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Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 2010
Huigao Duan   +2 more
exaly  

Electron beam lithography for nanofabrication

2019
Electron beam lithography has consolidated as one of the most common techniques for patterning at the nanoscale range. It has enabled the nanofabrication of structures and devices within the research field of nanotechnology and nanoscience. The use of EBL for the development of a wide range of nanostructures and nanodevices has been and will continue ...
openaire   +1 more source

Projection electron-beam lithography: A new approach

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1991
S D Berger, J M Gibson, R C Farrow
exaly  

Resists for Electron Beam Lithography

1984
TOSHIAKI TAMAMURA   +2 more
openaire   +1 more source

Electron-beam microcolumns for lithography and related applications

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1996
E Kratschmer, M L Yu, S A Rishton
exaly  

Simulation of electron-beam lithography

Cybernetics, 1989
V. P. Derkach   +2 more
openaire   +1 more source

Submicrometer Functionalization of Porous Silicon by Electron Beam Lithography

Advanced Materials, 2003
M Rocchia   +2 more
exaly  

X-Ray Lithography: A Complementary Technique to Electron Beam Lithography

Journal of Vacuum Science and Technology, 1973
D L Spears
exaly  

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