Results 11 to 20 of about 81,648 (296)

Silicon Metalens Fabrication from Electron Beam to UV-Nanoimprint Lithography

Nanomaterials, 2021
This study presents the design and manufacture of metasurface lenses optimized for focusing light with 1.55 µm wavelength. The lenses are fabricated on silicon substrates using electron beam lithography, ultraviolet-nanoimprint lithography and cryogenic ...
Angela Mihaela Baracu, Marius Andrei Avram, Carmen Breazu, Mihaela-Cristina Bunea, Marcela Socol, Anca Stanculescu, Elena Matei, Paul Conrad Vaagen Thrane, Christopher Andrew Dirdal, Adrian Dinescu, Oana Rasoga   +10 more
doaj   +1 more source

Electron Beam Lithography of Magnetic Skyrmions [PDF]

Advanced Materials, 2020
AbstractThe emergence of magnetic skyrmions, topological spin textures, has aroused tremendous interest in studying the rich physics related to their topology. While skyrmions promise high‐density and energy‐efficient magnetic memory devices for information technology, the manifestation of their nontrivial topology through single skyrmions and ordered ...
Guang, Y, Peng, Y, Yan, Z, Liu, Y, Zhang, J, Zeng, X, Zhang, S, Zhang, S, Burn, DM, Jaouen, N, Wei, J, Xu, H, Feng, J, Fang, C, van der Laan, G, Hesjedal, T, Cui, B, Zhang, X, Yu, G, Han, X   +19 more
openaire   +4 more sources

Substrate Effect in Electron Beam Lithography

Advances in Electrical and Electronic Engineering, 2018
Electron Beam Lithography (EBL) process strongly depends on the type of the applied lithographic system, composed of electron sensitive polymers and the substrate. Moreover, applied acceleration voltage changes the volume of Backscattered Electrons (BSE)
Kornelia Indykiewicz, Bogdan Paszkiewicz, Regina Paszkiewicz   +2 more
doaj   +1 more source

Dose influence on the PMMA e-resist for the development of high-aspect ratio and reproducible sub-micrometric structures by electron beam lithography [PDF]

, 2016
In this work, a statistical process control method is presented showing the accuracy and the reliability obtained with of PMMA E-resist AR-P 672, using an Elphy Quantum Electron Beam Lithography module integrated on a FE-SEM Zeiss Auriga instrument ...
Balucani, Marco, Caminiti, Ruggero, Mura, Francesco, Veroli, Andrea   +3 more
core   +1 more source

Extremely uniform lasing wavelengths of InP microdisk lasers heterogeneously integrated on SOI [PDF]

, 2013
A standard deviation in lasing wavelength lower than 500pm is characterized on nominally identical and optically-pumped microdisk lasers, heterogeneously integrated on the same SOI circuit.
Bazin, A, Mechet, Pauline, Monnier, P, Morthier, Geert, Raineri, F, Raj, R, Regreny, P, Roelkens, Günther, Sagnes, I, Spuesens, Thijs, Van Thourhout, Dries   +10 more
core   +1 more source

Tailoring electron beams with high-frequency self-assembled magnetic charged particle micro optics

Nature Communications, 2022
Electron beam manipulation is important for their application in microscopes, lithography instruments, and colliders. Here the authors report a wafer scale, self-assembled, microcoil electrically-driven magnetic charge particle optic device that can be ...
R. Huber, F. Kern, D. D. Karnaushenko, E. Eisner, P. Lepucki, A. Thampi, A. Mirhajivarzaneh, C. Becker, T. Kang, S. Baunack, B. Büchner, D. Karnaushenko, O. G. Schmidt, A. Lubk   +13 more
doaj   +1 more source

Diffractive lens fabrication by replica molding [PDF]

, 2001
Diffractive lenses and 2-D gratings were fabricated using electron-beam lithography and replica molding. With electron-beam lithography, feature sizes smaller than 60 nm can be achieved.
Lee, Benjamin G., Scherer, Axel
core   +1 more source

Electron caustic lithography

AIP Advances, 2012
A maskless method of electron beam lithography is described which uses the reflection of an electron beam from an electrostatic mirror to produce caustics in the demagnified image projected onto a resist–coated wafer. By varying the electron optics, e.g.
S. M. Kennedy, C. X. Zheng, J. Fu, W. X. Tang, D. M. Paganin, D. E. Jesson   +5 more
doaj   +1 more source

Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist [PDF]

, 2009
A scanning-helium-ion-beam microscope is now commercially available. This microscope can be used to perform lithography similar to, but of potentially higher resolution than, scanning electron-beam lithography.
A. E. Vladar, B. M. Cord, B. Ming, D. C. Bell, D. Winston, J. K. W. Yang, K. K. Berggren, L. A. Stern, Livengood, M. K. Mondol, M. T. Postek, Volkert, W. F. DiNatale, Yang   +13 more
core   +1 more source

Evolution in Lithography Techniques: Microlithography to Nanolithography

Nanomaterials, 2022
In this era, electronic devices such as mobile phones, computers, laptops, sensors, and many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying out tasks quickly and easily.
Ekta Sharma, Reena Rathi, Jaya Misharwal, Bhavya Sinhmar, Suman Kumari, Jasvir Dalal, Anand Kumar   +6 more
doaj   +1 more source