Results 91 to 100 of about 81,648 (296)
Edge lithography based on aluminum dry etching
Traditional nanolithography methods, such as electron beam or ion beam lithography, can be expensive and slow, limiting their applications. Edge lithography offers a promising alternative for efficiently and effectively creating nanoscale patterns using ...
Chenxu Zhu +4 more
doaj +1 more source
The paper presents a method for the high-resolution production of polymer nanopatterns with controllable geometrical parameters by means of a single-spot electron-beam lithography technique.
Alexander Samardak +3 more
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Integration of Low‐Voltage Nanoscale MoS2 Memristors on CMOS Microchips
This article presents the first monolithic integration of nanoscale MoS2‐based memristors into the back‐end‐of‐line of foundry‐fabricated CMOS microchips in a one‐transistor‐one‐resistor (1T1R) architecture. The MoS2‐based 1T1R cells exhibit forming‐free, nonvolatile resistive switching with ultra‐low operating voltages, low cycle‐to‐cycle variability ...
Jimin Lee +16 more
wiley +1 more source
This paper explores methods to enhance the reproducibility of Josephson junctions, which are crucial elements in superconducting quantum technologies, when employing the Dolan technique in 30 kV e-beam processes.
Arthur M. Rebello +7 more
doaj +1 more source
This study presents a dynamic interaction between liquid resins and photopolymerized structures enabled by an in situ light‐writing setup. By controlling a three‐phase interface through localized photopolymerization, which provides physical confinement for the remaining uncured resin regions, the approach establishes a programmable pathway that ...
Kibeom Kim +3 more
wiley +1 more source
Tin hexathiophosphate memristors leverage intrinsic nanopores together with a guided filament formation strategy to regulate titanium ion motion and switching behavior. The devices support reliable nonvolatile memory and reconfigurable logic‐in‐memory, demonstrating 14 Boolean logic functions in a single cell.
Thaw Tint Te Tun +7 more
wiley +1 more source
We report on the fabrication of domain-reversed structures in LiNbO3 by means of direct electron beam lithography at room temperature without any static bias.
C. H. Kang +8 more
core +1 more source
Novel Functional Materials via 3D Printing by Vat Photopolymerization
This Perspective systematically analyzes strategies for incorporating functionalities into 3D‐printed materials via Vat Photopolymerization (VP). It explores the spectrum of achievable functionalities in recently reported novel materials—such as conductive, energy‐storing, biodegradable, stimuli‐responsive, self‐healing, shape‐memory, biomaterials, and
Sergey S. Nechausov +3 more
wiley +1 more source
In this study, we produced HfN‐based nanoparticles via femtosecond laser ablation in acetone. The nanoparticles exhibit a red‐shifted plasmonic resonance in the NIR‐I window, colloidal stability after coating with polyethyleneglycol, and excellent biocompatibility. The photothermal and X‐ray sensitization therapeutic effects were demonstrated for tumor
Julia S. Babkova +15 more
wiley +1 more source
Fabrication of phase masks from amorphous carbon thin films for electron-beam shaping
Background: Electron-beam shaping opens up the possibility for novel imaging techniques in scanning (transmission) electron microscopy (S(T)EM). Phase-modulating thin-film devices (phase masks) made of amorphous silicon nitride are commonly used to ...
Lukas Grünewald +2 more
doaj +1 more source

