdar   +8 more
wiley   +1 more source

First generation laser-produced plasma source system for HVM EUV lithography

, 2022
Paper 763608The 1st generation Laser-Produced Plasma source system "ETS" device for EUV lithography is under development. We report latest status of the device which consists of the original concepts (1) CO2 laser driven Sn plasma, (2) Hybrid CO2 laser ...
Hori, T., Abe, T., Kakizaki, K., Endo, A., Fujimoto, J., Sumitani, A., Kurosu, A., Watanabe, Y., Mizoguchi, H., Ohta, T., Ishihara, T., Wakabayashi, O., Nakarai, H., Komori, H.   +13 more
core   +1 more source

Path‐Decoupled Cation‐Eutaxy III–V van der Waals Memristive Semiconductors for Mitigating the Neuromorphic Accuracy‐Energy Trade‐off

Advanced Materials, EarlyView.
Path‐decoupled III–V van der Waals memtransistors spatially separate ionic and electronic transport to overcome the conventional trade‐off between accuracy and energy in neuromorphic hardware. Mobile K+ ions in the vdW gaps set a wide conductance window, Gmax/Gmin, while gate‐tunable hole conduction lowers programming energy, enabling reliable ...
Jihong Bae, Ji Hoon Han, Taeyoung Kim, Jongbum Won, Seokmin Park, Gyu Won Kim, Sungsoon Kim, Hong Choi, Taehoon Kim, Hong‐Sub Lee, Jae‐Hyun Lee, Young Jin Choi, Jinwoo Cheon, Wooyoung Shim   +13 more
wiley   +1 more source

Plasmonic Filters Based on Lithographically Patterned and Hexagonally Arranged Triangular Silver Nanoparticles Array

Advances in Materials Science and Engineering, 2015
A plasmonic filter applied in visible regime is proposed on the basis of hexagonally arranged triangular silver nanoparticle arrays. A method using discrete dipole approximation (DDA) to aid design parameters of the silver nanoparticle arrays is adopted
Jing Liu, Haoyuan Cai, Kai Tang, Lingqi Kong   +3 more
doaj   +1 more source

Computational Proximity Lithography with extreme ultraviolet Radiation

, 2021
Nowadays, EUV projection lithography has been proven effective for high-volume manufacturing of microchips. In parallel, high-resolution nanopatterning has been demonstrated utilizing interference lithography. However, the former suffers from the complexity of projection optics, and the latter is limited to periodic structures. The presented approach –
openaire   +2 more sources