Results 101 to 110 of about 1,014,878 (298)
Next NanotechnologyThis study utilized blue-light epitaxial wafers and employed semiconductor processes such as maskless laser writing, dry etching, wet etching, passivation layer deposition, electron beam evaporation, and ion implantation to fabricate micro-light emitting
Yun-Cheng Hsu +7 more
doaj +1 more source
Dry Etching of Copper Phthalocyanine Thin Films: Effects on Morphology and Surface Stoichiometry
Molecules, 2012 We investigate the evolution of copper phthalocyanine thin films as they are etched with argon plasma. Significant morphological changes occur as a result of the ion bombardment; a planar surface quickly becomes an array of nanopillars which are less ...
Michael J. Brett, Jaron G. Van Dijken
doaj +1 more source
High Aspect Ratio Nanoscale Pores through BCP-Based Metal Oxide Masks and Advanced Dry Etching. [PDF]
ACS Appl Mater Interfaces, 2023 Esmeraldo Paiva A +6 more
europepmc +1 more source
Etching of Stockton Hall in Leavenworth, Kansas by Bernhardt Wall
, 2023 This print features an etching by Bernhardt Wall. This print was created in 1942. This etching is entitled Stockton Hall...Leavenworth, Kans., where Lincoln spoke on Dec. 3, 1859.
etching by Bernhardt Wall (American, 1872-1956)
core
Universal Conductance Fluctuations in Quantum Anomalous Hall Insulators
Advanced Materials, EarlyView.Universal conductance fluctuations are observed in mesoscopic quantum anomalous Hall insulators. Two distinct fluctuation patterns are identified, arising from different interference processes of bulk and chiral edge states, respectively. These findings unveil rich quantum interference phenomena in quantum anomalous Hall insulators and provide insights
Peng Deng +11 more
wiley +1 more source
Advanced Materials, EarlyView.Vertical organic electrochemical transistors (vOECTs) are limited in speed by ion‐impermeable metal electrodes that slow ion injection. Using ion‐permeable PBFDO top electrodes allows direct vertical ion injection into BBL channels, achieving high current densities (>400 A cm−2), large on/off ratios (>106), and ultrafast switching in 28 µs. This sets a
Han‐Yan Wu +14 more
wiley +1 more source
Process Development for Batch Production of Micro-Milling Tools Made of Silicon Carbide by Means of the Dry Etching Process. [PDF]
Micromachines (Basel), 2023 Wittek CR +5 more
europepmc +1 more source
n‐Type Polymer Radio Frequency Rectifiers Operating at 18.5 GHz
Advanced Materials, EarlyView.Combining an n‐doped polymer semiconductor with wafer‐scale asymmetric planar electrodes featuring work function‐engineered contacts yields radio‐frequency diodes and rectifying circuits operating at up to 18.5 GHz. The devices combine scalable manufacturing with an operating frequency previously unattainable by large‐area organic electronics ...
Lazaros Panagiotidis +19 more
wiley +1 more source
Inductively Coupled Plasma Dry Etching of Silicon Deep Trenches with Extremely Vertical Smooth Sidewalls Used in Micro-Optical Gyroscopes. [PDF]
Micromachines (Basel), 2023 Zhang Y +9 more
europepmc +1 more source
“Sherman House, Chicago, Illinois” Etching by Bernhardt Wall
, 2023 This print features an etching by Bernhardt Wall. The etching is entitled Sherman House, Chicago, Ill., where Lincoln was registered on Oct. 5, 1848. This etching was signed by the artist.
etching by Bernhardt Wall (American, 1872-1956)
core