Results 11 to 20 of about 260 (208)

Line-Edge Roughness from Extreme Ultraviolet Lithography to Fin-Field-Effect-Transistor: Computational Study

Micromachines, 2021
Although extreme ultraviolet lithography (EUVL) has potential to enable 5-nm half-pitch resolution in semiconductor manufacturing, it faces a number of persistent challenges.
Sang-Kon Kim
doaj   +1 more source

Basic approaches to simulation of resist mask formation in computational lithography [PDF]

Modern Electronic Materials, 2020
Main currently used resist mask formation models and problems solved have been overviewed. Stages of "full physical simulation" have been briefly analyzed based on physicochemical principles for conventional diazonapthoquinone (DNQ ...
Nikita N. Balan, Vladidmir V. Ivanov, Alexey V. Kuzovkov, Evgenia V. Sokolova, Evgeniy S. Shamin   +4 more
doaj   +3 more sources

Compressive Sensing Approaches for Lithographic Source and Mask Joint Optimization

Journal of Microelectronic Manufacturing, 2018
Source and mask joint optimization (SMO) is a widely used computational lithography method for state-of-the-art optical lithography process to improve the yield of semiconductor wafers.
Xu Ma, Zhiqiang Wang, Gonzalo R. Arce
doaj   +1 more source

The Evolution and Challenges of Lithography Technology in the Integrated Circuit Industry [PDF]

MATEC Web of Conferences
As transistor continue to shrink, the quantum tunnelling effect increases significantly, which causes Moore’s Law gradually becoming invalid, and the society’s demand of computational power grow continually.
Zhang Jiazhen
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Mitigating the Impact of Mask Absorber Error on Lithographic Performance by Lithography System Holistic Optimization

Applied Sciences, 2019
The non-ideal mask absorber can cause an increase in critical dimension error (CDE) and decrease in process window (PW). However, the random mask absorber errors induced during mask fabricating and measuring are not considered in computational ...
Naiyuan Sheng, Enze Li, Yiyu Sun, Tie Li, Yanqiu Li, Pengzhi Wei, Lihui Liu   +6 more
doaj   +1 more source

Computational proximity lithography with extreme ultraviolet radiation

Optics Express, 2020
The potential of extreme ultraviolet (EUV) computational proximity lithography for fabrication of arbitrary nanoscale patterns is investigated. We propose to use a holographic mask (attenuating phase shifting mask) consisting of structures of two phase levels.
Deuter, Valerie, Grochowicz, Maciej, Brose, Sascha, Biller, Jan, Danylyuk, Serhiy, Taubner, Thomas, Siemion, Agnieszka, Grützmacher, Detlev, Juschkin, Larissa   +8 more
openaire   +4 more sources

Multi-Objective Defocus Robust Source and Mask Optimization Using Sensitive Penalty

Applied Sciences, 2019
The continuous decrease in the size of lithographic technology nodes has led to the development of source and mask optimization (SMO) and also to the control of defocus becoming stringent in the actual lithography process.
Pengzhi Wei, Yanqiu Li, Tie Li, Naiyuan Sheng, Enze Li, Yiyu Sun   +5 more
doaj   +1 more source

Machine Learning-Enhanced Model-Based Optical Proximity Correction by Using Convolutional Neural Network-Based Variable Threshold Method

IEEE Access
As the lithography process continues to become more rigorous in advanced technology nodes, the model-based optical proximity correction (MBOPC), as a core component within computational lithography, necessitates the development of highly precise ...
Jinhao Zhu, Zhiwei Ren, Ying Li, Xianhe Liu, Qiang Wu, Yanli Li, Qi Wang   +6 more
doaj   +1 more source

Mass production-enabled computational spectrometers based on multilayer thin films

Scientific Reports, 2022
Multilayer thin film (MTF) filter arrays for computational spectroscopy are fabricated using stencil lithography. The MTF filter array is a 6 × 6 square grid, and 169 identical arrays are fabricated on a single wafer.
Cheolsun Kim, Pavel Ni, Kang Ryeol Lee, Heung-No Lee   +3 more
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Guest Editorial: Computational Lithography [PDF]

Journal of Micro/Nanolithography, MEMS, and MOEMS, 2009
This PDF file contains the editorial “Guest Editorial: Computational Lithography” for JM3 Vol.
openaire   +1 more source