Results 11 to 20 of about 7,747 (289)
Computational proximity lithography with extreme ultraviolet radiation
Optics Express, 2020 The potential of extreme ultraviolet (EUV) computational proximity lithography for fabrication of arbitrary nanoscale patterns is investigated. We propose to use a holographic mask (attenuating phase shifting mask) consisting of structures of two phase levels.
Deuter, Valerie +8 more
core +6 more sources
Feature Vector Effectiveness Evaluation for Pattern Selection in Computational Lithography
PhotonicsPattern selection is crucial for optimizing the calibration process of optical proximity correction (OPC) models in computational lithography. However, it remains a challenge to achieve a balance between representative coverage and computational ...
Yaobin Feng +3 more
doaj +2 more sources
A Two-Stage Unet Framework for Sub-Resolution Assist Feature Prediction [PDF]
MicromachinesSub-resolution assist feature (SRAF) is a widely used resolution enhancement technology for improving image contrast and the common process window in advanced lithography processes.
Mu Lin, Le Ma, Lisong Dong, Xu Ma
doaj +2 more sources
Direct nanopatterning of complex 3D surfaces and self-aligned superlattices via molecular-beam holographic lithography [PDF]
Nature CommunicationsConventional lithography methods involving pattern transfer through resist templating face challenges of material compatibility with various process solvents.
Shuangshuang Zeng +4 more
doaj +2 more sources
Nanoporosity-driven deformation of additively manufactured nano-architected metals [PDF]
Nature Communications3D printing methods for small-scale metals enable a unique 10–100 nm dimensional niche where functional feature sizes, critical microstructural detail and atomic-level defects converge, challenging conventional hierarchical relationships and carrying ...
Wenxin Zhang +3 more
doaj +2 more sources
Recent advances in computational lithography technology
Moore and MoreAbstract As semiconductor manufacturing technology advances, lithography faces increasingly severe challenges from resolution limitations and process variability. Computational lithography has become a critical technology that ensures manufacturability and yield in advanced semiconductor nodes.
exaly +2 more sources
IEEE Access, 2022 The mode matching method is an efficient solution to conventional microwave waveguide problems for its dimensionality advantages. It is theoretically extendable to computational lithography problems in nano scales with periodic boundary condition.
Jia Liu +4 more
doaj +1 more source
Incorporating photomask shape uncertainty in computational lithography
, 2022 Paper 97800QThe lithographic performance of a photomask is sensitive to shape uncertainty caused by manufacturing and measurement errors. This work proposes incorporating the photomask shape uncertainty in computational lithography such as inverse ...
Wu, X., Erdmann, A., Lam, E.Y., Liu, S.
core +2 more sources
Critical Pattern Selection Method Based on CNN Embeddings for Full-Chip Optimization
Photonics, 2023 Source mask optimization (SMO), a primary resolution enhancement technology, is one of the most pivotal technologies for enhancing lithography imaging quality.
Qingyan Zhang +6 more
doaj +1 more source
Study of Inverse Lithography Approaches based on Deep Learning
Journal of Microelectronic Manufacturing, 2020 Computational lithography (CL) has become an indispensable technology to improve imaging resolution and fidelity of deep sub-wavelength lithography. The state-of-the-art CL approaches are capable of optimizing pixel-based mask patterns to effectively ...
Xianqiang Zheng +4 more
doaj +1 more source