Results 131 to 140 of about 7,747 (289)

Efficient and Rigorous 3D Model for Optical Lithography Simulation

open access: yes, 2020
A new workstation-based rigorous model for 3D vector lithography simulation is introduced. The model extends a successful 2D lithography model, and has been applied to the simulation of 3D photomasks.
Andrzej J Strojwas3 '~d V A N C   +3 more
core  

A Flexible Metamaterial Absorber via Loss Engineering for Large‐Area Ultra‐Broadband Infrared Extinction

open access: yesAdvanced Science, EarlyView.
Designed and demonstrated a flexible metamaterial absorber via loss engineering for large‐area ultra‐broadband infrared extinction, providing a new method for miniaturization of absorbers and flexible optical devices. ABSTRACT The advancement of compact and wearable optical systems is critically limited by the lack of high‐performance, integrable ...
Zhe Wu   +11 more
wiley   +1 more source

Real-time Deformation Compensation Technique in DMD-based Maskless Lithography

open access: yes, 2023
Maskless lithography, utilizing Digital Micromirror Devices (DMDs), holds great promise for next-generation semiconductor manufacturing due to its versatility and cost-effectiveness. A notable advantage of DMD-based maskless lithography is its capability
조현민   +5 more
core  

Tunable Dynamics via Dual‐Ion Modulation for Event‐based Data Processing Using a Highly Uniform and Self‐Rectifying Memristor Array

open access: yesAdvanced Science, EarlyView.
Tunable dynamics of an interface‐type memristor array enabled by dual‐ion modulation through Ag nanoclusters are demonstrated. A 32 × 32 one‐resistor (1R) array exhibits 100% yield with high temporal/spatial uniformity (<3%) and a rectification ratio of 105.
Yoonho Cho   +7 more
wiley   +1 more source

Synthetic holographic mask design for computational proximity lithography using the lithography-guided OMRAF method

open access: yesOptics Express
Mask aligner lithography does not rely on complex projection lens systems, offering a cost-effective and high-yield approach for chip manufacturing. However, its limited resolution restricts application in advanced chip manufacturing. Holographic lithography enhances lithographic resolution by introducing phase information onto the mask.
Yuyang Liu, Sikun Li, Dongchao Pan
openaire   +2 more sources

Making Sweat Measurable: Induction, Sampling, and Refreshment in Wearable Biofluid Sensing

open access: yesAdvanced Science, EarlyView.
Wearable sweat sensing relies not only on chemical detection but also on controlled biofluid management. This Review integrates sweat physiology, induction strategies, and microfluidic sampling architectures, demonstrating how flux, transport, and refreshment shape measurement reliability.
Soyoung Shin, Wei Gao
wiley   +1 more source

Enabling computational-efficient lithography technologies with statistical learning approaches

open access: yes, 2019
M.Phil.With the continuous shrinking of technology nodes, lithography has been and will continue to be the bottleneck of the manufacturing process of integrated circuit (IC).

core  

Dielectric‐Confinement‐Induced in‐Plane Photoelectric Anisotropy in Isotropic Quasi‐1D γ‐GaS Nanoribbon

open access: yesAdvanced Science, EarlyView.
We investigate the geometry‐governed optoelectronic anisotropy arising from dielectric confinement in quasi‐1D γ‐GaS nanoribbons with intrinsically isotropic atomic structures. Dielectric mismatch between the nanoribbon and its surroundings leads to a general polarization‐dependent photoresponse during near‐field scattering.
Jiawei Jing   +16 more
wiley   +1 more source

Models of microstructure and magnetic properties for magnetic recording media [PDF]

open access: yes, 2003
Three computational models have been developed to simulate magnetic properties of granular media, particulate media microstructures and self-assembled systems.
Verdes, Claudiu Georgel
core  

TRIM: Simultaneous Thermometry, Ranging, and Imaging via a Monolithic Metalens

open access: yesAdvanced Science, EarlyView.
ABSTRACT While metasurfaces offer a pathway beyond the discrete architectures of conventional LWIR systems, physically fusing high‐precision thermometry and passive ranging onto a single metalens remains a formidable challenge. Here, we demonstrate a monolithic, dual‐focus metalens capable of simultaneous multidimensional sensing.
Man Yuan   +10 more
wiley   +1 more source

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