Results 211 to 220 of about 18,795 (259)
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1986
To develop greater LSIs, it is necessary to increase the number of pattern elements per unit area by reducing circuit patterns. The increase of pattern elements per chip needs high-speed pattern writing. The electron-beam lithography system has stepped into the limelight as one of the systems for meeting the demand of fine and high-speed writing.
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To develop greater LSIs, it is necessary to increase the number of pattern elements per unit area by reducing circuit patterns. The increase of pattern elements per chip needs high-speed pattern writing. The electron-beam lithography system has stepped into the limelight as one of the systems for meeting the demand of fine and high-speed writing.
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1984
Over the past decade, the trend in integrated circuits for computers always has been a doubling of the circuit density every year. To-day’s products have 64.000 memory cells or 700 logic circuits on a 5 × 5 mm2 sized chip. For to-morrow, we can expect 288.000 and 516.000 memory cells or 5000 logic circuits on a chip.
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Over the past decade, the trend in integrated circuits for computers always has been a doubling of the circuit density every year. To-day’s products have 64.000 memory cells or 700 logic circuits on a 5 × 5 mm2 sized chip. For to-morrow, we can expect 288.000 and 516.000 memory cells or 5000 logic circuits on a chip.
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The resolution of electron beam lithography
Microelectronic Engineering, 1992Abstract We present a model for the primary interaction of the electron beam with bound electrons in the resist. Time-dependent perturbation theory is used to calculate the probability that sites some distance from the electron beam will be exposed by the electromagnetic field around it.
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Scanning electron beam lithography
Proceedings, annual meeting, Electron Microscopy Society of America, 1983This paper discusses the role of scanning electron beam lithography in semiconductor microcircuit production and in the experimental fabrication of devices in the laboratory. It also describes the electron optical equipment developed for these applications.Electron beam lithography has found an important place in integrated circuit production through ...
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All-Water Etching-Free Electron Beam Lithography for On-Chip Nanomaterials
ACS Nano, 2023Shun-Li Yu, Hao Wang, Qinghua Yi
exaly