Results 91 to 100 of about 260 (208)
Achromatic multi-level diffractive lenses and related applications
Achromatic multilevel diffractive lenses (AMDLs) represent a breakthrough in flat optics by overcoming chromatic aberration with practical manufacturability.
Yanhao Chu +4 more
doaj +1 more source
Recent advances in computational lithography technology
Abstract As semiconductor manufacturing technology advances, lithography faces increasingly severe challenges from resolution limitations and process variability. Computational lithography has become a critical technology that ensures manufacturability and yield in advanced semiconductor nodes.
Qian Jin +4 more
openaire +1 more source
A regenerative molecular sensing platform that co‐localizes surface‐enhanced Raman spectroscopy (SERS) sensing and nanocavitation‐based actuation. Femtosecond‐laser triggered nanocavitation produces thermomechanical forces to locally regenerate SERS‐active nanogaps in protein‐rich biofluids while preserving optical performance.
Aditya Garg +8 more
wiley +1 more source
Unitho: A Unified Multi-Task Framework for Computational Lithography
Published in ACM/IEEE International Conference on Computer-Aided Design (ICCAD ...
Qian Jin +4 more
openaire +2 more sources
Anisotropic Memristive Switching in NbOCl2 Enabled by Directional Oxygen Ion Migration
This study investigates strongly orientation‐dependent memristive switching in anisotropic NbOCl2, observed exclusively along the in‐plane c‐axis. The switching originates from direction‐selective oxygen‐ion migration and vacancy propagation that modulate the Pd/NbOCl2 Schottky barrier, enabling short‐term plasticity.
Caokun Wang +6 more
wiley +1 more source
Maximizing Nanoscale Disorder in Block Copolymers for Orientation‐Independent SERS Platform toward Non‐Invasive Diagnostics is a nature‐inspired strategy that engineers controlled randomness within block copolymer lamellae to achieve optical isotropy without compromising nanoscale periodicity.
Jin Man Kim +6 more
wiley +1 more source
Cellular forces are traditionally inferred from displacement measurements, which lack rotational information and are constrained by linear model assumptions. This work replaces displacement with rotational angle for the fundamental mechanical readout.
Linjie Ma +8 more
wiley +1 more source
The proximity effect induced by electron scattering is one of the main factors limiting the development of high-resolution electron beam lithography (EBL) technology.
Qingyuan Mao +3 more
doaj +1 more source
Two-photon lithography (TPL) is a laser-based additive manufacturing technique that enables the printing of arbitrarily complex cm-scale polymeric 3D structures with sub-micron features.
Rushil Pingali +2 more
doaj +1 more source
Surface and Interfacial Engineering toward Durable Mechanically Coupled Flexible Electronics
This Review highlights how surface and interfacial engineering governs the reliability, durability, and functional stability of mechanically coupled flexible electronics. By integrating fundamental interfacial theory, failure mechanisms, multiscale engineering strategies, and representative applications, it provides a design‐oriented framework for ...
Qian Wang, Fangfang Dai, Wei Wu
wiley +1 more source

