Results 11 to 20 of about 18,755 (260)

In Situ Time-of-Flight Mass Spectrometry of Ionic Fragments Induced by Focused Electron Beam Irradiation: Investigation of Electron Driven Surface Chemistry inside an SEM under High Vacuum

Nanomaterials, 2022
Recent developments in nanoprinting using focused electron beams have created a need to develop analysis methods for the products of electron-induced fragmentation of different metalorganic compounds.
Jakub Jurczyk, Lex Pillatsch, Luisa Berger, Agnieszka Priebe, Katarzyna Madajska, Czesław Kapusta, Iwona B. Szymańska, Johann Michler, Ivo Utke   +8 more
doaj   +1 more source

Silicon Metalens Fabrication from Electron Beam to UV-Nanoimprint Lithography

Nanomaterials, 2021
This study presents the design and manufacture of metasurface lenses optimized for focusing light with 1.55 µm wavelength. The lenses are fabricated on silicon substrates using electron beam lithography, ultraviolet-nanoimprint lithography and cryogenic ...
Angela Mihaela Baracu, Marius Andrei Avram, Carmen Breazu, Mihaela-Cristina Bunea, Marcela Socol, Anca Stanculescu, Elena Matei, Paul Conrad Vaagen Thrane, Christopher Andrew Dirdal, Adrian Dinescu, Oana Rasoga   +10 more
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Substrate Effect in Electron Beam Lithography

Advances in Electrical and Electronic Engineering, 2018
Electron Beam Lithography (EBL) process strongly depends on the type of the applied lithographic system, composed of electron sensitive polymers and the substrate. Moreover, applied acceleration voltage changes the volume of Backscattered Electrons (BSE)
Kornelia Indykiewicz, Bogdan Paszkiewicz, Regina Paszkiewicz   +2 more
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Electron caustic lithography

AIP Advances, 2012
A maskless method of electron beam lithography is described which uses the reflection of an electron beam from an electrostatic mirror to produce caustics in the demagnified image projected onto a resist–coated wafer. By varying the electron optics, e.g.
S. M. Kennedy, C. X. Zheng, J. Fu, W. X. Tang, D. M. Paganin, D. E. Jesson   +5 more
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Tailoring electron beams with high-frequency self-assembled magnetic charged particle micro optics

Nature Communications, 2022
Electron beam manipulation is important for their application in microscopes, lithography instruments, and colliders. Here the authors report a wafer scale, self-assembled, microcoil electrically-driven magnetic charge particle optic device that can be ...
R. Huber, F. Kern, D. D. Karnaushenko, E. Eisner, P. Lepucki, A. Thampi, A. Mirhajivarzaneh, C. Becker, T. Kang, S. Baunack, B. Büchner, D. Karnaushenko, O. G. Schmidt, A. Lubk   +13 more
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Evolution in Lithography Techniques: Microlithography to Nanolithography

Nanomaterials, 2022
In this era, electronic devices such as mobile phones, computers, laptops, sensors, and many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying out tasks quickly and easily.
Ekta Sharma, Reena Rathi, Jaya Misharwal, Bhavya Sinhmar, Suman Kumari, Jasvir Dalal, Anand Kumar   +6 more
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Analysis of issues in gate recess etching in the InAlAs/InGaAs HEMT manufacturing process

ETRI Journal, 2023
We have developed an InAlAs/InGaAs metamorphic high electron mobility transistor device fabrication process where the gate length can be tuned within the range of 0.13 μm–0.16 μm to suit the intended application.
Byoung-Gue Min, Jong-Min Lee, Hyung Sup Yoon, Woo-Jin Chang, Jong-Yul Park, Dong Min Kang, Sung-Jae Chang, Hyun-Wook Jung   +7 more
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Inverse design of high-NA metalens for maskless lithography

Nanophotonics, 2023
We demonstrate an axisymmetric inverse-designed metalens to improve the performance of zone-plate-array lithography (ZPAL), one of the maskless lithography approaches, that offer a new paradigm for nanoscale research and industry.
Chung Haejun, Zhang Feng, Li Hao, Miller Owen D., Smith Henry I.   +4 more
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The Validation of Various Technological Factors Impact on the Electron Beam Lithography Process

Advances in Electrical and Electronic Engineering, 2021
One of the most significant processes in micro- and nanoelectronics technology is Electron Beam Lithography (EBL). This technique maintains a leading role in extremely high-resolution structures fabrication process with micro- and nanometer dimensions ...
Agnieszka Zawadzka, Kornelia Indykiewicz, Regina Paszkiewicz   +2 more
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Charged particle single nanometre manufacturing

Beilstein Journal of Nanotechnology, 2018
Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject
Philip D. Prewett, Cornelis W. Hagen, Claudia Lenk, Steve Lenk, Marcus Kaestner, Tzvetan Ivanov, Ahmad Ahmad, Ivo W. Rangelow, Xiaoqing Shi, Stuart A. Boden, Alex P. G. Robinson, Dongxu Yang, Sangeetha Hari, Marijke Scotuzzi, Ejaz Huq   +14 more
doaj   +1 more source