Results 11 to 20 of about 1,697,138 (284)
Feature Vector Effectiveness Evaluation for Pattern Selection in Computational Lithography
PhotonicsPattern selection is crucial for optimizing the calibration process of optical proximity correction (OPC) models in computational lithography. However, it remains a challenge to achieve a balance between representative coverage and computational ...
Yaobin Feng +3 more
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IEEE Access, 2022 The mode matching method is an efficient solution to conventional microwave waveguide problems for its dimensionality advantages. It is theoretically extendable to computational lithography problems in nano scales with periodic boundary condition.
Jia Liu +4 more
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From omelet lithography to state-of-the-art performance resists: resist screening with EUV interference lithography [PDF]
, 2021 As EUV lithography becomes the new standard for electronic chip manufacturing, identifying suitable materials for higher resolution patterning stands out as a prominent challenge to reach future technology nodes.
Vockenhuber, M. (author) +4 more
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Study of Inverse Lithography Approaches based on Deep Learning
Journal of Microelectronic Manufacturing, 2020 Computational lithography (CL) has become an indispensable technology to improve imaging resolution and fidelity of deep sub-wavelength lithography. The state-of-the-art CL approaches are capable of optimizing pixel-based mask patterns to effectively ...
Xianqiang Zheng +4 more
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Inverse design of high-NA metalens for maskless lithography
Nanophotonics, 2023 We demonstrate an axisymmetric inverse-designed metalens to improve the performance of zone-plate-array lithography (ZPAL), one of the maskless lithography approaches, that offer a new paradigm for nanoscale research and industry.
Chung Haejun +4 more
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Critical Pattern Selection Method Based on CNN Embeddings for Full-Chip Optimization
Photonics, 2023 Source mask optimization (SMO), a primary resolution enhancement technology, is one of the most pivotal technologies for enhancing lithography imaging quality.
Qingyan Zhang +6 more
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Transient Dynamical-Thermal-Optical System Modeling and Simulation [PDF]
EPJ Web of Conferences, 2020 In this work, methods and procedures are investigated for the holistic simulation of the dynamicalthermal behavior of high-performance optics like lithography objectives.
Hahn Luzia, Eberhard Peter
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Computation Lithography: Virtual Reality and Virtual Virtuality [PDF]
ECS Transactions, 2009 Computation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensible-ness and technical feasibility.
Wong, AKK, Lam, EY
openaire +5 more sources
Chemically-amplified backbone scission (CABS) resist for EUV lithography. [PDF]
, 2021 Polymeric materials with an imaging chemistry based on the main chain cleavage under the influence of photogenerated acid are a promising resist platform for EUV lithography.
Kazazis, Dimitrios (author) +2 more
core +1 more source
Journal of Microelectronic Manufacturing, 2020 Inverse lithography technology (ILT) is intended to achieve optimal mask design to print a lithography target for a given lithography process. Full chip implementation of rigorous inverse lithography remains a challenging task because of enormous ...
Xuelong Shi +6 more
doaj +1 more source