Results 111 to 120 of about 7,747 (289)
Dual-Wavelength Optical Triangulation System for Focus Metrology in 350 nm Lithography
Thin-film interference in photoresist stacks can become a significant source of uncertainty in lithographic focus metrology, particularly when high measurement stability is required. To evaluate this effect, a Fresnel-based multilayer reflection model is
Hengrui Guan +7 more
doaj +1 more source
3D‐Printing Aided Rapid Prototyping of Pretensioned Tensegrity Structures for Robotic Applications
Printing, injection molding, and assembly (PMA) is a method for rapid prototyping mesoscale, topologically complex, and tensioned tensegrity structures. In combination with PMA method, two mold design strategies: modular mold and compact channel layout, enable efficiency and scalability for tensegrity fabrication.
Yi Sun +3 more
wiley +1 more source
Organising Chemical Reaction Networks in Space and Time with Microfluidics
Information processing is essential for any lifeform to maintain its organisation despite continuous entropic disturbance. Macromolecules provide the ubiquitous underlying substrate on which nature implements information processing and have also come ...
Zauner, Klaus-Peter +7 more
core +1 more source
A healthy gut barrier shields underlying fibroblasts from luminal shear forces, illustrating that “good fences make good neighbors.” Barrier damage exposes fibroblasts to shear stress, inducing cell death and the emergence of stress‐adapted, profibrotic fibroblasts. Sustained shear exposure promotes the formation of stiff aggregates of mechanoadapative
Soyoun Min +6 more
wiley +1 more source
Achromatic multi-level diffractive lenses and related applications
Achromatic multilevel diffractive lenses (AMDLs) represent a breakthrough in flat optics by overcoming chromatic aberration with practical manufacturability.
Yanhao Chu +4 more
doaj +1 more source
Amorphous zeolitic imidazolate framework (aZIF) films have been recently introduced as resists for electron beam and extreme ultraviolet lithography (EBL and EUVL).
Agrawal, Kumar Varoon +9 more
core +1 more source
What is double patterning lithography and its impact on nanometer design?
Deep sub-wavelength lithography, i.e., using the 193nm lithography to print feature sizes/densities (e.g., for 45nm, 32nm, 22nm nodes) much smaller than the wavelength (193nm), is one of the most fundamental challenges for the nanometer CMOS scaling ...
David Z. Pan
core +1 more source
An on‐demand ultra‐reconfigurable intelligent vision system with hierarchical reconfigurability from device to system levels is demonstrated. Through co‐design of a multi‐paradigm device, reconfigurable circuits, and adaptive system architecture/algorithms, the system enables seamless switching among spiking, non‐spiking, neuromorphic imaging (NI), and
Biyi Jiang +7 more
wiley +1 more source
Unitho: A Unified Multi-Task Framework for Computational Lithography
Published in ACM/IEEE International Conference on Computer-Aided Design (ICCAD ...
Qian Jin +4 more
openaire +2 more sources
Design, fabrication, and characterization of magnetic nanostructures
For several years, thin films of ferromagnetic materials with metallic spacer layers showing giant magnetoresistance (GMR) were the technological basis used in the read-heads of hard disk drives. Similarly, tunnelling magnetoresistance (TMR), which is an
Claudio Gonzalez, David
core

