Results 231 to 240 of about 201,281 (284)
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Applied Optics, 1990
A visible-light microscope has been modified to obtain deep UV (190-350-nm) images using reflected illumination. Potential advantages of deep UV microscopy include better resolution, depth of focus, and contrast for certain materials and fewer artifacts when viewing multilayered structures. These advantages are especially useful when viewing organic or
P A, Heimann, R, Urstadt
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A visible-light microscope has been modified to obtain deep UV (190-350-nm) images using reflected illumination. Potential advantages of deep UV microscopy include better resolution, depth of focus, and contrast for certain materials and fewer artifacts when viewing multilayered structures. These advantages are especially useful when viewing organic or
P A, Heimann, R, Urstadt
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Deep ultraviolet tip-enhanced fluorescence
Nanotechnology, 2018Theoretical calculations were performed for the deep ultraviolet (DUV) tip-enhanced fluorescence (TEF) using Al@Al2O3 core-shell tips. Fluorescence enhancement, spatial resolution and surface plasmon coupled emission (SPCE) of DUV-TEF were quantitatively studied by finite-difference time-domain (FDTD) method.
Lingyan Meng, Man Gao, Mengtao Sun
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Deep-Ultraviolet Emissive Carbon Nanodots
Nano Letters, 2019Deep-ultraviolet (DUV) emissive carbon nanodots (CNDs) have been designed theoretically and demonstrated experimentally based on the results of first-principles calculations using the density functional theory method. The emission of the CNDs is located in the range from 280 to 300 nm, which coincides well with the results of theoretical calculation ...
Shi-Yu Song +5 more
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Emergent Deep‐Ultraviolet Nonlinear Optical Candidates
Angewandte Chemie International Edition, 2020AbstractAdvances in the generation of coherent lasers at wavelengths below 200 nm as well as the associated equipment and technologies have greatly spurred the development of nonlinear optical (NLO) materials that are capable of phase‐matching in the deep‐ultraviolet (deep‐UV) spectral regions.
Miriding Mutailipu, Shilie Pan
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Deep‐Ultraviolet Hyperbolic Metacavity Laser
Advanced Materials, 2018AbstractGiven the high demand for miniaturized optoelectronic circuits, plasmonic devices with the capability of generating coherent radiation at deep subwavelength scales have attracted great interest for diverse applications such as nanoantennas, single photon sources, and nanosensors.
Kun‐Ching Shen +5 more
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Applying deep ultraviolet lithography
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1990This paper discusses the application of a deep wafer stepper and associated photoresist systems to advanced semiconductor processing. It is shown that, even with the limited number of photoresists available, deep UV lithography is a viable candidate for advanced processes requiring half micron and smaller features.
Mike Tipton +3 more
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Deep-ultraviolet contact photolithography
Microelectronic Engineering, 2000The patterning of 100 nm features via contact photolithography is described. Details of a conformable embedded-amplitude mask and pattern transfer into a tri-layer resist with this mask are presented. In-plane pattern-placement errors for this lithographic process have been measured to be less than 60 nm.
James G. Goodberlet, Bryan L. Dunn
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Deep ultraviolet tip-enhanced Raman scattering
Chemical Communications, 2011Electromagnetic mechanism of deep ultraviolet tip-enhanced Raman scattering (DUV-TERS) is investigated theoretically with the finite-difference time-domain (FDTD) method, stimulated by recent DUV-TERS experimental reports. FDTD results reveal that the strongest electromagnetic enhancement factor for DUV-TERS is as high as 7 orders in the optimal ...
Yang, Zhilin +3 more
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Deep Ultraviolet Light Emitting Diodes
2006 IEEE LEOS Annual Meeting Conference Proceedings, 2006In this paper, light-emitting devices based on III-nitride semiconductors offer many advantages including miniaturization, reliability, reduced costs, low power consumption, and ultimately a choice of wavelength of operation between 365 and 200 nm is ...
X. Hu +9 more
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Mode-locked deep ultraviolet Ce:LiCAF laser
Optics Letters, 2009We report mode-locked operation of a synchronously pumped Ce:LiCAF oscillator. The laser operated in the deep UV with output radiation centered at 291 nm and a pulse duration of 6 ps. The maximum output power measured was 52 mW, with 13% slope efficiency. The Ce:LiCAF crystal has a gain bandwidth capable of supporting few-femtosecond pulses, and so our
Eduardo, Granados +2 more
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