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Electron beam lithography for nanofabrication
2019Electron beam lithography has consolidated as one of the most common techniques for patterning at the nanoscale range. It has enabled the nanofabrication of structures and devices within the research field of nanotechnology and nanoscience. The use of EBL for the development of a wide range of nanostructures and nanodevices has been and will continue ...
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Challenges in 1 Teradot∕in.2 dot patterning using electron beam lithography for bit-patterned media
Journal of Vacuum Science & Technology B, 2007, Xiaomin Yang, David Kuo
exaly
Influence of sub-100 nm scattering on high-energy electron beam lithography
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 2001Anderson Erik H, Chao Weilun
exaly
Nanolithography using a 100 kV electron beam lithography system with a Schottky emitter
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1999Martin Kamp, Alfred Forchel
exaly
Electron beam lithography for 0.13 μm manufacturing
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1997exaly
Electron beam lithography: resolution limits and applications
Applied Surface Science, 2000Yong Chen, A Lebib, H Launois
exaly

