Results 91 to 100 of about 7,747 (289)

Measuring and Manipulating Density of States in Two‐Dimensional Materials With Electrochemical Capacitance

open access: yesAdvanced Materials Interfaces, EarlyView.
We report electrochemical quantum capacitance spectroscopy as an ambient, in situ probe for defect‐mediated electronic structure at 2D material interfaces. Using monolayer MoS2, the method resolves band edges and vacancy states, tracks sulfur‐vacancy evolution during hydrogen evolution, and links interfacial density‐of‐states changes to nearly ...
Mengyu Yan   +9 more
wiley   +1 more source

A Comparative Study of Attention-Based Transformer and Deep CNN Architectures for Lithography Hotspot Detection in Advanced Process Nodes

open access: yesIEEE Access
As VLSI technology continuously expands, especially below the 10-nm node, lithography-related process variations have become a major issue in semiconductor manufacturing.
Krishnananda Shet   +5 more
doaj   +1 more source

Single-Layered Microfluidic Network-Based Combinatorial Dilution for Standard Simplex Lattice Design

open access: yesMicromachines, 2018
In this paper, we presented a straightforward strategy to generate 15 combinations of three samples based on an experimental simplex lattice design using a single-layer microfluidic network. First, we investigated the performances of the plain structural
Kangsun Lee, Choong Kim, Kwang W. Oh
doaj   +1 more source

Enhancing Small Molecule Sensing With Aptameric Functionalized Nano Devices

open access: yesAdvanced Materials Technologies, EarlyView.
Unveiling an ultra‐sensitive, non‐invasive neurotransmitter sensor. For the first time, a nanoscale sensor for detecting an important neurotransmitter was demonstrated using micro‐electromechanical systems (MEMS) technology. Our approach utilized field‐effect transistor (FET)‐based readout to enable pico‐molar detection of biomarkers in sweat.
Thi Thanh Ha Nguyen   +11 more
wiley   +1 more source

Spin-on deposition of amorphous zeolitic imidazolate framework films for lithography applications

open access: yes
Amorphous zeolitic imidazolate framework (aZIF) films have been recently introduced as resists for electron beam and extreme ultraviolet lithography. aZIFs are also being considered for separation applications, including thin film membranes. However, the
Zhou, Xinpei   +12 more
core   +1 more source

The Evolution of Aerosol Jet Printing, A Review: Enhancing Material Versatility and Improvements for Next‐Generation Applications

open access: yesAdvanced Materials Technologies, EarlyView.
Aerosol Jet Printing (AJP) has emerged as a versatile additive manufacturing technique for high‐resolution, conformal, and multi‐material printing. This review highlights advances in printable materials, substrate compatibility, post‐processing, characterization, and process innovations, while critically discussing current challenges and future ...
Chandrachur Chatterjee   +2 more
wiley   +1 more source

Computationally Informed Design of a Multi-Axial Actuated Microfluidic Chip Device

open access: yesScientific Reports, 2017
This paper describes the computationally informed design and experimental validation of a microfluidic chip device with multi-axial stretching capabilities.
Alessio Gizzi   +8 more
doaj   +1 more source

Single Shot Multispectral Multidimensional Computational Imaging Using Quasi-Random Lenses

open access: yes, 2022
Quasi-random lenses (QRLs) were fabricated using electron beam lithography and conventional lens grinding to map every object point to a unique random intensity distribution.
Navaneethakrishnan, Srinivasan   +7 more
core   +1 more source

Chip‐Integrated Metasurface‐GaAsSb Nanowire Array Photodetectors for Single‐Pixel Polarimetric Imaging

open access: yesAdvanced Optical Materials, EarlyView.
A 2×2 multiplexed GaAsSb nanowire photodetector array integrated with L‐shaped metasurfaces is developed for miniaturized infrared polarimetry. Leveraging non‐radiating anapole states that facilitate near‐field enhancement, the device demonstrates strong polarization selectivity at 835 nm.
Longsibo Huang   +14 more
wiley   +1 more source

Intelligent Proximity Correction Enabled Large-Area Metasurfaces by KrF Photolithography

open access: yesIEEE Access
Model-based optical proximity correction (OPC) is a widely adopted resolution enhancement technique that compensates for lithography proximity effects by adjusting and correcting mask pattern shapes.
Hsueh-Li Liu   +10 more
doaj   +1 more source

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