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SERS and SEF with enhancement in nanogaps: from fabrication to biosensing. [PDF]
Nanoscale AdvSultangaziyev A +3 more
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Initiator-Free Recyclable Anthracene-Based Photocurable Resin Enabling Sustainable 3D Printing via Single- and Two-Photon Stereolithography. [PDF]
ACS OmegaMukai M +4 more
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Multiple electron-beam lithography
Microelectronic Engineering, 2001A number of multiple electron-beam approaches are currently under evaluation for sub-100-nm lithography. These approaches offer the potential of improving throughput for direct wafer writing and mask patterning and could have far reaching implications for the semiconductor industry.
Marian Mankos
exaly +2 more sources
Physics World, 1997
Lithography – literally "stone writing" – is a process that is fundamental to the manufacture of integrated circuits. It is improvements in this process that have largely enabled the spectacular advances that have been made in the field of microelectronics over the last three decades.
Lloyd Harrlott, Alexander Liddle
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Lithography – literally "stone writing" – is a process that is fundamental to the manufacture of integrated circuits. It is improvements in this process that have largely enabled the spectacular advances that have been made in the field of microelectronics over the last three decades.
Lloyd Harrlott, Alexander Liddle
openaire +1 more source
Contemporary Physics, 1981
Abstract Electron beam lithography means writing patterns in thin films of electron sensitive material using a finely focused (sub-micrometre diameter) electron beam. By combining electrical scanning with interferometrically monitored mechanical motion, very complex patterns can be generated with great accuracy; for example, a pattern containing one ...
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Abstract Electron beam lithography means writing patterns in thin films of electron sensitive material using a finely focused (sub-micrometre diameter) electron beam. By combining electrical scanning with interferometrically monitored mechanical motion, very complex patterns can be generated with great accuracy; for example, a pattern containing one ...
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Electron beam photoresists for nanoimprint lithography
Microelectronic Engineering, 2002Abstract Polymer selection and critical dimension (CD) pattern uniformity across the wafer are key parameters for the nanoimprint lithography technique. This nanotechnology requires polymers having a low glass transition temperature (Tg) combined with a good etch resistance.
Gourgon, C., Perret, C., Micouin, G.
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2012
Obtaining sub-20 nm lithography is not straightforward, even using a good tool with a sub-5 nm beam size. In this section, a brief overview of the various topics that will be covered in more depth in the rest of the chapter is given.
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Obtaining sub-20 nm lithography is not straightforward, even using a good tool with a sub-5 nm beam size. In this section, a brief overview of the various topics that will be covered in more depth in the rest of the chapter is given.
openaire +2 more sources
Electron-beam lithography for small MOSFET's
IEEE Transactions on Electron Devices, 1980Electron-beam lithography with a novel multilevel resist structure together with two-dimensional process and device modeling and dry processing with reactive sputter etching have been employed to produce silicon-gate NMOS devices with micrometer and submicrometer channel lengths. Results for transistors and ring oscillators are reported.
R.K. Watts +4 more
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Journal of Vacuum Science and Technology, 1982
Electron beam lithography has become the principal production method for fabricating integrated circuit masks and reticles for 1–1 projection printing and for direct step‐on‐wafer exposure. This has been the result of improved quality, lower cost, and high speed in writing patterns that are doubling in complexity every year.
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Electron beam lithography has become the principal production method for fabricating integrated circuit masks and reticles for 1–1 projection printing and for direct step‐on‐wafer exposure. This has been the result of improved quality, lower cost, and high speed in writing patterns that are doubling in complexity every year.
openaire +1 more source