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Remote Deep-Ultraviolet Laser Ablation in Connection with Electrospray Ionization-Atmospheric Pressure Chemical Ionization (rDUVLAESCI): A Novel Dual Ionization Source for Molecular Mass Spectrometry. [PDF]

Anal Chem
Papoušková B, Fryčák P, Gregar F, Lemr K, Pluháček T.   +4 more
europepmc   +1 more source

Self-Powered Photodetectors with Ultra-Broad Spectral Response and Thermal Stability for Broadband, Energy Efficient Wearable Sensing and Optoelectronics. [PDF]

Molecules
Feng PX, Pacheco Cabrera E, Chu J, Zhou B, Flores SY, Peng X, Li Y, Diaz-Vazquez LM, Zhou AF.   +8 more
europepmc   +1 more source

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An Overview on Recent Trends in Deep‐Ultraviolet (DUV) and Ultraviolet (UV) Nonlinear Optical Crystals

ChemistrySelect, 2021
Abstract Nonlinear optical (NLO) materials with high second‐order nonlinearity are the need of the hour, as they play a key role in frequency conversion, so that coherent radiation in the Ultraviolet (UV) and Deep UV (DUV) (absorption edge<200 nm) region can be achieved.
Anand Sekar, Usha Rani Muthurakku, Kalainathan Sivaperuman   +2 more
openaire   +1 more source

Portable Deep-Ultraviolet (DUV) Raman for Standoff Detection

Applied Spectroscopy, 2016
Alakai Defense Systems has recently developed a man-portable ultraviolet Raman spectrometer system. The portable Raman improvised explosives detector was designed to provide rapid, standoff detection of chemicals of interest to the end user, including, but not limited to explosives, narcotics, toxic industrial chemicals, and toxic industrial materials.
Adam J, Hopkins, Justin L, Cooper, Luisa T M, Profeta, Alan R, Ford   +3 more
openaire   +2 more sources

Characterization of 248nm Deep Ultraviolet (DUV) Photoresist after Ion Implantation

ECS Transactions, 2009
The elemental and structural changes of 248nm DUV photoresist induced by arsenic implantation with high dose and different acceleration energies were studied. For this purpose different analytical techniques were combined. An investigation of the capabilities of the Micro Raman Spectroscopy for analysis of ion implanted photoresist (II-PR) revealed ...
Diana Tsvetanova, Rita Vos, Guy Vereecke, Francesca Clemente, Kris Vanstreels, Thierry Conard, Alexis Franquet, Tatiana N. Parac-Vogt, Paul Mertens, Marc M. Heyns   +9 more
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ToF–SIMS and XPS study of ion implanted 248nm deep ultraviolet (DUV) photoresist

Microelectronic Engineering, 2011
Arsenic implanted 248nm DUV photoresist films were characterized by ToF-SIMS and XPS analysis methods. The effect of the implant dose and energy on the formation of the crust layer on top of the bulk photoresist was studied. The crust layer thickness was found to be dependent on the implant energy and dose. The elemental and chemical changes induced by
A. Franquet, D. Tsvetanova, T. Conard, R. Vos, G. Vereecke, P.W. Mertens, M.M. Heyns, W. Vandervorst   +7 more
openaire   +1 more source

Deep Ultraviolet (DUV) Light-Emitting Diodes (LEDs) to Maintain Freshness and Phytochemical Composition During Postharvest Storage

CLEO: 2013, 2013
Low-irradiance, long-term UV treatment using DUV-LEDs extended the cold storage shelf life of strawberries up to 2-fold as based on weight, moisture content, anthocyanin concentration, soluble solids, titratable acidity, visible damage, and mold growth.
Steven Britz, Ignas Gaska, Igor Shturm, Yuri Bilenko, Max Shatalov, Remis Gaska   +5 more
openaire   +1 more source

Airborne molecular contamination control in the micromirror SLM-based deep ultraviolet DUV SIGMA7300 laser pattern generator

SPIE Proceedings, 2004
Airborne molecular contamination (AMC) in the form of bases, acids and condensable organic and inorganic substances threaten both costly and sensitive optics and mask pattern formation in the chemically amplified resists (CAR) used for both E-beam and laser lithography.
Mats Ekberg, Hans A. Fosshaug, Thomas Ostrom, Peter Bjornangen, Thomas Utterback, Per-Uno Skotte, John Higley, David Ruede, Oleg P. Kishkovich   +8 more
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Development of AlGaN-based deep-ultraviolet (DUV) LEDs focusing on the fluorine resin encapsulation and the prospect of the practical applications

SPIE Proceedings, 2016
AlGaN-based LEDs are expected to be useful for sterilization, deodorization, photochemical applications such as UV curing and UV printing, medical applications such as phototherapy, and sensing. Today, it has become clear that efficient AlGaN-based LED dies are producible between 355 and 250 nm with an external quantum efficiency (EQE) of 3% on flat ...
Akira Hirano, Yosuke Nagasawa, Masamichi Ippommatsu, Ko Aosaki, Yoshio Honda, Hiroshi Amano, Isamu Akasaki   +6 more
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High-power and high-conversion efficiency deep ultraviolet (DUV) laser at 258  nm generation in the CsLiB_6O_10 (CLBO) crystal with a beam quality of M^2<15

Optics Letters, 2017
We report a 10 kHz, 10.5 W deep ultraviolet (DUV) laser at 258 nm with a pulse duration of 3 ns by fourth-harmonic generation (FHG) in a CsLiB6O10 crystal with high-conversion efficiency. The fundamental laser is at 1030 nm with 35 W output power consisting of a Yb:YAG ceramics thin rod amplifier. The M2 of the DUV laser was confirmed to be
Hongwen, Xuan, Chen, Qu, Shinji, Ito, Yohei, Kobayashi   +3 more
openaire   +2 more sources