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Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 2010Huigao Duan +2 more
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Electron beam lithography for nanofabrication
2019Electron beam lithography has consolidated as one of the most common techniques for patterning at the nanoscale range. It has enabled the nanofabrication of structures and devices within the research field of nanotechnology and nanoscience. The use of EBL for the development of a wide range of nanostructures and nanodevices has been and will continue ...
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Projection electron-beam lithography: A new approach
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1991S D Berger, J M Gibson, R C Farrow
exaly
Electron-beam microcolumns for lithography and related applications
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1996E Kratschmer, M L Yu, S A Rishton
exaly
Simulation of electron-beam lithography
Cybernetics, 1989V. P. Derkach +2 more
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Submicrometer Functionalization of Porous Silicon by Electron Beam Lithography
Advanced Materials, 2003M Rocchia +2 more
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X-Ray Lithography: A Complementary Technique to Electron Beam Lithography
Journal of Vacuum Science and Technology, 1973D L Spears
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