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Electron beam lithography for nanofabrication

2019
Electron beam lithography has consolidated as one of the most common techniques for patterning at the nanoscale range. It has enabled the nanofabrication of structures and devices within the research field of nanotechnology and nanoscience. The use of EBL for the development of a wide range of nanostructures and nanodevices has been and will continue ...
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Challenges in 1 Teradot∕in.2 dot patterning using electron beam lithography for bit-patterned media

Journal of Vacuum Science & Technology B, 2007
, Xiaomin Yang, David Kuo
exaly  

Influence of sub-100 nm scattering on high-energy electron beam lithography

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 2001
Anderson Erik H, Chao Weilun
exaly  

Electron Beam Lithography of Nanostructures

2011
D.M. Tennant, A.R. Bleier
openaire   +1 more source

Nanolithography using a 100 kV electron beam lithography system with a Schottky emitter

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1999
Martin Kamp, Alfred Forchel
exaly  

Electron beam lithography for 0.13 μm manufacturing

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1997
exaly  

Electron beam lithography: resolution limits and applications

Applied Surface Science, 2000
Yong Chen, A Lebib, H Launois
exaly  

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