Results 91 to 100 of about 20,942 (191)
Abstract Doublet fluorescence at 304 and 325‐nm under deep ultraviolet (DUV) excitation was detected on Mars at Jezero crater by the Scanning Habitable Environments with Raman and Luminescence for Organics and Chemicals (SHERLOC) instrument onboard the Mars 2020 rover Perseverance.
N. C. Haney +22 more
wiley +1 more source
Efficient and low‐cost production of high‐quality aluminum nitride (AlN) films during heteroepitaxy is the key for the development of deep ultraviolet light‐emitting diodes (DUV‐LEDs).
Hongliang Chang +14 more
doaj +1 more source
Abstract Organic matter in carbonate rocks plays a crucial role in processes such as fluid flow regulation, carbon sequestration, contaminant transport, and hydrocarbon recovery. This study employed multimodal spectroscopic techniques, including fluorescence imaging and Fourier transform infrared (FTIR) spectroscopy, to characterize the spatial ...
Alicia Moya +9 more
wiley +1 more source
The continued narrowing of transistor pitch in semiconductor chips has boosted the demand for deep-ultraviolet (DUV, λ
Seungjai Won +8 more
doaj +1 more source
Ahmed Y Sayed, Nasr Y Khalil, Aliyah Almomen, Nourah Z Alzoman, Abdulrahman A Almehizia, Ibrahim A Darwish Department of Pharmaceutical Chemistry, College of Pharmacy, King Saud University, Riyadh, 11451, Saudi ArabiaCorrespondence: Ibrahim A ...
Sayed AY +5 more
doaj
Aiming to enhance the internal quantum efficiency (IQE) of AlGaN-based deep ultraviolet light-emitting diodes (DUV LEDs), the active region based on the V-shaped quantum well (QW) and the electron-blocking layer (EBL) structure are jointly optimized ...
Jinglei Wang +8 more
doaj +1 more source
Source: Klaus Groth: Quickborn. Volksleben in plattdeutschen Gedichten, Berlin: Haude & Spener, 1968.
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Linear and nonlinear nanophotonic devices based on silicon-on-insulator wire waveguides [PDF]
Baets, Roel +11 more
core +1 more source
Deep Ultraviolet Laser Ablation Electrospray Ion Mobility Mass Spectrometry. [PDF]
Hines KB, Feizi N, Solouki T, Murray KK.
europepmc +1 more source
Bilayer resists for DUV lithography.
M. C. Tai +7 more
openaire +2 more sources

